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Plasma CVD apparatus
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Patent number 6,367,411
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Issue date Apr 9, 2002
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Hitachi Maxell, Ltd.
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Yoichi Ogawa
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C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
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Plasma CVD apparatus
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Patent number 6,312,524
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Issue date Nov 6, 2001
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Hitachi Maxell, Ltd.
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Yoichi Ogawa
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C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
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Plasma CVD apparatus
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Patent number 6,044,792
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Issue date Apr 4, 2000
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Hitachi Maxwell, Ltd.
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Yoichi Ogawa
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C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...