Min-Yung KO

Person

Hsinchu City, TW

People

Patents Grantslast 30 patents

Information Patent Grant
Method for forming a hard mask with a tapered profile
- Patent number 12,114,576
- Issue date Oct 8, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Min-Yung Ko
Information Patent Grant
By-site-compensated etch back for local planarization/topography ad...
- Patent number 12,046,477
- Issue date Jul 23, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Ming Chyi Liu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Post-treatment processes for ion beam etching of magnetic tunnel ju...
- Patent number 11,991,932
- Issue date May 21, 2024
- Taiwan Semiconductor Manufacturing Company Limited
- Hung-Yu Chang
- G11 - INFORMATION STORAGE
Information Patent Grant
Method for forming a hard mask with a tapered profile
- Patent number 11,765,980
- Issue date Sep 19, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd
- Min-Yung Ko
Information Patent Grant
Self-aligned dielectric spacer for magnetic tunnel junction pattern...
- Patent number 11,289,539
- Issue date Mar 29, 2022
- Taiwan Semiconductor Manufacturing Company Limited
- Min-Yung Ko
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
BY-SITE-COMENSATED ETCH BACK FOR LOCAL PLANARIZATION/TOPOGRAPHY ADJ...
- Publication number 20240387185
- Publication date Nov 21, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Ming Chyi Liu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR FORMING A HARD MASK WITH A TAPERED PROFILE
- Publication number 20240373755
- Publication date Nov 7, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Min-Yung Ko
Information Patent Application
BY-SITE-COMENSATED ETCH BACK FOR LOCAL PLANARIZATION/TOPOGRAPHY ADJ...
- Publication number 20240021430
- Publication date Jan 18, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Ming Chyi Liu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR FORMING A HARD MASK WITH A TAPERED PROFILE
- Publication number 20230363285
- Publication date Nov 9, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Min-Yung Ko
Information Patent Application
BY-SITE-COMPENSATED ETCH BACK FOR LOCAL PLANARIZATION/TOPOGRAPHY AD...
- Publication number 20220223425
- Publication date Jul 14, 2022
- Taiwan Semiconductor Manufacturing Co., LTD
- Ming Chyi Liu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR FORMING A HARD MASK WITH A TAPERED PROFILE
- Publication number 20220069204
- Publication date Mar 3, 2022
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Min-Yung Ko
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
POST-TREATMENT PROCESSES FOR ION BEAM ETCHING OF MAGNETIC TUNNEL JU...
- Publication number 20220020917
- Publication date Jan 20, 2022
- Taiwan Semiconductor Manufacturing Company Limited
- Hung-Yu CHANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SELF-ALIGNED DIELECTRIC SPACER FOR MAGNETIC TUNNEL JUNCTION PATTERN...
- Publication number 20210375988
- Publication date Dec 2, 2021
- Taiwan Semiconductor Manufacturing Company Limited
- Min-Yung KO
- H01 - BASIC ELECTRIC ELEMENTS

Min-Yung KO

Person

Patents Grantslast 30 patents

Method for forming a hard mask with a tapered profile

By-site-compensated etch back for local planarization/topography ad...

Post-treatment processes for ion beam etching of magnetic tunnel ju...

Method for forming a hard mask with a tapered profile

Self-aligned dielectric spacer for magnetic tunnel junction pattern...

Patents Applicationslast 30 patents

BY-SITE-COMENSATED ETCH BACK FOR LOCAL PLANARIZATION/TOPOGRAPHY ADJ...

METHOD FOR FORMING A HARD MASK WITH A TAPERED PROFILE

BY-SITE-COMENSATED ETCH BACK FOR LOCAL PLANARIZATION/TOPOGRAPHY ADJ...

METHOD FOR FORMING A HARD MASK WITH A TAPERED PROFILE

BY-SITE-COMPENSATED ETCH BACK FOR LOCAL PLANARIZATION/TOPOGRAPHY AD...

METHOD FOR FORMING A HARD MASK WITH A TAPERED PROFILE

POST-TREATMENT PROCESSES FOR ION BEAM ETCHING OF MAGNETIC TUNNEL JU...

SELF-ALIGNED DIELECTRIC SPACER FOR MAGNETIC TUNNEL JUNCTION PATTERN...