Michael L. Nelson

Person

W. Redding, CT, US

People

Patents Grantslast 30 patents

Information Patent Grant
Chucks and clamps for holding objects of a lithographic apparatus a...
- Patent number RE49066
- Issue date May 10, 2022
- ASML Holding N.V.
- Raymond Wilhelmus Louis Lafarre
Information Patent Grant
Chucks and clamps for holding objects of a lithographic apparatus a...
- Patent number 10,324,383
- Issue date Jun 18, 2019
- ASML Holding N.V.
- Raymond Wilhelmus Louis Lafarre
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Mask inspection with fourier filtering and image compare
- Patent number 9,041,903
- Issue date May 26, 2015
- ASML Holding N.V.
- Michael L. Nelson
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
EUV reticle substrates with high thermal conductivity
- Patent number 8,736,810
- Issue date May 27, 2014
- ASML Holding N.V.
- Ronald A. Wilklow
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Apparatuses and methods for changing an intensity distribution of l...
- Patent number 7,633,599
- Issue date Dec 15, 2009
- ASML Holding N.V.
- Stephen Roux
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic apparatus, device manufacturing method, and a projecti...
- Patent number 7,474,384
- Issue date Jan 6, 2009
- ASML Holding N.V.
- Arno Jan Bleeker
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and system for improving focus accuracy in a lithography system
- Patent number 7,248,336
- Issue date Jul 24, 2007
- ASML Holding N.V.
- Michael L. Nelson
- D21 - PAPER-MAKING PRODUCTION OF CELLULOSE
Information Patent Grant
Correcting variations in the intensity of light within an illuminat...
- Patent number 7,119,883
- Issue date Oct 10, 2006
- ASML Holding N.V.
- Stephen Roux
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and systems for improving focus accuracy in a lithography sy...
- Patent number 7,053,984
- Issue date May 30, 2006
- ASML Holding N.V.
- Michael L. Nelson
- D21 - PAPER-MAKING PRODUCTION OF CELLULOSE
Information Patent Grant
Method and system for improving focus accuracy in a lithography system
- Patent number 6,859,260
- Issue date Feb 22, 2005
- ASML Holding N.V.
- Michael L. Nelson
- D21 - PAPER-MAKING PRODUCTION OF CELLULOSE
Information Patent Grant
Pneumatic control system and method for shaping deformable mirrors...
- Patent number 6,398,373
- Issue date Jun 4, 2002
- ASML US, Inc.
- Andrew J. Guzman
- G02 - OPTICS
Information Patent Grant
Mask and wafer diffraction grating alignment system wherein the dif...
- Patent number 5,559,601
- Issue date Sep 24, 1996
- SVG Lithography Systems, Inc.
- Gregg M. Gallatin
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
MULTI-IMAGE PARTICLE DETECTION SYSTEM AND METHOD
- Publication number 20200386692
- Publication date Dec 10, 2020
- ASML Holding N.V.
- Aage BENDIKSEN
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
CHUCKS AND CLAMPS FOR HOLDING OBJECTS OF A LITHOGRAPHIC APPARATUS A...
- Publication number 20180321602
- Publication date Nov 8, 2018
- ASML Holding N.V.
- Raymond Wilhelmus Louis LAFARRE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Mask Inspection with Fourier Filtering and Image Compare
- Publication number 20120075606
- Publication date Mar 29, 2012
- Michael L. Nelson
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
EUV Reticle Substrates With High Thermal Conductivity
- Publication number 20110116068
- Publication date May 19, 2011
- EUV RETICLE SUBSTRATES WITH HIGH THERMAL CONDUCTIV
- Ronald A. Wilklow
- B82 - NANO-TECHNOLOGY
Information Patent Application
Apparatuses and methods for changing an intensity distribution of l...
- Publication number 20070013891
- Publication date Jan 18, 2007
- ASML Holding N.V.
- Stephen Roux
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method and system for improving focus accuracy in a lithography system
- Publication number 20060187436
- Publication date Aug 24, 2006
- ASML Holding N.V.
- Michael L. Nelson
- H04 - ELECTRIC COMMUNICATION TECHNIQUE
Information Patent Application
Lithographic apparatus, device manufacturing method, and a projecti...
- Publication number 20060110665
- Publication date May 25, 2006
- ASML Netherlands B.V.
- Arno Jan Bleeker
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Correcting variations in the intensity of light within an illuminat...
- Publication number 20060077372
- Publication date Apr 13, 2006
- ASML Holding N.V.
- Stephen Roux
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method and systems for improving focus accuracy in a lithography sy...
- Publication number 20050128456
- Publication date Jun 16, 2005
- ASML Holding N.V.
- Michael L. Nelson
- H04 - ELECTRIC COMMUNICATION TECHNIQUE
Information Patent Application
Method and system for improving focus accuracy in a lithography system
- Publication number 20020158185
- Publication date Oct 31, 2002
- Silicon Valley Group, Inc.
- Michael L. Nelson
- D21 - PAPER-MAKING PRODUCTION OF CELLULOSE

Michael L. Nelson

Person

Patents Grantslast 30 patents

Chucks and clamps for holding objects of a lithographic apparatus a...

Chucks and clamps for holding objects of a lithographic apparatus a...

Mask inspection with fourier filtering and image compare

EUV reticle substrates with high thermal conductivity

Apparatuses and methods for changing an intensity distribution of l...

Lithographic apparatus, device manufacturing method, and a projecti...

Method and system for improving focus accuracy in a lithography system

Correcting variations in the intensity of light within an illuminat...

Method and systems for improving focus accuracy in a lithography sy...

Method and system for improving focus accuracy in a lithography system

Pneumatic control system and method for shaping deformable mirrors...

Mask and wafer diffraction grating alignment system wherein the dif...

Patents Applicationslast 30 patents

MULTI-IMAGE PARTICLE DETECTION SYSTEM AND METHOD

CHUCKS AND CLAMPS FOR HOLDING OBJECTS OF A LITHOGRAPHIC APPARATUS A...

Mask Inspection with Fourier Filtering and Image Compare

EUV Reticle Substrates With High Thermal Conductivity

Apparatuses and methods for changing an intensity distribution of l...

Method and system for improving focus accuracy in a lithography system

Lithographic apparatus, device manufacturing method, and a projecti...

Correcting variations in the intensity of light within an illuminat...

Method and systems for improving focus accuracy in a lithography sy...

Method and system for improving focus accuracy in a lithography system