Michael M. Crouse

Person

Albany, NY, US

People

Patents Grantslast 30 patents

Information Patent Grant
Lens heating aware source mask optimization for advanced lithography
- Patent number 9,940,427
- Issue date Apr 10, 2018
- ASML Netherlands B.V.
- Michael Matthew M. Crouse
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
MEEF reduction by elongation of square shapes
- Patent number 7,975,246
- Issue date Jul 5, 2011
- International Business Machines Corporation
- Derren Neylon Dunn
- Y02 - TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMA...
Information Patent Grant
Photomask and method of making thereof
- Patent number 7,892,705
- Issue date Feb 22, 2011
- International Business Machines Corporation
- Sean D. Burns
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithography process optimization and system
- Patent number 7,537,870
- Issue date May 26, 2009
- Chartered Semiconductor Manufacturing, Ltd.
- Michael Matthew Crouse
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and algorithm for the control of critical dimensions in a th...
- Patent number 7,493,186
- Issue date Feb 17, 2009
- International Business Machines Corporation
- Colin J. Brodsky
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
LENS HEATING AWARE SOURCE MASK OPTIMIZATION FOR ADVANCED LITHOGRAPHY
- Publication number 20130212543
- Publication date Aug 15, 2013
- ASML NETHERLANDS B.V.
- Michael Matthew M. CROUSE
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
MEEF REDUCTION BY ELONGATION OF SQUARE SHAPES
- Publication number 20100042967
- Publication date Feb 18, 2010
- International Business Machines Corporation
- Derren N. Dunn
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Contact Level Mask Layouts By Introducing Anisotropic Sub-Resolutio...
- Publication number 20090191468
- Publication date Jul 30, 2009
- International Business Machines Corporation
- Michael M. Crouse
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTOMASK AND METHOD OF MAKING THEREOF
- Publication number 20090087755
- Publication date Apr 2, 2009
- International Business Machines Corporation
- Sean D. Burns
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD AND ALGORITHM FOR THE CONTROL OF CRITICAL DIMENSIONS IN A TH...
- Publication number 20080154420
- Publication date Jun 26, 2008
- International Business Machines Corporation
- Colin J. Brodsky
- G05 - CONTROLLING REGULATING
Information Patent Application
Lithography process optimization and system
- Publication number 20070031744
- Publication date Feb 8, 2007
- CHARTERED SEMICONDUCTOR MFG, LTD
- Michael Matthew Crouse
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Michael M. Crouse

Person

Patents Grantslast 30 patents

Lens heating aware source mask optimization for advanced lithography

MEEF reduction by elongation of square shapes

Photomask and method of making thereof

Lithography process optimization and system

Method and algorithm for the control of critical dimensions in a th...

Patents Applicationslast 30 patents

LENS HEATING AWARE SOURCE MASK OPTIMIZATION FOR ADVANCED LITHOGRAPHY

MEEF REDUCTION BY ELONGATION OF SQUARE SHAPES

Contact Level Mask Layouts By Introducing Anisotropic Sub-Resolutio...

PHOTOMASK AND METHOD OF MAKING THEREOF

METHOD AND ALGORITHM FOR THE CONTROL OF CRITICAL DIMENSIONS IN A TH...

Lithography process optimization and system