Michio Tanaka

Person

Kumamoto-Ken, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Substrate processing method and apparatus
- Patent number 8,231,285
- Issue date Jul 31, 2012
- Tokyo Electron Limited
- Kunie Ogata
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist pattern forming method
- Patent number 7,780,366
- Issue date Aug 24, 2010
- Tokyo Electron Limited
- Kunie Ogata
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Resist pattern forming method
- Patent number 7,648,292
- Issue date Jan 19, 2010
- Tokyo Electron Limited
- Kunie Ogata
Information Patent Grant
Method of setting focus condition at time of exposure, apparatus fo...
- Patent number 7,643,126
- Issue date Jan 5, 2010
- Tokyo Electron Limited
- Michio Tanaka
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist pattern forming apparatus and method thereof
- Patent number 7,488,127
- Issue date Feb 10, 2009
- Tokyo Electron Limited
- Kunie Ogata
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of setting processing condition in photolithography process,...
- Patent number 7,420,650
- Issue date Sep 2, 2008
- Tokyo Electron Limited
- Michio Tanaka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Line width measuring method, substrate processing method, substrate...
- Patent number 7,375,831
- Issue date May 20, 2008
- Tokyo Electron Limited
- Michio Tanaka
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist pattern forming apparatus and method thereof
- Patent number 6,984,477
- Issue date Jan 10, 2006
- Tokyo Electron Limited
- Kunie Ogata
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate inspecting device, coating/developing device and substrat...
- Patent number 6,974,963
- Issue date Dec 13, 2005
- Tokyo Electron Limited
- Michio Tanaka
- G01 - MEASURING TESTING
Information Patent Grant
Managing system, managing method, host computer, and information co...
- Patent number 6,766,209
- Issue date Jul 20, 2004
- Tokyo Electron Limited
- Takashi Aiuchi
- G06 - COMPUTING CALCULATING COUNTING

Patents Applicationslast 30 patents

Information Patent Application
RESIST PATTERN FORMING METHOD
- Publication number 20100047702
- Publication date Feb 25, 2010
- TOKYO ELECTRON LIMITED
- Kunie OGATA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method of setting focus condition at time of exposure, apparatus fo...
- Publication number 20060199090
- Publication date Sep 7, 2006
- TOKYO ELECTRON LIMITED
- Michio Tanaka
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method of setting processing condition in photolithography process,...
- Publication number 20060198633
- Publication date Sep 7, 2006
- TOKYO ELECTRON LIMITED
- Michio Tanaka
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Resist pattern forming apparatus and method thereof
- Publication number 20050271382
- Publication date Dec 8, 2005
- TOKYO ELECTRON LIMITED
- Kunie Ogata
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Coating device and coating method
- Publication number 20050170093
- Publication date Aug 4, 2005
- TOKYO ELECTRON LIMITED
- Gishi Chung
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Position adjusting method and substrate processing system
- Publication number 20050150451
- Publication date Jul 14, 2005
- TOKYO ELECTRON LIMITED
- Michio Tanaka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Line width measuring method, substrate processing method, substrate...
- Publication number 20050141891
- Publication date Jun 30, 2005
- TOKYO ELECTRON LIMITED
- Michio Tanaka
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Substrate inspecting device, coating/developing device and substrat...
- Publication number 20050038618
- Publication date Feb 17, 2005
- Michio Tanaka
- G01 - MEASURING TESTING
Information Patent Application
Managing system, managing method, host computer, and information co...
- Publication number 20030023454
- Publication date Jan 30, 2003
- TOKYO ELECTRON LIMITED
- Takashi Aiuchi
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Resist pattern forming apparatus and method thereof
- Publication number 20020037462
- Publication date Mar 28, 2002
- Kunie Ogata
- H01 - BASIC ELECTRIC ELEMENTS

Michio Tanaka

Person

Patents Grantslast 30 patents

Substrate processing method and apparatus

Resist pattern forming method

Resist pattern forming method

Method of setting focus condition at time of exposure, apparatus fo...

Resist pattern forming apparatus and method thereof

Method of setting processing condition in photolithography process,...

Line width measuring method, substrate processing method, substrate...

Resist pattern forming apparatus and method thereof

Substrate inspecting device, coating/developing device and substrat...

Managing system, managing method, host computer, and information co...

Patents Applicationslast 30 patents

RESIST PATTERN FORMING METHOD

Method of setting focus condition at time of exposure, apparatus fo...

Method of setting processing condition in photolithography process,...

Resist pattern forming apparatus and method thereof

Coating device and coating method

Position adjusting method and substrate processing system

Line width measuring method, substrate processing method, substrate...

Substrate inspecting device, coating/developing device and substrat...

Managing system, managing method, host computer, and information co...

Resist pattern forming apparatus and method thereof