Michikazu MORIMOTO

Person

  • Kudamatsu, JP

Patents Grantslast 30 patents

Patents Applicationslast 30 patents

  • Information Patent Application

    PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

    • Publication number 20230187174
    • Publication date Jun 15, 2023
    • Takayuki Tokunaga
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Application

    PLASMA PROCESSING APPARATUS

    • Publication number 20200161092
    • Publication date May 21, 2020
    • Hitachi High-Technologies Corporation
    • Yoshiharu Inoue
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Application

    PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

    • Publication number 20180337022
    • Publication date Nov 22, 2018
    • Hitachi High-Technologies Corporation
    • Michikazu Morimoto
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Application

    PLASMA PROCESSING APPARATUS

    • Publication number 20170040143
    • Publication date Feb 9, 2017
    • Hitachi High-Technologies Corporation
    • Yasuo OHGOSHI
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Application

    PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

    • Publication number 20170025289
    • Publication date Jan 26, 2017
    • Hitachi High-Technologies Corporation
    • Michikazu Morimoto
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Application

    PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

    • Publication number 20160254163
    • Publication date Sep 1, 2016
    • Hitachi High-Technologies Corporation
    • Nanako TAMARI
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Application

    PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

    • Publication number 20160233057
    • Publication date Aug 11, 2016
    • Hitachi High-Technologies Corporation
    • Michikazu Morimoto
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Application

    PLASMA PROCESSING APPARATUS

    • Publication number 20160225587
    • Publication date Aug 4, 2016
    • Hitachi High-Technologies Corporation
    • Yoshiharu Inoue
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Application

    PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

    • Publication number 20160181131
    • Publication date Jun 23, 2016
    • Hitachi High-Technologies Corporation
    • Michikazu Morimoto
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Application

    PLASMA PROCESSING APPARATUS

    • Publication number 20160079107
    • Publication date Mar 17, 2016
    • Hitachi High-Technologies Corporation
    • Tooru ARAMAKI
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Application

    PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

    • Publication number 20150170886
    • Publication date Jun 18, 2015
    • Hitachi High-Technologies Corporation
    • Michikazu MORIMOTO
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Application

    Plasma Processing Apparatus and Plasma Processing Method

    • Publication number 20150144594
    • Publication date May 28, 2015
    • Hitachi High-Technologies Corporation
    • Shunsuke Kanazawa
    • C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
  • Information Patent Application

    PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

    • Publication number 20140363977
    • Publication date Dec 11, 2014
    • Hitachi High-Technologies Corporation
    • Michikazu Morimoto
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Application

    PLASMA PROCESSING METHOD

    • Publication number 20140349418
    • Publication date Nov 27, 2014
    • Yoshiharu INOUE
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Application

    Plasma Etching Method

    • Publication number 20140220785
    • Publication date Aug 7, 2014
    • Hitachi High-Technologies Corporation
    • Tomoyuki WATANABE
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Application

    PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

    • Publication number 20140148016
    • Publication date May 29, 2014
    • Hitachi High-Technologies Corporation
    • Shunsuke Kanazawa
    • C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
  • Information Patent Application

    PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

    • Publication number 20140057445
    • Publication date Feb 27, 2014
    • Hitachi High-Technologies Corporation
    • Michikazu MORIMOTO
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Application

    PLASMA PROCESSING APPARATUS

    • Publication number 20140020831
    • Publication date Jan 23, 2014
    • Hitachi High-Technologies Corporation
    • Yasuo OHGOSHI
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Application

    PLASMA ETCHING METHOD

    • Publication number 20130157470
    • Publication date Jun 20, 2013
    • Hitachi High-Technologies Corporation
    • Tomoyuki WATANABE
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Application

    PLASMA ETCHING METHOD

    • Publication number 20130109184
    • Publication date May 2, 2013
    • Hitachi High-Technologies Corporation
    • Tomoyuki WATANABE
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Application

    PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS

    • Publication number 20130029492
    • Publication date Jan 31, 2013
    • Hitachi High-Technologies Corporation
    • Yoshiharu INOUE
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Application

    PLASMA PROCESSING METHOD

    • Publication number 20130001197
    • Publication date Jan 3, 2013
    • Hitachi High-Technologies Corporation
    • Yoshiharu INOUE
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Application

    PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

    • Publication number 20120252219
    • Publication date Oct 4, 2012
    • Hitachi High-Technologies Corporation
    • Michikazu MORIMOTO
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Application

    PLASMA ETCHING METHOD

    • Publication number 20120003838
    • Publication date Jan 5, 2012
    • Hitachi High-Technologies Corporation
    • Kazumasa Ookuma
    • H01 - BASIC ELECTRIC ELEMENTS