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Miki Shinomiya
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Kawasaki-shi, JP
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Patents Grants
last 30 patents
Information
Patent Grant
Method of recovering resist pattern
Patent number
10,429,740
Issue date
Oct 1, 2019
Tokyo Ohka Kogyo Co., Ltd.
Junichi Tsuchiya
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Resist composition, method of forming resist pattern, and polymeric...
Patent number
9,890,233
Issue date
Feb 13, 2018
Tokyo Ohka Kogyo Co., Ltd.
Miki Shinomiya
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Resist composition, method of forming resist pattern, acid generato...
Patent number
9,682,951
Issue date
Jun 20, 2017
Tokyo Ohka Kogyo Co., Ltd.
Takashi Nagamine
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Resist composition, method for forming resist pattern, photo-reacti...
Patent number
9,671,690
Issue date
Jun 6, 2017
Tokyo Ohka Kogyo Co., Ltd.
Takashi Nagamine
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Patents Applications
last 30 patents
Information
Patent Application
RESIST COMPOSITION, METHOD FOR FORMING RESIST PATTERN, PHOTO-REACTI...
Publication number
20160282717
Publication date
Sep 29, 2016
Tokyo Ohka Kogyo Co., Ltd.
Takashi NAGAMINE
C07 - ORGANIC CHEMISTRY
Information
Patent Application
RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, ACID GENERATO...
Publication number
20160280679
Publication date
Sep 29, 2016
Tokyo Ohka Kogyo Co., Ltd.
Takashi NAGAMINE
C07 - ORGANIC CHEMISTRY
Information
Patent Application
METHOD OF RECOVERING RESIST PATTERN
Publication number
20160274464
Publication date
Sep 22, 2016
Tokyo Ohka Kogyo Co., Ltd.
Junichi TSUCHIYA
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, AND POLYMERIC...
Publication number
20150198880
Publication date
Jul 16, 2015
Tokyo Ohka Kogyo Co., Ltd.
Miki Shinomiya
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...