Michiro Sugitani

Person

Niihama, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Manufacturing method of semiconductor device
- Patent number 9,023,720
- Issue date May 5, 2015
- Sen Corporation
- Genshu Fuse
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Manufacturing method of semiconductor device
- Patent number 8,163,635
- Issue date Apr 24, 2012
- Sen Corporation
- Michiro Sugitani
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of controlling mover device
- Patent number 7,597,531
- Issue date Oct 6, 2009
- SEN Corporation, an SHI and Axcelis Company
- Keiji Okada
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Irradiation system with ion beam/charged particle beam
- Patent number 7,315,034
- Issue date Jan 1, 2008
- SEN Corporation, an SHI and Axcelis Company
- Takanori Yagita
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Wafer charge compensation device and ion implantation system having...
- Patent number 7,304,319
- Issue date Dec 4, 2007
- SEN Corporation, an SHI and Axcelis Company
- Hiroshi Kawaguchi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Mover device and semiconductor manufacturing apparatus and method
- Patent number 7,187,143
- Issue date Mar 6, 2007
- Sumitomo Eaton Nova, Corporation
- Keiji Okada
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion implanter and method for controlling the same
- Patent number 6,984,833
- Issue date Jan 10, 2006
- Sumitomo Eaton Nova Corporation
- Makoto Sano
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion beam charge neutralizer and method therefor
- Patent number 6,815,697
- Issue date Nov 9, 2004
- Sumitomo Eaton Nova Corporation
- Makoto Sano
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion beam processing method and apparatus therefor
- Patent number 6,797,968
- Issue date Sep 28, 2004
- Sumitomo Eaton Nova Corporation
- Mitsukuni Tsukihara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion implantation apparatus capable of increasing beam current
- Patent number 6,794,661
- Issue date Sep 21, 2004
- Sumitomo Eaton Nova Corporation
- Mitsukuni Tsukihara
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Ion implantation apparatus suited for low energy ion implantation a...
- Patent number 6,635,889
- Issue date Oct 21, 2003
- Sumitomo Eaton Nova Corporation
- Mitsukuni Tsukihara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion implantation apparatus
- Patent number 6,573,517
- Issue date Jun 3, 2003
- Sumitomo Eaton Nova Corporation
- Michiro Sugitani
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Method and system for optimizing linac operational parameters
- Patent number 6,242,747
- Issue date Jun 5, 2001
- Axcelis Technologies, Inc.
- Michiro Sugitani
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and system for operating a variable aperture in an ion impla...
- Patent number 6,194,734
- Issue date Feb 27, 2001
- Axcelis Technologies, Inc.
- Paul A. Loomis
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE
- Publication number 20120052664
- Publication date Mar 1, 2012
- SEN Corporation
- Genshu FUSE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE
- Publication number 20110136329
- Publication date Jun 9, 2011
- SEN Corporation
- Michiro SUGITANI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Wafer charge compensation device and ion implantation system having...
- Publication number 20060113492
- Publication date Jun 1, 2006
- SUMITOMO EATON NOVA CORPORATION
- Hiroshi Kawaguchi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Irradiation system with ion beam/charged particle beam
- Publication number 20060113467
- Publication date Jun 1, 2006
- SUMITOMO EATON NOVA CORPORATION
- Takanori Yagita
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of controlling mover device, cooperative device of mover dev...
- Publication number 20050188924
- Publication date Sep 1, 2005
- Keiji Okada
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Ion implanter and method for controlling the same
- Publication number 20040251432
- Publication date Dec 16, 2004
- SUMITOMO EATON NOVA CORPORATION
- Makoto Sano
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Mover device and semiconductor manufacturing apparatus and method
- Publication number 20040194565
- Publication date Oct 7, 2004
- Sumitomo Eaton Nova, Corporation
- Keiji Okada
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Ion beam charge neutralizer and method therefor
- Publication number 20030183780
- Publication date Oct 2, 2003
- SUMITOMO EATON NOVA CORPORATION
- Makoto Sano
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Ion beam processing method and apparatus therefor
- Publication number 20030122090
- Publication date Jul 3, 2003
- SUMITOMO EATON NOVA CORPORATION
- Mitsukuni Tsukihara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Ion implantation apparatus capable of increasing beam current
- Publication number 20020179854
- Publication date Dec 5, 2002
- SUMITOMO EATON NOVA CORPORATION
- Mitsukuni Tsukihara
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Application
Ion implantation apparatus suited for low energy ion implantation a...
- Publication number 20020096650
- Publication date Jul 25, 2002
- SUMITOMO EATON NOVA CORPORATION
- Mitsukuni Tsukihara
- H01 - BASIC ELECTRIC ELEMENTS

Michiro Sugitani

Person

Patents Grantslast 30 patents

Manufacturing method of semiconductor device

Manufacturing method of semiconductor device

Method of controlling mover device

Irradiation system with ion beam/charged particle beam

Wafer charge compensation device and ion implantation system having...

Mover device and semiconductor manufacturing apparatus and method

Ion implanter and method for controlling the same

Ion beam charge neutralizer and method therefor

Ion beam processing method and apparatus therefor

Ion implantation apparatus capable of increasing beam current

Ion implantation apparatus suited for low energy ion implantation a...

Ion implantation apparatus

Method and system for optimizing linac operational parameters

Method and system for operating a variable aperture in an ion impla...

Patents Applicationslast 30 patents

MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE

MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE

Wafer charge compensation device and ion implantation system having...

Irradiation system with ion beam/charged particle beam

Method of controlling mover device, cooperative device of mover dev...

Ion implanter and method for controlling the same

Mover device and semiconductor manufacturing apparatus and method

Ion beam charge neutralizer and method therefor

Ion beam processing method and apparatus therefor

Ion implantation apparatus capable of increasing beam current

Ion implantation apparatus suited for low energy ion implantation a...