Michitaka Ootani

Person

Saitama, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Solvent composition
- Patent number 11,987,772
- Issue date May 21, 2024
- Central Glass Company, Limited
- Kanako Osafune
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Grant
Process for preparation of 2-fluoroacrylic esters
- Patent number 8,450,520
- Issue date May 28, 2013
- Central Glass Company, Limited
- Akihiro Ishii
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Fluorine-containing cyclic compound, fluorine-containing polymer co...
- Patent number 8,115,036
- Issue date Feb 14, 2012
- Central Glass Company, Limited
- Haruhiko Komoriya
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Fluorine-containing cyclic compound, fluorine-containing polymer co...
- Patent number 7,736,835
- Issue date Jun 15, 2010
- Central Glass Company, Limited
- Haruhiko Komoriya
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Ester compound, polymer, resist composition, and patterning process
- Patent number 7,666,967
- Issue date Feb 23, 2010
- Shin-Etsu Chemical Co., Ltd.
- Yuji Harada
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Resist protective coating material and patterning process
- Patent number 7,569,323
- Issue date Aug 4, 2009
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Polymer, resist composition and patterning process
- Patent number 7,488,567
- Issue date Feb 10, 2009
- Panasonic Corporation
- Yuji Harada
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Top coat composition
- Patent number 7,402,626
- Issue date Jul 22, 2008
- Central Glass Company, Limited
- Kazuhiko Maeda
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Polymer, resist composition and patterning process
- Patent number 7,378,218
- Issue date May 27, 2008
- Shin-Etsu Chemical Co., Ltd.
- Yuji Harada
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Polymer, resist protective coating material, and patterning process
- Patent number 7,354,693
- Issue date Apr 8, 2008
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Polymerizable ester compounds
- Patent number 7,276,623
- Issue date Oct 2, 2007
- Shin-Etsu Chemical Co., Ltd.
- Yuji Harada
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Polymers, resist compositions and patterning process
- Patent number 7,169,869
- Issue date Jan 30, 2007
- Shin-Etsu Chemical Co., Ltd.
- Yuji Harada
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Polymers, resist compositions and patterning process
- Patent number 7,005,228
- Issue date Feb 28, 2006
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Polymers, resist compositions and patterning process
- Patent number 6,946,235
- Issue date Sep 20, 2005
- Shin-Etsu Chemical Co., Ltd.
- Yuji Harada
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Polymers, resist compositions and patterning process
- Patent number 6,933,095
- Issue date Aug 23, 2005
- Shin-Etsu Chemical Co., Ltd.
- Yuji Harada
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Esters, polymers, resist compositions and patterning process
- Patent number 6,916,592
- Issue date Jul 12, 2005
- Shin-Etsu Chemical Co., Ltd.
- Yuji Harada
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Polymers, resist compositions and patterning process
- Patent number 6,872,514
- Issue date Mar 29, 2005
- Shin-Etsu Chemical Co., Ltd.
- Yuji Harada
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Polymers, resist compositions and patterning process
- Patent number 6,864,037
- Issue date Mar 8, 2005
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Polymers, resist compositions and patterning process
- Patent number 6,861,197
- Issue date Mar 1, 2005
- Shin-Etsu Chemical Co., Ltd.
- Yuji Harada
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Chemically amplified resist compositions and patterning process
- Patent number 6,855,477
- Issue date Feb 15, 2005
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Polymers, resist compositions and patterning process
- Patent number 6,824,955
- Issue date Nov 30, 2004
- Shin-Etsu Chemical Co., Ltd.
- Yuji Harada
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Resist compositions and patterning process
- Patent number 6,790,586
- Issue date Sep 14, 2004
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Positive resist composition and process for forming resist pattern...
- Patent number 6,723,485
- Issue date Apr 20, 2004
- Central Glass Company, Limited
- Kentaro Tsutsumi
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Polymers, resist compositions and patterning process
- Patent number 6,710,148
- Issue date Mar 23, 2004
- Shin-Etsu Chemical Co., Ltd.
- Yuji Harada
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Ester compounds
- Patent number 6,680,389
- Issue date Jan 20, 2004
- Sihn-Etsu Chemical Co., Ltd.
- Yuji Harada
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Ester compounds
- Patent number 6,603,037
- Issue date Aug 5, 2003
- Shin-Etsu Chemical Co., Ltd.
- Yuji Harada
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Polymers, resist compositions and patterning process
- Patent number 6,582,880
- Issue date Jun 24, 2003
- Shin-Etsu Chemical Co., Ltd.
- Yuji Harada
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Polymers, resist compositions and patterning process
- Patent number 6,511,787
- Issue date Jan 28, 2003
- Shin-Etsu Chemical Co., Ltd.
- Yuji Harada
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Octafluorotricyclodecane derivatives and processes for producing same
- Patent number 6,414,167
- Issue date Jul 2, 2002
- Central Glass Company, Limited
- Satoru Miyazawa
- C07 - ORGANIC CHEMISTRY

Patents Applicationslast 30 patents

Information Patent Application
SOLVENT COMPOSITION
- Publication number 20210238507
- Publication date Aug 5, 2021
- Central Glass Company, Limited
- Kanako OSAFUNE
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Process for Preparation of 2-Fluoroacrylic Esters
- Publication number 20120059187
- Publication date Mar 8, 2012
- Central Glass Company, Limited
- Akihiro Ishii
- C07 - ORGANIC CHEMISTRY
Information Patent Application
Fluorine-Containing Cyclic Compound, Fluorine-Containing Polymer Co...
- Publication number 20100204422
- Publication date Aug 12, 2010
- Central Glass Company, Limited
- Haruhiko Komoriya
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Fluorine-Containing Cyclic Compound, Fluorine-Containing Polymer Co...
- Publication number 20080003517
- Publication date Jan 3, 2008
- Central Glass Company, Limited
- Haruhiko Komoriya
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Novel ester compound, polymer, resist composition, and patterning p...
- Publication number 20070128555
- Publication date Jun 7, 2007
- Central Glass Co., Ltd.
- Yuji Harada
- C07 - ORGANIC CHEMISTRY
Information Patent Application
Process for producing top coat film used in lithography
- Publication number 20070087125
- Publication date Apr 19, 2007
- Central Glass Company, Limited
- Kazuhiko Maeda
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Resist protective coating material and patterning process
- Publication number 20070026341
- Publication date Feb 1, 2007
- SHIN-ETSU CHEMICAL CO., LTD.
- Jun Hatakeyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Novel polymerizable ester compounds
- Publication number 20060269870
- Publication date Nov 30, 2006
- Shin-Etsu Chemical Co., Ltd.
- Yuji Harada
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Polymer, resist composition and patterning process
- Publication number 20060269871
- Publication date Nov 30, 2006
- MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD.
- Yuji Harada
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Polymer, resist composition and patterning process
- Publication number 20060177765
- Publication date Aug 10, 2006
- Shin-Etsu Chemical Co., Ltd.
- Yuji Harada
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Polymer, resist protective coating material, and patterning process
- Publication number 20060029884
- Publication date Feb 9, 2006
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Polymers, resist compositions and patterning process
- Publication number 20050267275
- Publication date Dec 1, 2005
- Yuji Harada
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Top coat composition
- Publication number 20050250898
- Publication date Nov 10, 2005
- Central Glass Company, Limited
- Kazuhiko Maeda
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
Polymers, resist compositions and patterning process
- Publication number 20040030079
- Publication date Feb 12, 2004
- Yuji Harada
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Fluorinated polymer
- Publication number 20040023176
- Publication date Feb 5, 2004
- Yuji Harada
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Novel esters, polymers, resist compositions and patterning process
- Publication number 20030219678
- Publication date Nov 27, 2003
- Yuji Harada
- C07 - ORGANIC CHEMISTRY
Information Patent Application
Polymers, resist compositions and patterning process
- Publication number 20030215739
- Publication date Nov 20, 2003
- Yuji Harada
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Polymers, resist compositions and patterning process
- Publication number 20030165773
- Publication date Sep 4, 2003
- Yuji Harada
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Chemically amplified resist compositions and patterning process
- Publication number 20030099901
- Publication date May 29, 2003
- Jun Hatakeyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
NOVEL ESTER COMPOUNDS
- Publication number 20030100791
- Publication date May 29, 2003
- Yuji Harada
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Polymers, resist compositions and patterning process
- Publication number 20030082479
- Publication date May 1, 2003
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Polymers, resist compositions and patterning process
- Publication number 20030031953
- Publication date Feb 13, 2003
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Application
Polymers, resist compositions and patterning process
- Publication number 20030031952
- Publication date Feb 13, 2003
- Shin-Etsu Chemical Co., Ltd.
- Yuji Harada
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Polymers, resist compositions and patterning process
- Publication number 20030008231
- Publication date Jan 9, 2003
- Shin-Etsu Chemical Co., Ltd.
- Yuji Harada
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Novel ester compounds
- Publication number 20020198390
- Publication date Dec 26, 2002
- Shin-Etsu Chemical Co., Ltd.
- Yuji Harada
- C07 - ORGANIC CHEMISTRY
Information Patent Application
Polymers, resist compositions and patterning process
- Publication number 20020161148
- Publication date Oct 31, 2002
- Shin-Etsu Chemical Co., Ltd.
- Yuji Harada
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Polymers, resist compositions and patterning process
- Publication number 20020051936
- Publication date May 2, 2002
- Shin-Etsu Chemical Co., Ltd.
- Yuji Harada
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Resist compositions and patterning process
- Publication number 20020051935
- Publication date May 2, 2002
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Application
Polymers, resist compositions and patterning process
- Publication number 20020048724
- Publication date Apr 25, 2002
- Shin-Etsu Chemical Co., Ltd.
- Yuji Harada
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Application
Octafluorotricyclodecane derivatives and processes for producing same
- Publication number 20020022740
- Publication date Feb 21, 2002
- Satoru Miyazawa
- C07 - ORGANIC CHEMISTRY

Michitaka Ootani

Person

Patents Grantslast 30 patents

Solvent composition

Process for preparation of 2-fluoroacrylic esters

Fluorine-containing cyclic compound, fluorine-containing polymer co...

Fluorine-containing cyclic compound, fluorine-containing polymer co...

Ester compound, polymer, resist composition, and patterning process

Resist protective coating material and patterning process

Polymer, resist composition and patterning process

Top coat composition

Polymer, resist composition and patterning process

Polymer, resist protective coating material, and patterning process

Polymerizable ester compounds

Polymers, resist compositions and patterning process

Polymers, resist compositions and patterning process

Polymers, resist compositions and patterning process

Polymers, resist compositions and patterning process

Esters, polymers, resist compositions and patterning process

Polymers, resist compositions and patterning process

Polymers, resist compositions and patterning process

Polymers, resist compositions and patterning process

Chemically amplified resist compositions and patterning process

Polymers, resist compositions and patterning process

Resist compositions and patterning process

Positive resist composition and process for forming resist pattern...

Polymers, resist compositions and patterning process

Ester compounds

Ester compounds

Polymers, resist compositions and patterning process

Polymers, resist compositions and patterning process

Octafluorotricyclodecane derivatives and processes for producing same

Patents Applicationslast 30 patents

SOLVENT COMPOSITION

Process for Preparation of 2-Fluoroacrylic Esters

Fluorine-Containing Cyclic Compound, Fluorine-Containing Polymer Co...

Fluorine-Containing Cyclic Compound, Fluorine-Containing Polymer Co...

Novel ester compound, polymer, resist composition, and patterning p...

Process for producing top coat film used in lithography

Resist protective coating material and patterning process

Novel polymerizable ester compounds

Polymer, resist composition and patterning process

Polymer, resist composition and patterning process

Polymer, resist protective coating material, and patterning process

Polymers, resist compositions and patterning process

Top coat composition

Polymers, resist compositions and patterning process

Fluorinated polymer

Novel esters, polymers, resist compositions and patterning process

Polymers, resist compositions and patterning process

Polymers, resist compositions and patterning process

Chemically amplified resist compositions and patterning process

NOVEL ESTER COMPOUNDS

Polymers, resist compositions and patterning process

Polymers, resist compositions and patterning process

Polymers, resist compositions and patterning process

Polymers, resist compositions and patterning process

Novel ester compounds

Polymers, resist compositions and patterning process

Polymers, resist compositions and patterning process

Resist compositions and patterning process

Polymers, resist compositions and patterning process

Octafluorotricyclodecane derivatives and processes for producing same