Michael Jackson

Person

Sunnyvale, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Wafer treatment for achieving defect-free self-assembled monolayers
- Patent number 11,735,420
- Issue date Aug 22, 2023
- Applied Materials, Inc.
- Chang Ke
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods for enhancing selectivity in SAM-based selective deposition
- Patent number 11,515,155
- Issue date Nov 29, 2022
- Applied Materials, Inc.
- Chang Ke
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Methods and apparatus for cryogenic gas stream assisted SAM-based s...
- Patent number 11,033,930
- Issue date Jun 15, 2021
- Applied Materials, Inc.
- Chang Ke
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Methods for enhancing selectivity in SAM-based selective deposition
- Patent number 10,950,433
- Issue date Mar 16, 2021
- Applied Materials, Inc.
- Chang Ke
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Wafer treatment for achieving defect-free self-assembled monolayers
- Patent number 10,770,292
- Issue date Sep 8, 2020
- Applied Materials, Inc.
- Chang Ke
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Selective deposition defects removal by chemical etch
- Patent number 10,643,840
- Issue date May 5, 2020
- Applied Materials, Inc.
- Jeffrey W. Anthis
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate support for plasma etch operations
- Patent number 10,593,521
- Issue date Mar 17, 2020
- Applied Materials, Inc.
- Larry Frazier
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma treatment of film for impurity removal
- Patent number 9,275,865
- Issue date Mar 1, 2016
- Applied Materials, Inc.
- Benjamin C. Wang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Apparatuses and methods for atomic layer deposition
- Patent number 9,017,776
- Issue date Apr 28, 2015
- Applied Materials, Inc.
- Hyman W. H. Lam
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Apparatuses and methods for atomic layer deposition
- Patent number 8,747,556
- Issue date Jun 10, 2014
- Applied Materials, Inc.
- Hyman W. H. Lam
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method for metal deposition using hydrogen plasma
- Patent number 8,637,410
- Issue date Jan 28, 2014
- Applied Materials, Inc.
- Anantha K. Subramani
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Apparatuses and methods for atomic layer deposition
- Patent number 8,291,857
- Issue date Oct 23, 2012
- Applied Materials, Inc.
- Hyman Lam
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Apparatuses and methods for atomic layer deposition
- Patent number 8,293,015
- Issue date Oct 23, 2012
- Applied Materials, Inc.
- Hyman W. H. Lam
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Substrate support having brazed plates and resistance heater
- Patent number 7,705,275
- Issue date Apr 27, 2010
- Applied Materials, Inc.
- Salvador P. Umotoy
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method and apparatus for removing processing liquid from a processi...
- Patent number 6,375,753
- Issue date Apr 23, 2002
- Applied Materials, Inc.
- Anish Tolia
- B08 - CLEANING
Information Patent Grant
Method and apparatus for removing processing liquid from a processi...
- Patent number 6,305,392
- Issue date Oct 23, 2001
- Applied Materials, Inc.
- Anish Tolia
- B08 - CLEANING
Information Patent Grant
Method for improved sputter etch processing
- Patent number 6,057,244
- Issue date May 2, 2000
- Applied Materials, Inc.
- Gilbert Hausmann
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
SEAM FREE TITANIUM NITRIDE GAPFILL
- Publication number 20240404830
- Publication date Dec 5, 2024
- Applied Materials, Inc.
- Radhika P. Patil
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MITIGATION OF FIRST WAFER EFFECT
- Publication number 20240379343
- Publication date Nov 14, 2024
- Applied Materials, Inc.
- Yongqian Gao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HYDROGEN PLASMA TREATMENT FOR FORMING LOGIC DEVICES
- Publication number 20240304495
- Publication date Sep 12, 2024
- Applied Materials, Inc.
- Tsung-Han Yang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Methods and Apparatus for Cryogenic Gas Stream Assisted SAM-based S...
- Publication number 20210283650
- Publication date Sep 16, 2021
- Applied Materials, Inc.
- Chang Ke
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Application
Methods For Enhancing Selectivity In Sam-Based Selective Deposition
- Publication number 20210217615
- Publication date Jul 15, 2021
- Applied Materials, Inc.
- Chang Ke
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
WAFER TREATMENT FOR ACHIEVING DEFECT-FREE SELF-ASSEMBLED MONOLAYERS
- Publication number 20200402792
- Publication date Dec 24, 2020
- Applied Materials, Inc.
- Chang Ke
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS OF TREATING A SUBSTRATE TO FORM A LAYER THEREON FOR APPLICA...
- Publication number 20190326114
- Publication date Oct 24, 2019
- Applied Materials, Inc.
- JESSICA S. KACHIAN
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Methods And Apparatus For Cryogenic Gas Stream Assisted SAM-Based S...
- Publication number 20190210061
- Publication date Jul 11, 2019
- Applied Materials, Inc.
- Chang Ke
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Application
Methods for Enhancing Selectivity in SAM-Based Selective Deposition
- Publication number 20190157079
- Publication date May 23, 2019
- Applied Materials, Inc.
- Chang Ke
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Selective Deposition Defects Removal By Chemical Etch
- Publication number 20190080904
- Publication date Mar 14, 2019
- Applied Materials, Inc.
- Jeffrey W. Anthis
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Wafer Treatment For Achieving Defect-Free Self-Assembled Monolayers
- Publication number 20180366317
- Publication date Dec 20, 2018
- Applied Materials, Inc.
- Chang Ke
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE SUPPORT FOR PLASMA ETCH OPERATIONS
- Publication number 20140262043
- Publication date Sep 18, 2014
- Applied Materials, Inc.
- LARRY FRAZIER
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA TREATMENT OF FILM FOR IMPURITY REMOVAL
- Publication number 20140120700
- Publication date May 1, 2014
- Benjamin C. WANG
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
APPARATUSES AND METHODS FOR ATOMIC LAYER DEPOSITION
- Publication number 20140087091
- Publication date Mar 27, 2014
- Applied Materials, Inc.
- Hyman W.H. Lam
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
APPARATUSES AND METHODS FOR ATOMIC LAYER DEPOSITION
- Publication number 20130008984
- Publication date Jan 10, 2013
- Applied Materials, Inc.
- Hyman Lam
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Method for Metal Deposition Using Hydrogen Plasma
- Publication number 20120258602
- Publication date Oct 11, 2012
- Applied Materials, Inc.
- Anantha K. Subramani
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
EXTENDED LIFE TEXTURED CHAMBER COMPONENTS AND METHOD FOR FABRICATIN...
- Publication number 20120258280
- Publication date Oct 11, 2012
- Applied Materials, Inc.
- Michael Jackson
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
IN-SITU CLEAN PROCESS FOR METAL DEPOSITION CHAMBERS
- Publication number 20120237693
- Publication date Sep 20, 2012
- Applied Materials, Inc.
- Michael Jackson
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
APPARATUSES AND METHODS FOR ATOMIC LAYER DEPOSITION
- Publication number 20120000422
- Publication date Jan 5, 2012
- Applied Materials, Inc.
- Hyman Lam
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
APPARATUSES AND METHODS FOR ATOMIC LAYER DEPOSITION
- Publication number 20100003406
- Publication date Jan 7, 2010
- Applied Materials, Inc.
- Hyman Lam
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Substrate support having brazed plates and resistance heater
- Publication number 20070040265
- Publication date Feb 22, 2007
- Applied Materials, Inc.
- Salvador P. Umotoy
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Method and apparatus for removing processing liquid from a processi...
- Publication number 20020026951
- Publication date Mar 7, 2002
- Anish Tolia
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Michael Jackson

Person

Patents Grantslast 30 patents

Wafer treatment for achieving defect-free self-assembled monolayers

Methods for enhancing selectivity in SAM-based selective deposition

Methods and apparatus for cryogenic gas stream assisted SAM-based s...

Methods for enhancing selectivity in SAM-based selective deposition

Wafer treatment for achieving defect-free self-assembled monolayers

Selective deposition defects removal by chemical etch

Substrate support for plasma etch operations

Plasma treatment of film for impurity removal

Apparatuses and methods for atomic layer deposition

Apparatuses and methods for atomic layer deposition

Method for metal deposition using hydrogen plasma

Apparatuses and methods for atomic layer deposition

Apparatuses and methods for atomic layer deposition

Substrate support having brazed plates and resistance heater

Method and apparatus for removing processing liquid from a processi...

Method and apparatus for removing processing liquid from a processi...

Method for improved sputter etch processing

Patents Applicationslast 30 patents

SEAM FREE TITANIUM NITRIDE GAPFILL

MITIGATION OF FIRST WAFER EFFECT

HYDROGEN PLASMA TREATMENT FOR FORMING LOGIC DEVICES

Methods and Apparatus for Cryogenic Gas Stream Assisted SAM-based S...

Methods For Enhancing Selectivity In Sam-Based Selective Deposition

WAFER TREATMENT FOR ACHIEVING DEFECT-FREE SELF-ASSEMBLED MONOLAYERS

METHODS OF TREATING A SUBSTRATE TO FORM A LAYER THEREON FOR APPLICA...

Methods And Apparatus For Cryogenic Gas Stream Assisted SAM-Based S...

Methods for Enhancing Selectivity in SAM-Based Selective Deposition

Selective Deposition Defects Removal By Chemical Etch

Wafer Treatment For Achieving Defect-Free Self-Assembled Monolayers

SUBSTRATE SUPPORT FOR PLASMA ETCH OPERATIONS

PLASMA TREATMENT OF FILM FOR IMPURITY REMOVAL

APPARATUSES AND METHODS FOR ATOMIC LAYER DEPOSITION

APPARATUSES AND METHODS FOR ATOMIC LAYER DEPOSITION

Method for Metal Deposition Using Hydrogen Plasma

EXTENDED LIFE TEXTURED CHAMBER COMPONENTS AND METHOD FOR FABRICATIN...

IN-SITU CLEAN PROCESS FOR METAL DEPOSITION CHAMBERS

APPARATUSES AND METHODS FOR ATOMIC LAYER DEPOSITION

APPARATUSES AND METHODS FOR ATOMIC LAYER DEPOSITION

Substrate support having brazed plates and resistance heater

Method and apparatus for removing processing liquid from a processi...