Michael Kubis

Person

Dresden, DE

People

Patents Grantslast 30 patents

Information Patent Grant
Inspection method and apparatus and lithographic processing cell
- Patent number RE49460
- Issue date Mar 14, 2023
- ASML Netherlands B.V.
- Everhardus Cornelis Mos
Information Patent Grant
Inspection method and apparatus and lithographic processing cell
- Patent number RE49199
- Issue date Sep 6, 2022
- ASML Netherlands B.V.
- Everhardus Cornelis Mos
Information Patent Grant
Metrology method, target and substrate
- Patent number 11,428,521
- Issue date Aug 30, 2022
- ASML Netherlands B.V.
- Kaustuve Bhattacharyya
- G01 - MEASURING TESTING
Information Patent Grant
Metrology method, patterning device, apparatus and computer program
- Patent number 11,385,553
- Issue date Jul 12, 2022
- ASML Netherlands B.V.
- Zili Zhou
- G01 - MEASURING TESTING
Information Patent Grant
Metrology method, target and substrate
- Patent number 11,204,239
- Issue date Dec 21, 2021
- ASML Netherlands B.V.
- Kaustuve Bhattacharyya
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and apparatus for inspection and metrology
- Patent number 11,170,072
- Issue date Nov 9, 2021
- ASML Netherands B.V.
- Everhardus Cornelis Mos
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Metrology method, patterning device, apparatus and computer program
- Patent number 10,996,570
- Issue date May 4, 2021
- ASML Netherlands B.V.
- Zili Zhou
- G01 - MEASURING TESTING
Information Patent Grant
Method and apparatus to correct for patterning process error
- Patent number 10,915,689
- Issue date Feb 9, 2021
- ASML Netherlands B.V.
- Peter Ten Berge
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Metrology method, target and substrate
- Patent number 10,718,604
- Issue date Jul 21, 2020
- ASML Netherlands B.V.
- Kaustuve Bhattacharyya
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Determining edge roughness parameters
- Patent number 10,634,490
- Issue date Apr 28, 2020
- ASML Netherlands B.V.
- Martin Jacobus Johan Jak
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Metrology method, target and substrate
- Patent number 10,386,176
- Issue date Aug 20, 2019
- ASML Netherlands B.V.
- Kaustuve Bhattacharyya
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Metrology method and inspection apparatus, lithographic system and...
- Patent number 9,946,167
- Issue date Apr 17, 2018
- ASML Netherlands B.V.
- Hendrik Jan Hidde Smilde
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method to determine the usefulness of alignment marks to correct ov...
- Patent number 9,454,084
- Issue date Sep 27, 2016
- ASML Netherlands B.V.
- Irina Lyulina
- G01 - MEASURING TESTING
Information Patent Grant
Substrate and patterning device for use in metrology, metrology met...
- Patent number 9,331,022
- Issue date May 3, 2016
- ASML Netherlands B.V.
- Maurits Van Der Schaar
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of applying a pattern to a substrate, device manufacturing m...
- Patent number 9,291,916
- Issue date Mar 22, 2016
- ASML Netherlands B.V.
- Stefan Cornelis Theodorus Van Der Sanden
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Device manufacturing method and associated lithographic apparatus,...
- Patent number 9,163,935
- Issue date Oct 20, 2015
- ASML Netherlands B.V.
- Arie Jeffrey Den Boef
- G01 - MEASURING TESTING
Information Patent Grant
Metrology method and apparatus, and device manufacturing method
- Patent number 9,158,194
- Issue date Oct 13, 2015
- ASML Netherlands B.V.
- Armand Eugene Albert Koolen
- G01 - MEASURING TESTING
Information Patent Grant
Metrology method and inspection apparatus, lithographic system and...
- Patent number 9,140,998
- Issue date Sep 22, 2015
- ASML Netherlands B.V.
- Hendrik Jan Hidde Smilde
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Methods and scatterometers, lithographic systems, and lithographic...
- Patent number 9,081,303
- Issue date Jul 14, 2015
- ASML Netherlands B.V.
- Hugo Augustinus Joseph Cramer
- G01 - MEASURING TESTING
Information Patent Grant
Metrology method and apparatus, and device manufacturing method
- Patent number 9,069,264
- Issue date Jun 30, 2015
- ASML Netherlands B.V.
- Patrick Warnaar
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Methods and scatterometers, lithographic systems, and lithographic...
- Patent number 8,994,944
- Issue date Mar 31, 2015
- ASML Netherlands B.V.
- Hugo Augustinus Joseph Cramer
- G01 - MEASURING TESTING
Information Patent Grant
Method of applying a pattern to a substrate, device manufacturing m...
- Patent number 8,976,355
- Issue date Mar 10, 2015
- ASML Netherlands B.V.
- Stefan Cornelis Theodorus Van Der Sanden
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and apparatus for determining an overlay error
- Patent number 8,908,147
- Issue date Dec 9, 2014
- ASML Netherlands B.V.
- Arie Jeffrey Den Boef
- A01 - AGRICULTURE FORESTRY ANIMAL HUSBANDRY HUNTING TRAPPING FISHING
Information Patent Grant
Inspection method and apparatus and lithographic processing cell
- Patent number 8,887,107
- Issue date Nov 11, 2014
- ASML Netherlands B.V.
- Everhardus Cornelis Mos
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Substrate and patterning device for use in metrology, metrology met...
- Patent number 8,709,687
- Issue date Apr 29, 2014
- ASML Netherlands B.V.
- Maurits Van Der Schaar
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for projection of a circuit pattern, which is arranged on a...
- Patent number 7,252,913
- Issue date Aug 7, 2007
- Infineon Technologies AG
- Bernd Kochan
- G06 - COMPUTING CALCULATING COUNTING

Patents Applicationslast 30 patents

Information Patent Application
MULTISCALE PHYSICAL ETCH MODELING AND METHODS THEREOF
- Publication number 20230297757
- Publication date Sep 21, 2023
- ASML NETHERLANDS B.V.
- Syam PARAYIL VENUGOPALAN
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
METROLOGY METHOD, TARGET AND SUBSTRATE
- Publication number 20230016664
- Publication date Jan 19, 2023
- ASML NETHERLANDS B.V.
- Kaustuve BHATTACHARYYA
- G01 - MEASURING TESTING
Information Patent Application
METROLOGY METHOD, TARGET AND SUBSTRATE
- Publication number 20220057192
- Publication date Feb 24, 2022
- ASML NETHERLANDS B.V.
- Kaustuve BHATTACHARYYA
- G01 - MEASURING TESTING
Information Patent Application
METHOD AND APPARATUS FOR INSPECTION AND METROLOGY
- Publication number 20220027437
- Publication date Jan 27, 2022
- ASML NETHERLANDS B.V.
- Everhardus Cornelis MOS
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
METROLOGY METHOD, PATTERNING DEVICE, APPARATUS AND COMPUTER PROGRAM
- Publication number 20210255553
- Publication date Aug 19, 2021
- ASML NETHERLANDS B.V.
- Zili ZHOU
- G01 - MEASURING TESTING
Information Patent Application
METROLOGY METHOD, TARGET AND SUBSTRATE
- Publication number 20200348125
- Publication date Nov 5, 2020
- ASML NETHERLANDS B.V.
- Kaustuve BHATTACHARYYA
- G01 - MEASURING TESTING
Information Patent Application
METROLOGY METHOD, TARGET AND SUBSTRATE
- Publication number 20190346256
- Publication date Nov 14, 2019
- ASML NETHERLANDS B.V.
- Kaustuve BHATTACHARYYA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Determining Edge Roughness Parameters
- Publication number 20180364036
- Publication date Dec 20, 2018
- ASML NETHERLANDS B.V.
- Martin Jacobus Johan JAK
- G01 - MEASURING TESTING
Information Patent Application
METHOD AND APPARATUS TO CORRECT FOR PATTERNING PROCESS ERROR
- Publication number 20180307135
- Publication date Oct 25, 2018
- ASML NETHERLANDS B.V.
- Peter TEN BERGE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD AND APPARATUS FOR INSPECTION AND METROLOGY
- Publication number 20180067900
- Publication date Mar 8, 2018
- ASML NETHERLANDS B.V.
- Everhardus Cornelis MOS
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
METROLOGY METHOD, TARGET AND SUBSTRATE
- Publication number 20160061589
- Publication date Mar 3, 2016
- ASML NETHERLANDS B.V.
- Kaustuve BHATTACHARYYA
- G01 - MEASURING TESTING
Information Patent Application
Metrology Method and Inspection Apparatus, Lithographic System and...
- Publication number 20160033877
- Publication date Feb 4, 2016
- ASML NETHERLANDS B.V.
- Hendrik Jan Hidde SMILDE
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Method of Applying a Pattern to a Substrate, Device Manufacturing M...
- Publication number 20150153656
- Publication date Jun 4, 2015
- ASML NETHERLANDS B.V.
- Stefan Cornelis Theodorus VAN DER SANDEN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD TO DETERMINE THE USEFULNESS OF ALIGNMENT MARKS TO CORRECT OV...
- Publication number 20150146188
- Publication date May 28, 2015
- ASML NETHERLANDS B.V.
- Irina Lyulina
- G01 - MEASURING TESTING
Information Patent Application
Substrate and Patterning Device for Use in Metrology, Metrology Met...
- Publication number 20140233031
- Publication date Aug 21, 2014
- ASML NETHERLANDS B.V.
- Maurits VAN DER SCHAAR
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Methods and Scatterometers, Lithographic Systems, and Lithographic...
- Publication number 20140139814
- Publication date May 22, 2014
- ASML NETHERLANDS B.V.
- Hugo Augustinus Joseph CRAMER
- G01 - MEASURING TESTING
Information Patent Application
Inspection Method and Apparatus and Lithographic Processing Cell
- Publication number 20140089870
- Publication date Mar 27, 2014
- ASML NETHERLANDS B.V.
- Everhardus Cornelis MOS
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Method of Applying a Pattern to a Substrate, Device Manufacturing M...
- Publication number 20130230797
- Publication date Sep 5, 2013
- ASML NETHERLANDS B.V.
- Stefan Cornelis Theodorus VAN DER SANDEN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Device Manufacturing Method and Associated Lithographic Apparatus,...
- Publication number 20130148121
- Publication date Jun 13, 2013
- ASML NETHERLANDS B.V.
- Arie Jeffrey DEN BOEF
- G01 - MEASURING TESTING
Information Patent Application
Metrology Method and Apparatus, and Device Manufacturing Method
- Publication number 20130100427
- Publication date Apr 25, 2013
- ASML NETHERLANDS B.V.
- Armand Eugene Albert KOOLEN
- G01 - MEASURING TESTING
Information Patent Application
Substrate and Patterning Device for Use in Metrology, Metrology Met...
- Publication number 20130059240
- Publication date Mar 7, 2013
- ASML NETHERLANDS B.V.
- Maurits Van Der Schaar
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Metrology Method and Apparatus, and Device Manufacturing Method
- Publication number 20130050501
- Publication date Feb 28, 2013
- ASML NETHERLANDS B.V.
- Patrick WARNAAR
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Metrology Method and Inspection Apparatus, Lithographic System and...
- Publication number 20120123581
- Publication date May 17, 2012
- ASML NETHERLANDS B.V.
- Hendrik Jan Hidde SMILDE
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Method and Apparatus for Determining an Overlay Error
- Publication number 20120013881
- Publication date Jan 19, 2012
- ASML NETHERLANDS B.V.
- Arie Jeffrey Den Boef
- A01 - AGRICULTURE FORESTRY ANIMAL HUSBANDRY HUNTING TRAPPING FISHING
Information Patent Application
Methods and Scatterometers, Lithographic Systems, and Lithographic...
- Publication number 20110027704
- Publication date Feb 3, 2011
- ASML NETHERLANDS B.V.
- Hugo Augustinus Joseph Cramer
- G01 - MEASURING TESTING
Information Patent Application
Compensation of Process-Induced Displacement
- Publication number 20100040983
- Publication date Feb 18, 2010
- QIMONDA AG
- Heinrich Ollendorf
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method for projection of a circuit pattern, which is arranged on a...
- Publication number 20050050512
- Publication date Mar 3, 2005
- Bernd Kochan
- G06 - COMPUTING CALCULATING COUNTING

Michael Kubis

Person

Patents Grantslast 30 patents

Inspection method and apparatus and lithographic processing cell

Inspection method and apparatus and lithographic processing cell

Metrology method, target and substrate

Metrology method, patterning device, apparatus and computer program

Metrology method, target and substrate

Method and apparatus for inspection and metrology

Metrology method, patterning device, apparatus and computer program

Method and apparatus to correct for patterning process error

Metrology method, target and substrate

Determining edge roughness parameters

Metrology method, target and substrate

Metrology method and inspection apparatus, lithographic system and...

Method to determine the usefulness of alignment marks to correct ov...

Substrate and patterning device for use in metrology, metrology met...

Method of applying a pattern to a substrate, device manufacturing m...

Device manufacturing method and associated lithographic apparatus,...

Metrology method and apparatus, and device manufacturing method

Metrology method and inspection apparatus, lithographic system and...

Methods and scatterometers, lithographic systems, and lithographic...

Metrology method and apparatus, and device manufacturing method

Methods and scatterometers, lithographic systems, and lithographic...

Method of applying a pattern to a substrate, device manufacturing m...

Method and apparatus for determining an overlay error

Inspection method and apparatus and lithographic processing cell

Substrate and patterning device for use in metrology, metrology met...

Method for projection of a circuit pattern, which is arranged on a...

Patents Applicationslast 30 patents

MULTISCALE PHYSICAL ETCH MODELING AND METHODS THEREOF

METROLOGY METHOD, TARGET AND SUBSTRATE

METROLOGY METHOD, TARGET AND SUBSTRATE

METHOD AND APPARATUS FOR INSPECTION AND METROLOGY

METROLOGY METHOD, PATTERNING DEVICE, APPARATUS AND COMPUTER PROGRAM

METROLOGY METHOD, TARGET AND SUBSTRATE

METROLOGY METHOD, TARGET AND SUBSTRATE

Determining Edge Roughness Parameters

METHOD AND APPARATUS TO CORRECT FOR PATTERNING PROCESS ERROR

METHOD AND APPARATUS FOR INSPECTION AND METROLOGY

METROLOGY METHOD, TARGET AND SUBSTRATE

Metrology Method and Inspection Apparatus, Lithographic System and...

Method of Applying a Pattern to a Substrate, Device Manufacturing M...

METHOD TO DETERMINE THE USEFULNESS OF ALIGNMENT MARKS TO CORRECT OV...

Substrate and Patterning Device for Use in Metrology, Metrology Met...

Methods and Scatterometers, Lithographic Systems, and Lithographic...

Inspection Method and Apparatus and Lithographic Processing Cell

Method of Applying a Pattern to a Substrate, Device Manufacturing M...

Device Manufacturing Method and Associated Lithographic Apparatus,...

Metrology Method and Apparatus, and Device Manufacturing Method

Substrate and Patterning Device for Use in Metrology, Metrology Met...

Metrology Method and Apparatus, and Device Manufacturing Method

Metrology Method and Inspection Apparatus, Lithographic System and...

Method and Apparatus for Determining an Overlay Error

Methods and Scatterometers, Lithographic Systems, and Lithographic...

Compensation of Process-Induced Displacement

Method for projection of a circuit pattern, which is arranged on a...