Michael Mühlbeyer

Person

Aalen, DE

People

Patents Grantslast 30 patents

Information Patent Grant
Imaging device in a projection exposure machine
- Patent number 7,710,542
- Issue date May 4, 2010
- Carl Zeiss SMT AG
- Wolfgang Hummel
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Device consisting of at least one optical element
- Patent number 7,603,010
- Issue date Oct 13, 2009
- Carl Zeiss SMT AG
- Yim-Bun Patrick Kwan
- G02 - OPTICS
Information Patent Grant
6-mirror microlithography projection objective
- Patent number 6,867,913
- Issue date Mar 15, 2005
- Carl Zeiss SMT AG
- Hans-Jürgen Mann
- G02 - OPTICS
Information Patent Grant
Optical element deformation system
- Patent number 6,844,994
- Issue date Jan 18, 2005
- Carl Zeiss SMT AG
- Frank Melzer
- G02 - OPTICS
Information Patent Grant
Lithographic apparatus and device manufacturing method
- Patent number 6,750,949
- Issue date Jun 15, 2004
- AMSL Netherlands B.V.
- Erik Roelof Loopstra
- G02 - OPTICS
Information Patent Grant
Optical imaging device, particularly an objective, with at least on...
- Patent number 6,191,898
- Issue date Feb 20, 2001
- Carl-Zeiss-Stiftung
- Michael Trunz
- G02 - OPTICS

Patents Applicationslast 30 patents

Information Patent Application
IMAGING DEVICE IN A PROJECTION EXPOSURE FACILITY
- Publication number 20110199597
- Publication date Aug 18, 2011
- Carl Zeiss SMT GMBH
- Wolfgang Hummel
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
DEVICE CONSISTING OF AT LEAST ONE OPTICAL ELEMENT
- Publication number 20090324174
- Publication date Dec 31, 2009
- Carl Zeiss SMT AG
- Yim-Bun Patrick Kwan
- G02 - OPTICS
Information Patent Application
IMAGING DEVICE IN A PROJECTION EXPOSURE MACHINE
- Publication number 20080174757
- Publication date Jul 24, 2008
- Carl Zeiss SMT AG
- Wolfgang Hummel
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Diaphragm changing device
- Publication number 20070053076
- Publication date Mar 8, 2007
- Hermann Bieg
- G02 - OPTICS
Information Patent Application
Device consisting of at least one optical element
- Publication number 20070047876
- Publication date Mar 1, 2007
- Carl Zeiss SMT AG
- Yim-Bun Patrick Kwan
- G02 - OPTICS
Information Patent Application
Imaging device in a projection exposure facility
- Publication number 20040263812
- Publication date Dec 30, 2004
- Wolfgang Hummel
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Lithographic apparatus and device manufacturing method
- Publication number 20030058422
- Publication date Mar 27, 2003
- Erik Roelof Loopstra
- G02 - OPTICS
Information Patent Application
6-mirror microlithography projection objective
- Publication number 20020056815
- Publication date May 16, 2002
- Carl-Zeiss-Stiftung trading as Carl Zeiss
- Hans-Jurgen Mann
- G02 - OPTICS
Information Patent Application
Optical element deformation system
- Publication number 20020048096
- Publication date Apr 25, 2002
- Frank Melzer
- G02 - OPTICS

Michael Mühlbeyer

Person

Patents Grantslast 30 patents

Imaging device in a projection exposure machine

Device consisting of at least one optical element

6-mirror microlithography projection objective

Optical element deformation system

Lithographic apparatus and device manufacturing method

Optical imaging device, particularly an objective, with at least on...

Patents Applicationslast 30 patents

IMAGING DEVICE IN A PROJECTION EXPOSURE FACILITY

DEVICE CONSISTING OF AT LEAST ONE OPTICAL ELEMENT

IMAGING DEVICE IN A PROJECTION EXPOSURE MACHINE

Diaphragm changing device

Device consisting of at least one optical element

Imaging device in a projection exposure facility

Lithographic apparatus and device manufacturing method

6-mirror microlithography projection objective

Optical element deformation system