Mikio SATO

Person

Yamanashi, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Plasma processing method and plasma processing apparatus
- Patent number 12,243,718
- Issue date Mar 4, 2025
- Tokyo Electron Limited
- Eiki Kamata
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma measurement method
- Patent number 12,237,157
- Issue date Feb 25, 2025
- Tokyo Electron Limited
- Eiki Kamata
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 11,967,485
- Issue date Apr 23, 2024
- Tokyo Electron Limited
- Eiki Kamata
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Control method and plasma processing apparatus
- Patent number 11,887,825
- Issue date Jan 30, 2024
- Tokyo Electron Limited
- Mikio Sato
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma observation system and plasma observation method
- Patent number 11,749,511
- Issue date Sep 5, 2023
- Tokyo Electron Limited
- Ryoji Yamazaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and control method
- Patent number 11,721,528
- Issue date Aug 8, 2023
- Tokyo Electron Limited
- Taro Ikeda
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma probe device, plasma processing apparatus, and control method
- Patent number 11,705,310
- Issue date Jul 18, 2023
- Tokyo Electron Limited
- Taro Ikeda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and control method
- Patent number 11,600,475
- Issue date Mar 7, 2023
- Tokyo Electron Limited
- Taro Ikeda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Array antenna and plasma processing apparatus
- Patent number 11,476,088
- Issue date Oct 18, 2022
- Tokyo Electron Limited
- Eiki Kamata
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma density monitor, plasma processing apparatus, and plasma pro...
- Patent number 11,410,835
- Issue date Aug 9, 2022
- Tokyo Electron Limited
- Taro Ikeda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and control method
- Patent number 11,355,326
- Issue date Jun 7, 2022
- Tokyo Electron Limited
- Taro Ikeda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma probe device and plasma processing apparatus
- Patent number 11,164,730
- Issue date Nov 2, 2021
- Tokyo Electron Limited
- Taro Ikeda
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
PLASMA PROCESSING APPARATUS, CONTROL METHOD, AND STORING MEDIUM
- Publication number 20240404805
- Publication date Dec 5, 2024
- Tokyo Electron Limited
- Mikio SATO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA MEASUREMENT METHOD
- Publication number 20230066120
- Publication date Mar 2, 2023
- TOKYO ELECTRON LIMITED
- Eiki KAMATA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MICROWAVE PLASMA PROCESSING APPARATUS
- Publication number 20220277935
- Publication date Sep 1, 2022
- TOKYO ELECTRON LIMITED
- Taro IKEDA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA PROCESSING METHOD AND PLASMA PROCESSING DEVICE
- Publication number 20220199369
- Publication date Jun 23, 2022
- TOKYO ELECTRON LIMITED
- Eiki KAMATA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA OBSERVATION SYSTEM AND PLASMA OBSERVATION METHOD
- Publication number 20210225623
- Publication date Jul 22, 2021
- TOKYO ELECTRON LIMITED
- Ryoji YAMAZAKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ARRAY ANTENNA AND PLASMA PROCESSING APPARATUS
- Publication number 20210225612
- Publication date Jul 22, 2021
- TOKYO ELECTRON LIMITED
- Eiki KAMATA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20210134560
- Publication date May 6, 2021
- TOKYO ELECTRON LIMITED
- Eiki KAMATA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CONTROL METHOD AND PLASMA PROCESSING APPARATUS
- Publication number 20210125814
- Publication date Apr 29, 2021
- TOKYO ELECTRON LIMITED
- Mikio SATO
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA PROCESSING APPARATUS AND CONTROL METHOD
- Publication number 20210074517
- Publication date Mar 11, 2021
- TOKYO ELECTRON LIMITED
- Taro IKEDA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA PROBE DEVICE, PLASMA PROCESSING APPARATUS, AND CONTROL METHOD
- Publication number 20210074516
- Publication date Mar 11, 2021
- TOYO ELECTRON LIMITED
- Taro IKEDA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND CONTROL METHOD
- Publication number 20210035788
- Publication date Feb 4, 2021
- TOKYO ELECTRON LIMITED
- Taro IKEDA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND CONTROL METHOD
- Publication number 20210035787
- Publication date Feb 4, 2021
- TOKYO ELECTRON LIMITED
- Taro IKEDA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA DENSITY MONITOR, PLASMA PROCESSING APPARATUS, AND PLASMA PRO...
- Publication number 20200381224
- Publication date Dec 3, 2020
- TOKYO ELECTRON LIMITED
- Taro IKEDA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MICROWAVE PLASMA PROCESSING APPARATUS
- Publication number 20190189398
- Publication date Jun 20, 2019
- TOKYO ELECTRON LIMITED
- Taro IKEDA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA PROBE DEVICE AND PLASMA PROCESSING APPARATUS
- Publication number 20190074166
- Publication date Mar 7, 2019
- TOKYO ELECTRON LIMITED
- Taro IKEDA
- H01 - BASIC ELECTRIC ELEMENTS

Person

Patents Grantslast 30 patents

Plasma processing method and plasma processing apparatus

Plasma measurement method

Plasma processing apparatus and plasma processing method

Control method and plasma processing apparatus

Plasma observation system and plasma observation method

Plasma processing apparatus and control method

Plasma probe device, plasma processing apparatus, and control method

Plasma processing apparatus and control method

Array antenna and plasma processing apparatus

Plasma density monitor, plasma processing apparatus, and plasma pro...

Plasma processing apparatus and control method

Plasma probe device and plasma processing apparatus

Patents Applicationslast 30 patents

PLASMA PROCESSING APPARATUS, CONTROL METHOD, AND STORING MEDIUM

PLASMA MEASUREMENT METHOD

MICROWAVE PLASMA PROCESSING APPARATUS

PLASMA PROCESSING METHOD AND PLASMA PROCESSING DEVICE

PLASMA OBSERVATION SYSTEM AND PLASMA OBSERVATION METHOD

ARRAY ANTENNA AND PLASMA PROCESSING APPARATUS

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

CONTROL METHOD AND PLASMA PROCESSING APPARATUS

PLASMA PROCESSING APPARATUS AND CONTROL METHOD

PLASMA PROBE DEVICE, PLASMA PROCESSING APPARATUS, AND CONTROL METHOD

PLASMA PROCESSING APPARATUS AND CONTROL METHOD

PLASMA PROCESSING APPARATUS AND CONTROL METHOD

PLASMA DENSITY MONITOR, PLASMA PROCESSING APPARATUS, AND PLASMA PRO...

MICROWAVE PLASMA PROCESSING APPARATUS

PLASMA PROBE DEVICE AND PLASMA PROCESSING APPARATUS