Mihaela BALSEANU

Person

Sunnyvale, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Sequential plasma and thermal treatment
- Patent number 12,142,475
- Issue date Nov 12, 2024
- Applied Materials, Inc.
- Ning Li
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Methods and apparatus for deposition of low-k films
- Patent number 11,990,332
- Issue date May 21, 2024
- Applied Materials, Inc.
- Bhaskar Jyoti Bhuyan
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Deposition of low-k films
- Patent number 11,970,777
- Issue date Apr 30, 2024
- Applied Materials, Inc.
- Shuaidi Zhang
- C01 - INORGANIC CHEMISTRY
Information Patent Grant
Silyl pseudohalides for silicon containing films
- Patent number 11,932,940
- Issue date Mar 19, 2024
- Applied Materials, Inc.
- Keenan N. Woods
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Confined charge trap layer
- Patent number 11,930,637
- Issue date Mar 12, 2024
- Applied Materials, Inc.
- Chang Seok Kang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods and systems to modulate film stress
- Patent number 11,887,818
- Issue date Jan 30, 2024
- Applied Materials, Inc.
- Tsutomu Tanaka
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Methods and precursors for selective deposition of metal films
- Patent number 11,887,847
- Issue date Jan 30, 2024
- Applied Materials, Inc.
- Kurt Fredrickson
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Low temperature silicon nitride/silicon oxynitride stack film with...
- Patent number 11,800,824
- Issue date Oct 24, 2023
- Applied Materials, Inc.
- Maribel Maldonado-Garcia
Information Patent Grant
Multilayer encapsulation stacks by atomic layer deposition
- Patent number 11,732,356
- Issue date Aug 22, 2023
- Applied Materials, Inc.
- Cong Trinh
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Low-k films
- Patent number 11,713,507
- Issue date Aug 1, 2023
- Applied Materials, Inc.
- Shuaidi Zhang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma induced modification of silicon carbide surface
- Patent number 11,692,267
- Issue date Jul 4, 2023
- Applied Materials, Inc.
- Francis Kanyiri Mungai
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Susceptor wafer chucks for bowed wafers
- Patent number 11,581,213
- Issue date Feb 14, 2023
- Applied Materials, Inc.
- Abhishek Chowdhury
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Methods and precursors for selective deposition of metal films
- Patent number 11,515,151
- Issue date Nov 29, 2022
- Applied Materials, Inc.
- Kurt Fredrickson
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Deposition of low-κ films
- Patent number 11,447,865
- Issue date Sep 20, 2022
- Applied Materials, Inc.
- Shuaidi Zhang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Low-k films
- Patent number 11,371,144
- Issue date Jun 28, 2022
- Applied Materials, Inc.
- Shuaidi Zhang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Selective deposition of SiCON by plasma ALD
- Patent number 11,359,281
- Issue date Jun 14, 2022
- Applied Materials, Inc.
- Shuaidi Zhang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of forming self-aligned via
- Patent number 11,270,914
- Issue date Mar 8, 2022
- Applied Materials Inc.
- Suketu Arun Parikh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Sequential deposition and high frequency plasma treatment of deposi...
- Patent number 11,217,443
- Issue date Jan 4, 2022
- Applied Materials, Inc.
- Vinayak Veer Vats
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Self-aligned double patterning with spatial atomic layer deposition
- Patent number 11,164,753
- Issue date Nov 2, 2021
- Applied Materials, Inc.
- Ning Li
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Methods and systems to modulate film stress
- Patent number 11,158,489
- Issue date Oct 26, 2021
- Applied Materials, Inc.
- Tsutomu Tanaka
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Seamless gapfill with dielectric ALD films
- Patent number 11,133,178
- Issue date Sep 28, 2021
- Applied Materials, Inc.
- Mihaela Balseanu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Atomic layer deposition of films comprising silicon, carbon and nit...
- Patent number 11,028,478
- Issue date Jun 8, 2021
- Applied Materials, Inc.
- Victor Nguyen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Methods and apparatus for low temperature silicon nitride films
- Patent number 11,017,997
- Issue date May 25, 2021
- Applied Materials, Inc.
- Wenbo Yan
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method and apparatus for deposition of low-k films
- Patent number 10,957,532
- Issue date Mar 23, 2021
- Applied Materials, Inc.
- Ning Li
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of forming self-aligned via
- Patent number 10,923,396
- Issue date Feb 16, 2021
- Applied Materials, Inc.
- Suketu Arun Parikh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method to fabricate thermally stable low K-FinFET spacer
- Patent number 10,714,331
- Issue date Jul 14, 2020
- Applied Materials, Inc.
- Mihaela Balseanu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Cap layer for bit line resistance reduction
- Patent number 10,700,072
- Issue date Jun 30, 2020
- Applied Materials, Inc.
- Priyadarshi Panda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of forming self-aligned via
- Patent number 10,629,484
- Issue date Apr 21, 2020
- Applied Materials, Inc.
- Suketu Arun Parikh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for deposition of low-k films
- Patent number 10,453,678
- Issue date Oct 22, 2019
- Applied Materials, Inc.
- Ning Li
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Selective deposition of silicon nitride films for spacer applications
- Patent number 10,319,583
- Issue date Jun 11, 2019
- Applied Materials, Inc.
- Ning Li
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents

Information Patent Application
CONFINED CHARGE TRAP LAYER
- Publication number 20240206172
- Publication date Jun 20, 2024
- Applied Materials, Inc.
- Chang Seok Kang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Methods and Precursors for Selective Deposition of Metal Films
- Publication number 20230170210
- Publication date Jun 1, 2023
- Applied Materials, Inc.
- Kurt Fredrickson
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
APPARATUS AND METHODS TO REDUCE PARTICLES IN A FILM DEPOSITION CHAMBER
- Publication number 20230096772
- Publication date Mar 30, 2023
- Applied Materials, Inc.
- Maribel Maldonado-Garcia
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHODS AND APPARATUS FOR SELECTIVE ETCH STOP CAPPING AND SELECTIVE...
- Publication number 20230010568
- Publication date Jan 12, 2023
- Suketu PARIKH
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DEPOSITION OF LOW-K FILMS
- Publication number 20220325412
- Publication date Oct 13, 2022
- Applied Materials, Inc.
- Shuaidi Zhang
- C01 - INORGANIC CHEMISTRY
Information Patent Application
LOW-K FILMS
- Publication number 20220307134
- Publication date Sep 29, 2022
- Applied Materials, Inc.
- Shuaidi Zhang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
LOW TEMPERATURE SILICON NITRIDE/SILICON OXYNITRIDE STACK FILM WITH...
- Publication number 20220310909
- Publication date Sep 29, 2022
- Applied Materials, Inc.
- Maribel Maldonado-Garcia
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEQUENTIAL PLASMA AND THERMAL TREATMENT
- Publication number 20220262619
- Publication date Aug 18, 2022
- Applied Materials, Inc.
- Ning Li
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA INDUCED MODIFICATION OF SILICON CARBIDE SURFACE
- Publication number 20220205095
- Publication date Jun 30, 2022
- Applied Materials, Inc.
- Francis Kanyiri Mungai
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
DEPOSITION OF LOW-K FILMS
- Publication number 20220154337
- Publication date May 19, 2022
- Applied Materials, Inc.
- Shuaidi Zhang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SUSCEPTOR WAFER CHUCKS FOR BOWED WAFERS
- Publication number 20220093443
- Publication date Mar 24, 2022
- Applied Materials, Inc.
- Abhishek Chowdhury
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Self-Aligned Double Patterning With Spatial Atomic Layer Deposition
- Publication number 20220059362
- Publication date Feb 24, 2022
- Applied Materials, Inc.
- Ning Li
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHODS AND SYSTEMS TO MODULATE FILM STRESS
- Publication number 20220028660
- Publication date Jan 27, 2022
- Applied Materials, Inc.
- Tsutomu Tanaka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS AND METHODS TO REDUCE PARTICLES IN A FILM DEPOSITION CHAMBER
- Publication number 20210404058
- Publication date Dec 30, 2021
- Applied Materials, Inc.
- Maribel Maldonado-Garcia
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
CONFINED CHARGE TRAP LAYER
- Publication number 20210399011
- Publication date Dec 23, 2021
- Applied Materials, Inc.
- Chang Seok Kang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
THIN LAYER DEPOSITION WITH PLASMA PULSING
- Publication number 20210388497
- Publication date Dec 16, 2021
- Applied Materials, Inc.
- Cong Trinh
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
LOW-K FILMS
- Publication number 20210388499
- Publication date Dec 16, 2021
- Applied Materials, Inc.
- Shuaidi Zhang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Methods And Apparatus For Low Temperature Silicon Nitride Films
- Publication number 20210265157
- Publication date Aug 26, 2021
- Applied Materials, Inc.
- Wenbo Yan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SELECTIVE DEPOSITION OF SICON BY PLAMA ALD
- Publication number 20210230747
- Publication date Jul 29, 2021
- Applied Materials, Inc.
- Shuaidi Zhang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Method Of Forming Self-Aligned Via
- Publication number 20210166973
- Publication date Jun 3, 2021
- Applied Materials, Inc.
- Suketu Arun Parikh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Silyl Pseudohalides For Silicon Containing Films
- Publication number 20210140046
- Publication date May 13, 2021
- Applied Materials, Inc.
- Keenan N. Woods
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Seamless Gapfill With Dielectric ALD Films
- Publication number 20210090882
- Publication date Mar 25, 2021
- Applied Materials, Inc.
- Mihaela Balseanu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method and Apparatus for Selective Deposition of Dielectric Films
- Publication number 20210043448
- Publication date Feb 11, 2021
- Applied Materials, Inc.
- Ning Li
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
MULTILAYER ENCAPSULATION STACKS BY ATOMIC LAYER DEPOSITION
- Publication number 20210032749
- Publication date Feb 4, 2021
- Applied Materials, Inc.
- Cong Trinh
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Methods And Apparatus For Deposition Of Low-K Films
- Publication number 20200332415
- Publication date Oct 22, 2020
- Bhaskar Jyoti Bhuyan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Methods And Precursors For Selective Deposition Of Metal Films
- Publication number 20200312653
- Publication date Oct 1, 2020
- Applied Materials, Inc.
- Kurt Fredrickson
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Cap Layer For Bit Line Resistance Reduction
- Publication number 20200235104
- Publication date Jul 23, 2020
- Applied Materials, Inc.
- Priyadarshi Panda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method Of Forming Self-Aligned Via
- Publication number 20200219768
- Publication date Jul 9, 2020
- Suketu Arun Parikh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEQUENTIAL DEPOSITION AND HIGH FREQUENCY PLASMA TREATMENT OF DEPOSI...
- Publication number 20200176241
- Publication date Jun 4, 2020
- Applied Materials, Inc.
- Vinayak Veer Vats
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Method Of Forming Self-Aligned Via
- Publication number 20200144117
- Publication date May 7, 2020
- Applied Materials, Inc.
- Suketu Arun Parikh
- H01 - BASIC ELECTRIC ELEMENTS

Mihaela BALSEANU

Person

Patents Grantslast 30 patents

Sequential plasma and thermal treatment

Methods and apparatus for deposition of low-k films

Deposition of low-k films

Silyl pseudohalides for silicon containing films

Confined charge trap layer

Methods and systems to modulate film stress

Methods and precursors for selective deposition of metal films

Low temperature silicon nitride/silicon oxynitride stack film with...

Multilayer encapsulation stacks by atomic layer deposition

Low-k films

Plasma induced modification of silicon carbide surface

Susceptor wafer chucks for bowed wafers

Methods and precursors for selective deposition of metal films

Deposition of low-κ films

Low-k films

Selective deposition of SiCON by plasma ALD

Method of forming self-aligned via

Sequential deposition and high frequency plasma treatment of deposi...

Self-aligned double patterning with spatial atomic layer deposition

Methods and systems to modulate film stress

Seamless gapfill with dielectric ALD films

Atomic layer deposition of films comprising silicon, carbon and nit...

Methods and apparatus for low temperature silicon nitride films

Method and apparatus for deposition of low-k films

Method of forming self-aligned via

Method to fabricate thermally stable low K-FinFET spacer

Cap layer for bit line resistance reduction

Method of forming self-aligned via

Method and apparatus for deposition of low-k films

Selective deposition of silicon nitride films for spacer applications

Patents Applicationslast 30 patents

CONFINED CHARGE TRAP LAYER

Methods and Precursors for Selective Deposition of Metal Films

APPARATUS AND METHODS TO REDUCE PARTICLES IN A FILM DEPOSITION CHAMBER

METHODS AND APPARATUS FOR SELECTIVE ETCH STOP CAPPING AND SELECTIVE...

DEPOSITION OF LOW-K FILMS

LOW-K FILMS

LOW TEMPERATURE SILICON NITRIDE/SILICON OXYNITRIDE STACK FILM WITH...

SEQUENTIAL PLASMA AND THERMAL TREATMENT

PLASMA INDUCED MODIFICATION OF SILICON CARBIDE SURFACE

DEPOSITION OF LOW-K FILMS

SUSCEPTOR WAFER CHUCKS FOR BOWED WAFERS

Self-Aligned Double Patterning With Spatial Atomic Layer Deposition

METHODS AND SYSTEMS TO MODULATE FILM STRESS

APPARATUS AND METHODS TO REDUCE PARTICLES IN A FILM DEPOSITION CHAMBER

CONFINED CHARGE TRAP LAYER

THIN LAYER DEPOSITION WITH PLASMA PULSING

LOW-K FILMS

Methods And Apparatus For Low Temperature Silicon Nitride Films

SELECTIVE DEPOSITION OF SICON BY PLAMA ALD

Method Of Forming Self-Aligned Via

Silyl Pseudohalides For Silicon Containing Films

Seamless Gapfill With Dielectric ALD Films

Method and Apparatus for Selective Deposition of Dielectric Films

MULTILAYER ENCAPSULATION STACKS BY ATOMIC LAYER DEPOSITION

Methods And Apparatus For Deposition Of Low-K Films

Methods And Precursors For Selective Deposition Of Metal Films

Cap Layer For Bit Line Resistance Reduction

Method Of Forming Self-Aligned Via

SEQUENTIAL DEPOSITION AND HIGH FREQUENCY PLASMA TREATMENT OF DEPOSI...

Method Of Forming Self-Aligned Via