Michel Franciscus Johannes Van Rooy

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Bladel, NL

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Patents Grantslast 30 patents

Information Patent Grant
Immersion lithography
- Patent number 8,129,097
- Issue date Mar 6, 2012
- ASML Netherlands B.V.
- Dirk De Vries
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic apparatus, device manufacturing method and substrate
- Patent number 7,307,687
- Issue date Dec 11, 2007
- ASML Netherlands B.V.
- Johannes Anna Quaedackers
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
Producing a Marker Pattern and Measurement of an Exposure-Related P...
- Publication number 20100328636
- Publication date Dec 30, 2010
- ASML NETHERLANDS B.V.
- Johannes Anna Quaedackers
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Immersion lithography
- Publication number 20090170041
- Publication date Jul 2, 2009
- ASML NETHERLANDS B.V.
- Dirk De Vries
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Lithographic apparatus, device manufacturing method and substrate
- Publication number 20070216883
- Publication date Sep 20, 2007
- ASML NETHERLANDS B.V.
- Johannes Anna Quaedackers
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY