Miguel GARCIA GRANDA

Person

Veldhoven, NL

People

Patents Grantslast 30 patents

Information Patent Grant
Metrology apparatus and method for determining a characteristic rel...
- Patent number 11,385,554
- Issue date Jul 12, 2022
- ASML Netherlands B.V.
- Miguel Garcia Granda
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Methods and patterning devices and apparatuses for measuring focus...
- Patent number 10,895,811
- Issue date Jan 19, 2021
- ASML Netherlands B.V.
- Miguel Garcia Granda
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Metrology robustness based on through-wavelength similarity
- Patent number 10,871,716
- Issue date Dec 22, 2020
- ASML Netherlands B.V.
- Miguel Garcia Granda
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of calibrating focus measurements, measurement method and me...
- Patent number 10,571,812
- Issue date Feb 25, 2020
- ASML Netherlands B.V.
- Fahong Li
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Metrology robustness based on through-wavelength similarity
- Patent number 10,394,132
- Issue date Aug 27, 2019
- ASML Netherlands B.V.
- Miguel Garcia Granda
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and apparatus for determining lithographic quality of a stru...
- Patent number 9,518,936
- Issue date Dec 13, 2016
- ASML Netherlands B.V.
- Willem Jan Grootjans
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
Methods and Patterning Devices and Apparatuses for Measuring Focus...
- Publication number 20200117101
- Publication date Apr 16, 2020
- ASML NETHERLANDS B.V.
- Miguel GARCIA GRANDA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Metrology Apparatus and Method for Determining a Characteristic Rel...
- Publication number 20200026182
- Publication date Jan 23, 2020
- ASML NETHERLANDS B.V.
- Miguel GARCIA GRANDA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METROLOGY ROBUSTNESS BASED ON THROUGH-WAVELENGTH SIMILARITY
- Publication number 20190377264
- Publication date Dec 12, 2019
- ASML NETHERLANDS B.V.
- Miguel GARCIA GRANDA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METROLOGY ROBUSTNESS BASED ON THROUGH-WAVELENGTH SIMILARITY
- Publication number 20190129319
- Publication date May 2, 2019
- ASML NETHERLANDS B.V.
- Miguel GARCIA GRANDA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method of Calibrating Focus Measurements, Measurement Method and Me...
- Publication number 20190056673
- Publication date Feb 21, 2019
- ASML NETHERLANDS B.V.
- Fahong LI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method and Apparatus for Determining Lithographic Quality of a Stru...
- Publication number 20150308966
- Publication date Oct 29, 2015
- ASML Nertherlands B.V
- Willem Jan GROOTJANS
- G01 - MEASURING TESTING

Miguel GARCIA GRANDA

Person

Patents Grantslast 30 patents

Metrology apparatus and method for determining a characteristic rel...

Methods and patterning devices and apparatuses for measuring focus...

Metrology robustness based on through-wavelength similarity

Method of calibrating focus measurements, measurement method and me...

Metrology robustness based on through-wavelength similarity

Method and apparatus for determining lithographic quality of a stru...

Patents Applicationslast 30 patents

Methods and Patterning Devices and Apparatuses for Measuring Focus...

Metrology Apparatus and Method for Determining a Characteristic Rel...

METROLOGY ROBUSTNESS BASED ON THROUGH-WAVELENGTH SIMILARITY

METROLOGY ROBUSTNESS BASED ON THROUGH-WAVELENGTH SIMILARITY

Method of Calibrating Focus Measurements, Measurement Method and Me...

Method and Apparatus for Determining Lithographic Quality of a Stru...