Michishige Saito

Person

Miyagi, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Forming method of component and substrate processing system
- Patent number 11,981,993
- Issue date May 14, 2024
- Tokyo Electron Limited
- Michishige Saito
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Forming method of component and plasma processing apparatus
- Patent number 11,967,487
- Issue date Apr 23, 2024
- Tokyo Electron Limited
- Michishige Saito
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Film forming apparatus and method for manufacturing part having fil...
- Patent number 11,919,032
- Issue date Mar 5, 2024
- Tokyo Electron Limited
- Takayuki Ishii
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Placing table and substrate processing apparatus
- Patent number 11,764,040
- Issue date Sep 19, 2023
- Tokyo Electron Limited
- Michishige Saito
- F28 - HEAT EXCHANGE IN GENERAL
Information Patent Grant
Plasma processing apparatus and control method
- Patent number 11,742,183
- Issue date Aug 29, 2023
- Tokyo Electron Limited
- Ryuji Hisatomi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing apparatus
- Patent number 11,532,461
- Issue date Dec 20, 2022
- Tokyo Electron Limited
- Michishige Saito
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Upper electrode and plasma processing apparatus
- Patent number 11,515,125
- Issue date Nov 29, 2022
- Tokyo Electron Limited
- Michishige Saito
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
High frequency power supply member and plasma processing apparatus
- Patent number 11,443,922
- Issue date Sep 13, 2022
- Tokyo Electron Limited
- Michishige Saito
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and control method
- Patent number 11,201,034
- Issue date Dec 14, 2021
- Tokyo Electron Limited
- Ryuji Hisatomi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing apparatus and maintenance method thereof
- Patent number 9,613,837
- Issue date Apr 4, 2017
- Tokyo Electron Limited
- Shigeru Senzaki
- B25 - HAND TOOLS PORTABLE POWER-DRIVEN TOOLS MANIPULATORS
Information Patent Grant
Plasma etching method
- Patent number 8,821,742
- Issue date Sep 2, 2014
- Tokyo Electron Limited
- Ryoichi Yoshida
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing method and apparatus
- Patent number 8,512,510
- Issue date Aug 20, 2013
- Tokyo Electron Limited
- Akira Koshiishi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and method
- Patent number 7,506,610
- Issue date Mar 24, 2009
- Tokyo Electron Limited
- Akira Koshiishi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and method, and electrode plate for pla...
- Patent number 7,494,561
- Issue date Feb 24, 2009
- Tokyo Electron Limited
- Akira Koshiishi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Liquid coating apparatus with temperature controlling manifold
- Patent number 6,620,245
- Issue date Sep 16, 2003
- Tokyo Electron Limited
- Seiki Ishida
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
RESTORING METHOD OF CONSUMED COMPONENT
- Publication number 20240254620
- Publication date Aug 1, 2024
- TOKYO ELECTRON LIMITED
- Michishige Saito
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information Patent Application
FORMING METHOD OF COMPONENT AND PLASMA PROCESSING APPARATUS
- Publication number 20240234099
- Publication date Jul 11, 2024
- TOKYO ELECTRON LIMITED
- Michishige Saito
- B28 - WORKING CEMENT, CLAY, OR STONE
Information Patent Application
FILM FORMING APPARATUS AND METHOD FOR MANUFACTURING PART HAVING FIL...
- Publication number 20240207882
- Publication date Jun 27, 2024
- TOKYO ELECTRON LIMITED
- Takayuki ISHII
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
UPPER ELECTRODE AND PLASMA PROCESSING APPARATUS
- Publication number 20230061699
- Publication date Mar 2, 2023
- TOKYO ELECTRON LIMITED
- Michishige Saito
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SUBSTRATE SUPPORT AND SUBSTRATE PROCESSING APPARATUS
- Publication number 20220310367
- Publication date Sep 29, 2022
- TOKYO ELECTRON LIMITED
- Michishige SAITO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND CONTROL METHOD
- Publication number 20220076921
- Publication date Mar 10, 2022
- TOKYO ELECTRON LIMITED
- Ryuji HISATOMI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FILM FORMING APPARATUS AND METHOD FOR MANUFACTURING PART HAVING FIL...
- Publication number 20220062943
- Publication date Mar 3, 2022
- TOKYO ELECTRON LIMITED
- Takayuki ISHII
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
HIGH FREQUENCY POWER SUPPLY MEMBER AND PLASMA PROCESSING APPARATUS
- Publication number 20210398782
- Publication date Dec 23, 2021
- TOKYO ELECTRON LIMITED
- Michishige SAITO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
STAGE AND SUBSTRATE PROCESSING APPARATUS
- Publication number 20210391153
- Publication date Dec 16, 2021
- TOKYO ELECTRON LIMITED
- Takayuki ISHII
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FORMING METHOD OF COMPONENT AND PLASMA PROCESSING APPARATUS
- Publication number 20210366691
- Publication date Nov 25, 2021
- TOKYO ELECTRON LIMITED
- Michishige Saito
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FORMING METHOD OF COMPONENT AND SUBSTRATE PROCESSING SYSTEM
- Publication number 20210366697
- Publication date Nov 25, 2021
- TOKYO ELECTRON LIMITED
- Michishige Saito
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PART FOR SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING SY...
- Publication number 20210178523
- Publication date Jun 17, 2021
- TOKYO ELECTRON LIMITED
- Michishige Saito
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information Patent Application
MEMBER, MANUFACTURING METHOD OF MEMBER AND SUBSTRATE PROCESSING APP...
- Publication number 20210111005
- Publication date Apr 15, 2021
- TOKYO ELECTRON LIMITED
- Takayuki Ishii
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information Patent Application
SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD
- Publication number 20200312623
- Publication date Oct 1, 2020
- TOKYO ELECTRON LIMITED
- Kazuki MOYAMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLACING TABLE AND SUBSTRATE PROCESSING APPARATUS
- Publication number 20200251315
- Publication date Aug 6, 2020
- TOKYO ELECTRON LIMITED
- Michishige Saito
- F28 - HEAT EXCHANGE IN GENERAL
Information Patent Application
PLASMA PROCESSING APPARATUS AND CONTROL METHOD
- Publication number 20200211823
- Publication date Jul 2, 2020
- TOKYO ELECTRON LIMITED
- Ryuji HISATOMI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS
- Publication number 20200126816
- Publication date Apr 23, 2020
- TOKYO ELECTRON LIMITED
- Michishige Saito
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
UPPER ELECTRODE AND PLASMA PROCESSING APPARATUS
- Publication number 20190272977
- Publication date Sep 5, 2019
- TOKYO ELECTRON LIMITED
- Michishige Saito
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
UPPER ELECTRODE STRUCTURE OF PLASMA PROCESSING APPARATUS, PLASMA PR...
- Publication number 20170069470
- Publication date Mar 9, 2017
- TOKYO ELECTRON LIMITED
- Koichi Murakami
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
UPPER ELECTRODE AND PLASMA PROCESSING APPARATUS
- Publication number 20150179405
- Publication date Jun 25, 2015
- TOKYO ELECTRON LIMITED
- Michishige Saito
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SHOWER HEAD ASSEMBLY, PLASMA PROCESSING APPARATUS AND METHOD FOR MA...
- Publication number 20150129112
- Publication date May 14, 2015
- TOKYO ELECTRON LIMITED
- Michishige SAITO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS AND MAINTENANCE METHOD THEREOF
- Publication number 20150086302
- Publication date Mar 26, 2015
- TOKYO ELECTRON LIMITED
- Shigeru Senzaki
- B25 - HAND TOOLS PORTABLE POWER-DRIVEN TOOLS MANIPULATORS
Information Patent Application
PLASMA PROCESSING METHOD AND APPARATUS
- Publication number 20110214813
- Publication date Sep 8, 2011
- Akira Koshiishi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA ETCHING APPARATUS
- Publication number 20100133234
- Publication date Jun 3, 2010
- TOKYO ELECTRON LIMITED
- Ryoichi Yoshida
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING METHOD AND APPARATUS
- Publication number 20100043974
- Publication date Feb 25, 2010
- Akira Koshiishi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma etching apparatus
- Publication number 20060042754
- Publication date Mar 2, 2006
- TOKYO ELECTRON LIMITED
- Ryoichi Yoshida
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma processing method and apparatus
- Publication number 20060000803
- Publication date Jan 5, 2006
- Akira Koshiishi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma processing apparatus and method, and electrode plate for pla...
- Publication number 20050269292
- Publication date Dec 8, 2005
- Akira Koshiishi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma processing apparatus and method
- Publication number 20050257743
- Publication date Nov 24, 2005
- Akira Koshiishi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Substrate processing apparatus
- Publication number 20020011208
- Publication date Jan 31, 2002
- Seiki Ishida
- H01 - BASIC ELECTRIC ELEMENTS

Michishige Saito

Person

Patents Grantslast 30 patents

Forming method of component and substrate processing system

Forming method of component and plasma processing apparatus

Film forming apparatus and method for manufacturing part having fil...

Placing table and substrate processing apparatus

Plasma processing apparatus and control method

Substrate processing apparatus

Upper electrode and plasma processing apparatus

High frequency power supply member and plasma processing apparatus

Plasma processing apparatus and control method

Substrate processing apparatus and maintenance method thereof

Plasma etching method

Plasma processing method and apparatus

Plasma processing apparatus and method

Plasma processing apparatus and method, and electrode plate for pla...

Liquid coating apparatus with temperature controlling manifold

Patents Applicationslast 30 patents

RESTORING METHOD OF CONSUMED COMPONENT

FORMING METHOD OF COMPONENT AND PLASMA PROCESSING APPARATUS

FILM FORMING APPARATUS AND METHOD FOR MANUFACTURING PART HAVING FIL...

UPPER ELECTRODE AND PLASMA PROCESSING APPARATUS

SUBSTRATE SUPPORT AND SUBSTRATE PROCESSING APPARATUS

PLASMA PROCESSING APPARATUS AND CONTROL METHOD

FILM FORMING APPARATUS AND METHOD FOR MANUFACTURING PART HAVING FIL...

HIGH FREQUENCY POWER SUPPLY MEMBER AND PLASMA PROCESSING APPARATUS

STAGE AND SUBSTRATE PROCESSING APPARATUS

FORMING METHOD OF COMPONENT AND PLASMA PROCESSING APPARATUS

FORMING METHOD OF COMPONENT AND SUBSTRATE PROCESSING SYSTEM

PART FOR SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING SY...

MEMBER, MANUFACTURING METHOD OF MEMBER AND SUBSTRATE PROCESSING APP...

SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD

PLACING TABLE AND SUBSTRATE PROCESSING APPARATUS

PLASMA PROCESSING APPARATUS AND CONTROL METHOD

SUBSTRATE PROCESSING APPARATUS

UPPER ELECTRODE AND PLASMA PROCESSING APPARATUS

UPPER ELECTRODE STRUCTURE OF PLASMA PROCESSING APPARATUS, PLASMA PR...

UPPER ELECTRODE AND PLASMA PROCESSING APPARATUS

SHOWER HEAD ASSEMBLY, PLASMA PROCESSING APPARATUS AND METHOD FOR MA...

SUBSTRATE PROCESSING APPARATUS AND MAINTENANCE METHOD THEREOF

PLASMA PROCESSING METHOD AND APPARATUS

PLASMA ETCHING APPARATUS

PLASMA PROCESSING METHOD AND APPARATUS

Plasma etching apparatus

Plasma processing method and apparatus

Plasma processing apparatus and method, and electrode plate for pla...

Plasma processing apparatus and method

Substrate processing apparatus