Min-Yeong Moon

Person

Ann Arbor, MI, US

People

Patents Grantslast 30 patents

Information Patent Grant
Methods and systems for measurement of tilt and overlay of a structure
- Patent number 12,209,854
- Issue date Jan 28, 2025
- KLA Corporation
- Stilian Ivanov Pandev
- G01 - MEASURING TESTING
Information Patent Grant
Self-calibrating overlay metrology
- Patent number 11,880,142
- Issue date Jan 23, 2024
- KLA Corporation
- Stilian Pandev
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Self-calibrated overlay metrology using a skew training sample
- Patent number 11,604,063
- Issue date Mar 14, 2023
- KLA Corporation
- Stilian Pandev
- G01 - MEASURING TESTING
Information Patent Grant
Self-calibrating overlay metrology
- Patent number 11,604,420
- Issue date Mar 14, 2023
- KLA Corporation
- Stilian Pandev
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Methods and systems for determining quality of semiconductor measur...
- Patent number 11,530,913
- Issue date Dec 20, 2022
- KLA Corporation
- Dzmitry Sanko
- G01 - MEASURING TESTING

Patents Applicationslast 30 patents

Information Patent Application
Full Wafer Measurement Based On A Trained Full Wafer Measurement Model
- Publication number 20240353759
- Publication date Oct 24, 2024
- KLA Corporation
- Stilian Ivanov Pandev
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SYSTEM AND METHOD FOR ESTIMATING MEASUREMENT UNCERTAINTY FOR CHARAC...
- Publication number 20240201637
- Publication date Jun 20, 2024
- KLA Corporation
- Stilian Pandev
- G05 - CONTROLLING REGULATING
Information Patent Application
CORRECTING TARGET LOCATIONS FOR TEMPERATURE IN SEMICONDUCTOR APPLIC...
- Publication number 20240120221
- Publication date Apr 11, 2024
- KLA Corporation
- Min-Yeong Moon
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ESTIMATING IN-DIE OVERLAY WITH TOOL INDUCED SHIFT CORRECTION
- Publication number 20230258446
- Publication date Aug 17, 2023
- KLA Corporation
- Min-Yeong MOON
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
SELF-CALIBRATING OVERLAY METROLOGY
- Publication number 20230221656
- Publication date Jul 13, 2023
- KLA Corporation
- Stilian Pandev
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SELF-CALIBRATED OVERLAY METROLOGY USING A SKEW TRAINING SAMPLE
- Publication number 20220412734
- Publication date Dec 29, 2022
- Stilian Pandev
- G01 - MEASURING TESTING
Information Patent Application
Methods And Systems For Measurement Of Tilt And Overlay Of A Structure
- Publication number 20220404143
- Publication date Dec 22, 2022
- KLA Corporation
- Stilian Ivanov Pandev
- G01 - MEASURING TESTING
Information Patent Application
SELF-CALIBRATING OVERLAY METROLOGY
- Publication number 20220357673
- Publication date Nov 10, 2022
- Stilian Pandev
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Methods And Systems For Determining Quality Of Semiconductor Measur...
- Publication number 20220090912
- Publication date Mar 24, 2022
- KLA Corporation
- Dzmitry Sanko
- G01 - MEASURING TESTING

Min-Yeong Moon

Person

Patents Grantslast 30 patents

Methods and systems for measurement of tilt and overlay of a structure

Self-calibrating overlay metrology

Self-calibrated overlay metrology using a skew training sample

Self-calibrating overlay metrology

Methods and systems for determining quality of semiconductor measur...

Patents Applicationslast 30 patents

Full Wafer Measurement Based On A Trained Full Wafer Measurement Model

SYSTEM AND METHOD FOR ESTIMATING MEASUREMENT UNCERTAINTY FOR CHARAC...

CORRECTING TARGET LOCATIONS FOR TEMPERATURE IN SEMICONDUCTOR APPLIC...

ESTIMATING IN-DIE OVERLAY WITH TOOL INDUCED SHIFT CORRECTION

SELF-CALIBRATING OVERLAY METROLOGY

SELF-CALIBRATED OVERLAY METROLOGY USING A SKEW TRAINING SAMPLE

Methods And Systems For Measurement Of Tilt And Overlay Of A Structure

SELF-CALIBRATING OVERLAY METROLOGY

Methods And Systems For Determining Quality Of Semiconductor Measur...