Miki Kobayashi

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Chiba, JP

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Patents Grantslast 30 patents

Information Patent Grant
Positive photoresist composition and process for forming contact hole
- Patent number 6,296,992
- Issue date Oct 2, 2001
- Tokyo Ohka Kogyo Co., Ltd.
- Masaki Kurihara
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Positive photoresist composition and process for forming contact hole
- Patent number 6,207,340
- Issue date Mar 27, 2001
- Tokyo Ohka Kogyo Co., Ltd.
- Masaki Kurihara
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Positive photoresist composition and process for forming contact hole
- Patent number 6,177,226
- Issue date Jan 23, 2001
- Tokyo Ohka Kogyo Co., Ltd.
- Masaki Kurihara
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Positive photoresist compositions and multilayer resist materials u...
- Patent number 6,127,087
- Issue date Oct 3, 2000
- Tokyo Ohka Kogyo Co., Ltd.
- Miki Kobayashi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY