Michitaka Aita

Person

Miyagi, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Film formation method and film formation device
- Patent number 12,168,825
- Issue date Dec 17, 2024
- Tokyo Electron Limited
- Michitaka Aita
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Gas distribution device and processing apparatus
- Patent number 10,815,568
- Issue date Oct 27, 2020
- Tokyo Electron Limited
- Takumi Kabe
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma processing apparatus
- Patent number 10,665,428
- Issue date May 26, 2020
- Tokyo Electron Limited
- Michitaka Aita
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus
- Patent number 10,504,698
- Issue date Dec 10, 2019
- Tokyo Electron Limited
- Masayuki Kohno
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Selective film forming method and method of manufacturing semicondu...
- Patent number 10,490,443
- Issue date Nov 26, 2019
- Tokyo Electron Limited
- Yumiko Kawano
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus
- Patent number 10,312,057
- Issue date Jun 4, 2019
- Tokyo Electron Limited
- Masayuki Kohno
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus
- Patent number 9,761,418
- Issue date Sep 12, 2017
- Tokyo Electron Limited
- Masayuki Shintaku
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus, power supply unit and mounting table s...
- Patent number 9,646,867
- Issue date May 9, 2017
- Tokyo Electron Limited
- Masahiko Konno
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus
- Patent number 9,574,270
- Issue date Feb 21, 2017
- Tokyo Electron Limited
- Jun Yoshikawa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma processing apparatus
- Patent number 9,343,270
- Issue date May 17, 2016
- Tokyo Electron Limited
- Toshihisa Nozawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing method and plasma processing apparatus
- Patent number 9,324,542
- Issue date Apr 26, 2016
- Tokyo Electron Limited
- Naoki Matsumoto
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20240079208
- Publication date Mar 7, 2024
- TOKYO ELECTRON LIMITED
- Takeshi KOBAYASHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FILM FORMATION METHOD AND FILM FORMATION DEVICE
- Publication number 20220178031
- Publication date Jun 9, 2022
- Tokyo Electron Limited
- Michitaka AITA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
GAS DISTRIBUTION DEVICE AND PROCESSING APPARATUS
- Publication number 20190256976
- Publication date Aug 22, 2019
- TOKYO ELECTRON LIMITED
- Takumi KABE
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Selective Film Forming Method and Method of Manufacturing Semicondu...
- Publication number 20190096750
- Publication date Mar 28, 2019
- TOKYO ELECTRON LIMITED
- Yumiko KAWANO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MICROWAVE PLASMA PROCESSING APPARATUS AND MICROWAVE PLASMA PROCESSI...
- Publication number 20170358835
- Publication date Dec 14, 2017
- TOKYO ELECTRON LIMITED
- Toshio Nakanishi
- G02 - OPTICS
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20170229286
- Publication date Aug 10, 2017
- TOKYO ELECTRON LIMITED
- Michitaka AITA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20160358756
- Publication date Dec 8, 2016
- TOKYO ELECTRON LIMITED
- Michitaka AITA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20160126114
- Publication date May 5, 2016
- TOKYO ELECTRON LIMITED
- Masayuki KOHNO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20160118224
- Publication date Apr 28, 2016
- TOKYO ELECTRON LIMITED
- Masayuki KOHNO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20150294839
- Publication date Oct 15, 2015
- TOKYO ELECTRON LIMITED
- Hiroyuki TAKABA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS
- Publication number 20150228459
- Publication date Aug 13, 2015
- TOKYO ELECTRON LIMITED
- Naoki Matsumoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20150211125
- Publication date Jul 30, 2015
- TOKYO ELECTRON LIMITED
- Jun YOSHIKAWA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA PROCESSING APPARATUS, POWER SUPPLY UNIT AND MOUNTING TABLE S...
- Publication number 20150109716
- Publication date Apr 23, 2015
- TOKYO ELECTRON LIMITED
- Masahiko KONNO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20150107773
- Publication date Apr 23, 2015
- TOKYO ELECTRON LIMITED
- Masayuki SHINTAKU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20140238607
- Publication date Aug 28, 2014
- TOKYO ELECTRON LIMITED
- Toshihisa NOZAWA
- H01 - BASIC ELECTRIC ELEMENTS

Michitaka Aita

Person

Patents Grantslast 30 patents

Film formation method and film formation device

Gas distribution device and processing apparatus

Plasma processing apparatus

Plasma processing apparatus

Selective film forming method and method of manufacturing semicondu...

Plasma processing apparatus

Plasma processing apparatus

Plasma processing apparatus, power supply unit and mounting table s...

Plasma processing apparatus

Plasma processing apparatus

Plasma processing method and plasma processing apparatus

Patents Applicationslast 30 patents

PLASMA PROCESSING APPARATUS

FILM FORMATION METHOD AND FILM FORMATION DEVICE

GAS DISTRIBUTION DEVICE AND PROCESSING APPARATUS

Selective Film Forming Method and Method of Manufacturing Semicondu...

MICROWAVE PLASMA PROCESSING APPARATUS AND MICROWAVE PLASMA PROCESSI...

PLASMA PROCESSING APPARATUS

PLASMA PROCESSING APPARATUS

PLASMA PROCESSING APPARATUS

PLASMA PROCESSING APPARATUS

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS

PLASMA PROCESSING APPARATUS

PLASMA PROCESSING APPARATUS, POWER SUPPLY UNIT AND MOUNTING TABLE S...

PLASMA PROCESSING APPARATUS

PLASMA PROCESSING APPARATUS