Michiko NAKAYA

Person

Nirasaki City, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Plasma processing method
- Patent number 12,080,521
- Issue date Sep 3, 2024
- Tokyo Electron Limited
- Michiko Nakaya
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing method and plasma processing apparatus
- Patent number 12,071,687
- Issue date Aug 27, 2024
- Tokyo Electron Limited
- Michiko Nakaya
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Etching method and plasma processing apparatus
- Patent number 11,804,379
- Issue date Oct 31, 2023
- Tokyo Electron Limited
- Taku Gohira
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing method
- Patent number 11,749,508
- Issue date Sep 5, 2023
- Tokyo Electron Limited
- Michiko Nakaya
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Treatment method
- Patent number 11,728,176
- Issue date Aug 15, 2023
- Tokyo Electron Limited
- Kiyohito Ito
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Film deposition method and plasma processing apparatus
- Patent number 11,699,614
- Issue date Jul 11, 2023
- Tokyo Electron Limited
- Michiko Nakaya
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma processing method and plasma processing apparatus
- Patent number 11,459,655
- Issue date Oct 4, 2022
- Tokyo Electron Limited
- Michiko Nakaya
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Substrate processing method and substrate processing apparatus
- Patent number 10,886,138
- Issue date Jan 5, 2021
- Tokyo Electron Limited
- Timothy Tianshyun Yang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Processing method and plasma processing apparatus
- Patent number 10,651,044
- Issue date May 12, 2020
- Tokyo Electron Limited
- Michiko Nakaya
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor manufacturing method and plasma processing apparatus
- Patent number 10,504,741
- Issue date Dec 10, 2019
- Tokyo Electron Limited
- Michiko Nakaya
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Abnormality detection system, abnormality detection method, recordi...
- Patent number 8,751,196
- Issue date Jun 10, 2014
- Tokyo Electron Limited
- Tsuyoshi Moriya
- A61 - MEDICAL OR VETERINARY SCIENCE HYGIENE
Information Patent Grant
Plasma processing method and computer readable storage medium
- Patent number 8,263,499
- Issue date Sep 11, 2012
- Tokyo Electron Limited
- Masanobu Honda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus
- Patent number 8,251,011
- Issue date Aug 28, 2012
- Tokyo Electron Limited
- Yohei Yamazawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Processing method and plasma etching method
- Patent number 7,902,078
- Issue date Mar 8, 2011
- Tokyo Electron Limited
- Michiko Nakaya
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus
- Patent number 7,527,016
- Issue date May 5, 2009
- Tokyo Electron Limited
- Yohei Yamazawa
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
PLASMA PROCESSING METHOD
- Publication number 20230360891
- Publication date Nov 9, 2023
- TOKYO ELECTRON LIMITED
- Michiko NAKAYA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS
- Publication number 20220411928
- Publication date Dec 29, 2022
- TOKYO ELECTRO LIMITED
- Michiko NAKAYA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
ETCHING METHOD AND PLASMA PROCESSING APPARATUS
- Publication number 20220059361
- Publication date Feb 24, 2022
- TOKYO ELECTRON LIMITED
- Michiko NAKAYA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ETCHING METHOD AND PLASMA PROCESSING APPARATUS
- Publication number 20220059360
- Publication date Feb 24, 2022
- TOKYO ELECTRON LIMITED
- Taku Gohira
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TREATMENT METHOD
- Publication number 20210313187
- Publication date Oct 7, 2021
- TOKYO ELECTRON LIMITED
- Kiyohito ITO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING METHOD
- Publication number 20210265135
- Publication date Aug 26, 2021
- TOKYO ELECTRON LIMITED
- Michiko NAKAYA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS
- Publication number 20200032395
- Publication date Jan 30, 2020
- TOKYO ELECTRON LIMITED
- Michiko NAKAYA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS
- Publication number 20190355588
- Publication date Nov 21, 2019
- TOKYO ELECTRON LIMITED
- Timothy Tianshyun Yang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PROCESSING METHOD AND PLASMA PROCESSING APPARATUS
- Publication number 20180247826
- Publication date Aug 30, 2018
- TOKYO ELECTRON LIMITED
- Michiko NAKAYA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR MANUFACTURING METHOD AND PLASMA PROCESSING APPARATUS
- Publication number 20180247827
- Publication date Aug 30, 2018
- TOKYO ELECTRON LIMITED
- Michiko NAKAYA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FILM DEPOSITION METHOD AND PLASMA PROCESSING APPARATUS
- Publication number 20180247858
- Publication date Aug 30, 2018
- TOKYO ELECTRON LIMITED
- Michiko NAKAYA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
ABNORMALITY DETECTING UNIT AND ABNORMALITY DETECTING METHOD
- Publication number 20130056154
- Publication date Mar 7, 2013
- TOKYO ELECTRON LIMITED
- Michiko NAKAYA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ABNORMALITY DETECTION SYSTEM, ABNORMALITY DETECTION METHOD, AND REC...
- Publication number 20120109582
- Publication date May 3, 2012
- TOKYO ELECTRON LIMITED
- Tsuyoshi Moriya
- A61 - MEDICAL OR VETERINARY SCIENCE HYGIENE
Information Patent Application
PLASMA ETCHING APPARATUS AND METHOD
- Publication number 20100144157
- Publication date Jun 10, 2010
- TOKYO ELECTRON LIMITED
- Michiko Nakaya
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING METHOD AND COMPUTER READABLE STORAGE MEDIUM
- Publication number 20090275207
- Publication date Nov 5, 2009
- TOKYO ELECTRON LIMITED
- Masanobu HONDA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20070236148
- Publication date Oct 11, 2007
- Yohei Yamazawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA ETCHING APPARATUS AND METHOD
- Publication number 20070202701
- Publication date Aug 30, 2007
- TOKYO ELECTRON LIMITED
- Michiko Nakaya
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PROCESSING METHOD AND PLASMA ETCHING METHOD
- Publication number 20070197041
- Publication date Aug 23, 2007
- TOKYO ELECTRON LIMITED
- Michiko NAKAYA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma processing apparatus
- Publication number 20040035365
- Publication date Feb 26, 2004
- Yohei Yamazawa
- H01 - BASIC ELECTRIC ELEMENTS

Michiko NAKAYA

Person

Patents Grantslast 30 patents

Plasma processing method

Plasma processing method and plasma processing apparatus

Etching method and plasma processing apparatus

Plasma processing method

Treatment method

Film deposition method and plasma processing apparatus

Plasma processing method and plasma processing apparatus

Substrate processing method and substrate processing apparatus

Processing method and plasma processing apparatus

Semiconductor manufacturing method and plasma processing apparatus

Abnormality detection system, abnormality detection method, recordi...

Plasma processing method and computer readable storage medium

Plasma processing apparatus

Processing method and plasma etching method

Plasma processing apparatus

Patents Applicationslast 30 patents

PLASMA PROCESSING METHOD

PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS

ETCHING METHOD AND PLASMA PROCESSING APPARATUS

ETCHING METHOD AND PLASMA PROCESSING APPARATUS

TREATMENT METHOD

PLASMA PROCESSING METHOD

PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS

SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS

PROCESSING METHOD AND PLASMA PROCESSING APPARATUS

SEMICONDUCTOR MANUFACTURING METHOD AND PLASMA PROCESSING APPARATUS

FILM DEPOSITION METHOD AND PLASMA PROCESSING APPARATUS

ABNORMALITY DETECTING UNIT AND ABNORMALITY DETECTING METHOD

ABNORMALITY DETECTION SYSTEM, ABNORMALITY DETECTION METHOD, AND REC...

PLASMA ETCHING APPARATUS AND METHOD

PLASMA PROCESSING METHOD AND COMPUTER READABLE STORAGE MEDIUM

PLASMA PROCESSING APPARATUS

PLASMA ETCHING APPARATUS AND METHOD

PROCESSING METHOD AND PLASMA ETCHING METHOD

Plasma processing apparatus