Michael Stadtmueller

Person

Villach, AT

People

Patents Grantslast 30 patents

Information Patent Grant
Power semiconductor device having a strain-inducing material embedd...
- Patent number 11,728,427
- Issue date Aug 15, 2023
- Infineon Technologies Austria AG
- Stefan Karner
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Wide band gap semiconductor device and method for forming a wide ba...
- Patent number 11,295,951
- Issue date Apr 5, 2022
- Infineon Technologies AG
- Thomas Aichinger
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of manufacturing a trench oxide in a trench for a gate struc...
- Patent number 11,127,839
- Issue date Sep 21, 2021
- Infineon Technologies AG
- Moriz Jelinek
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device containing oxygen-related thermal donors
- Patent number 10,192,955
- Issue date Jan 29, 2019
- Infineon Technologies AG
- Johannes Georg Laven
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Capacitor and method of forming a capacitor
- Patent number 9,881,991
- Issue date Jan 30, 2018
- Infineon Technologies AG
- Wolfgang Lehnert
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of manufacturing semiconductor devices and semiconductor dev...
- Patent number 9,825,131
- Issue date Nov 21, 2017
- Infineon Technologies AG
- Johannes Georg Laven
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Surface treatment of semiconductor substrate using free radical sta...
- Patent number 9,515,162
- Issue date Dec 6, 2016
- Infineon Technologies Austria AG
- Maria Reiner
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Capacitor and method of forming a capacitor
- Patent number 9,196,675
- Issue date Nov 24, 2015
- Infineon Technologies AG
- Wolfgang Lehnert
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of forming a capacitor
- Patent number 8,685,828
- Issue date Apr 1, 2014
- Infineon Technologies AG
- Wolfgang Lehnert
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
POWER SEMICONDUCTOR DEVICE HAVING AN ELECTRODE WITH AN EMBEDDED MAT...
- Publication number 20230343871
- Publication date Oct 26, 2023
- Infineon Technologies Austria AG
- Stefan Karner
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
POWER SEMICONDUCTOR DEVICE HAVING A STRAIN-INDUCING MATERIAL EMBEDD...
- Publication number 20220406937
- Publication date Dec 22, 2022
- Stefan Karner
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method for Annealing a Gate Insulation Layer on a Wide Band Gap Sem...
- Publication number 20220157607
- Publication date May 19, 2022
- Thomas Aichinger
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of Manufacturing a Trench Oxide in a Trench for a Gate Struc...
- Publication number 20200212203
- Publication date Jul 2, 2020
- Moriz Jelinek
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Wide Band Gap Semiconductor Device and Method for Forming a Wide Ba...
- Publication number 20190311903
- Publication date Oct 10, 2019
- INFINEON TECHNOLOGIES AG
- Thomas Aichinger
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of Manufacturing Semiconductor Devices and Semiconductor Dev...
- Publication number 20180019306
- Publication date Jan 18, 2018
- INFINEON TECHNOLOGIES AG
- Johannes Georg Laven
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of Manufacturing Semiconductor Devices and Semiconductor Dev...
- Publication number 20160329401
- Publication date Nov 10, 2016
- INFINEON TECHNOLOGIES AG
- Johannes Georg Laven
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SURFACE TREATMENT OF SEMICONDUCTOR SUBSTRATE USING FREE RADICAL STA...
- Publication number 20160260817
- Publication date Sep 8, 2016
- Infineon Technologies Austria AG
- Maria Reiner
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Capacitor and Method of Forming a Capacitor
- Publication number 20160043164
- Publication date Feb 11, 2016
- INFINEON TECHNOLOGIES AG
- Wolfgang Lehnert
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Capacitor and Method of Forming a Capacitor
- Publication number 20140145305
- Publication date May 29, 2014
- INFINEON TECHNOLOGIES AG
- Wolfgang Lehnert
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Semiconductor Device and Method of Manufacturing Thereof
- Publication number 20120181656
- Publication date Jul 19, 2012
- Wolfgang Lehnert
- H01 - BASIC ELECTRIC ELEMENTS

Michael Stadtmueller

Person

Patents Grantslast 30 patents

Power semiconductor device having a strain-inducing material embedd...

Wide band gap semiconductor device and method for forming a wide ba...

Method of manufacturing a trench oxide in a trench for a gate struc...

Semiconductor device containing oxygen-related thermal donors

Capacitor and method of forming a capacitor

Method of manufacturing semiconductor devices and semiconductor dev...

Surface treatment of semiconductor substrate using free radical sta...

Capacitor and method of forming a capacitor

Method of forming a capacitor

Patents Applicationslast 30 patents

POWER SEMICONDUCTOR DEVICE HAVING AN ELECTRODE WITH AN EMBEDDED MAT...

POWER SEMICONDUCTOR DEVICE HAVING A STRAIN-INDUCING MATERIAL EMBEDD...

Method for Annealing a Gate Insulation Layer on a Wide Band Gap Sem...

Method of Manufacturing a Trench Oxide in a Trench for a Gate Struc...

Wide Band Gap Semiconductor Device and Method for Forming a Wide Ba...

Method of Manufacturing Semiconductor Devices and Semiconductor Dev...

Method of Manufacturing Semiconductor Devices and Semiconductor Dev...

SURFACE TREATMENT OF SEMICONDUCTOR SUBSTRATE USING FREE RADICAL STA...

Capacitor and Method of Forming a Capacitor

Capacitor and Method of Forming a Capacitor

Semiconductor Device and Method of Manufacturing Thereof