Minako Inukai

Person

Yokohama-shi, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Substrate processing apparatus and substrate processing method
- Patent number 12,172,194
- Issue date Dec 24, 2024
- Kioxia Corporation
- Minako Inukai
- B08 - CLEANING
Information Patent Grant
Substrate processing apparatus and substrate processing method
- Patent number 11,833,550
- Issue date Dec 5, 2023
- Kioxia Corporation
- Minako Inukai
- B08 - CLEANING
Information Patent Grant
Method for cleaning substrate and cleaning device
- Patent number 11,651,953
- Issue date May 16, 2023
- Kioxia Corporation
- Minako Inukai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for cleaning substrate and substrate processing apparatus
- Patent number 11,264,233
- Issue date Mar 1, 2022
- Kioxia Corporation
- Kyo Otsubo
- B08 - CLEANING
Information Patent Grant
Substrate processing method, substrate processing apparatus, and co...
- Patent number 11,185,895
- Issue date Nov 30, 2021
- TOSHIBA MEMORY CORPORATION
- Mana Tanabe
- B08 - CLEANING
Information Patent Grant
Freeze cleaning apparatus
- Patent number 10,882,082
- Issue date Jan 5, 2021
- TOSHIBA MEMORY CORPORATION
- Hideaki Sakurai
- B08 - CLEANING
Information Patent Grant
Method for cleaning substrate and substrate processing apparatus
- Patent number 10,692,715
- Issue date Jun 23, 2020
- TOSHIBA MEMORY CORPORATION
- Kyo Otsubo
- B08 - CLEANING
Information Patent Grant
Substrate production method, substrate processing apparatus, and su...
- Patent number 10,486,203
- Issue date Nov 26, 2019
- TOSHIBA MEMORY CORPORATION
- Hideaki Sakurai
- B08 - CLEANING
Information Patent Grant
Method and device for cleaning semiconductor substrate
- Patent number 8,961,696
- Issue date Feb 24, 2015
- Kabushiki Kaisha Toshiba
- Hiroshi Tomita
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Cleaning apparatus for semiconductor wafer
- Patent number 8,567,420
- Issue date Oct 29, 2013
- Kabushiki Kaisha Toshiba
- Minako Inukai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Template cleaning method, system, and apparatus
- Patent number 8,375,964
- Issue date Feb 19, 2013
- Kabushiki Kaisha Toshiba
- Hiroshi Tomita
- B08 - CLEANING
Information Patent Grant
Method of manufacturing semiconductor device
- Patent number 8,114,755
- Issue date Feb 14, 2012
- Kabushiki Kaisha Toshiba
- Ichiro Mizushima
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD
- Publication number 20240058847
- Publication date Feb 22, 2024
- Kioxia Corporation
- Minako INUKAI
- B08 - CLEANING
Information Patent Application
METHOD FOR CLEANING SUBSTRATE AND CLEANING DEVICE
- Publication number 20230260780
- Publication date Aug 17, 2023
- KIOXIA Corporation
- Minako INUKAI
- B08 - CLEANING
Information Patent Application
SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD
- Publication number 20230090997
- Publication date Mar 23, 2023
- KIOXIA Corporation
- Minako INUKAI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR CLEANING SUBSTRATE AND CLEANING DEVICE
- Publication number 20200321212
- Publication date Oct 8, 2020
- Toshiba Memory Corporation
- Minako INUKAI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR CLEANING SUBSTRATE AND SUBSTRATE PROCESSING APPARATUS
- Publication number 20200279731
- Publication date Sep 3, 2020
- Toshiba Memory Corporation
- Kyo Otsubo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FREEZE CLEANING APPARATUS
- Publication number 20200156121
- Publication date May 21, 2020
- Toshiba Memory Corporation
- Hideaki SAKURAI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING METHOD, SUBSTRATE PROCESSING APPARATUS, AND CO...
- Publication number 20200078834
- Publication date Mar 12, 2020
- Toshiba Memory Corporation
- Mana TANABE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FREEZE CLEANING APPARATUS
- Publication number 20180272391
- Publication date Sep 27, 2018
- Toshiba Memory Corporation
- Hideaki SAKURAI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR CLEANING SUBSTRATE AND SUBSTRATE PROCESSING APPARATUS
- Publication number 20180047566
- Publication date Feb 15, 2018
- Toshiba Memory Corporation
- Kyo OTSUBO
- B08 - CLEANING
Information Patent Application
METHOD FOR CLEANING SUBSTRATE AND CLEANING DEVICE
- Publication number 20180047565
- Publication date Feb 15, 2018
- Toshiba Memory Corporation
- Minako INUKAI
- B08 - CLEANING
Information Patent Application
SUBSTRATE PRODUCTION METHOD, SUBSTRATE PROCESSING APPARATUS, AND SU...
- Publication number 20170274427
- Publication date Sep 28, 2017
- Kabushiki Kaisha Toshiba
- Hideaki SAKURAI
- B08 - CLEANING
Information Patent Application
METHOD AND DEVICE FOR CLEANING SEMICONDUCTOR SUBSTRATE
- Publication number 20130068257
- Publication date Mar 21, 2013
- Hiroshi TOMITA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
EXHAUST GAS TREATMENT DEVICE AND METHOD AND SEMICONDUCTOR MANUFACTU...
- Publication number 20120118334
- Publication date May 17, 2012
- Hisashi OKUCHI
- B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
Information Patent Application
SEMICONDUCTOR SUBSTRATE CLEANING METHOD USING BUBBLE/CHEMICAL MIXED...
- Publication number 20110088731
- Publication date Apr 21, 2011
- Kabushiki Kaisha Toshiba
- Hiroshi TOMITA
- B08 - CLEANING
Information Patent Application
CLEANING METHOD FOR SEMICONDUCTOR WAFER
- Publication number 20110061684
- Publication date Mar 17, 2011
- Hiroshi TOMITA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TEMPLATE CLEANING METHOD, SYSTEM, AND APPARATUS
- Publication number 20100132742
- Publication date Jun 3, 2010
- Hiroshi TOMITA
- B08 - CLEANING
Information Patent Application
CLEANING APPARATUS FOR SEMICONDUCTOR WAFER AND CLEANING METHOD FOR...
- Publication number 20090255558
- Publication date Oct 15, 2009
- Minako Inukai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD
- Publication number 20090250431
- Publication date Oct 8, 2009
- Minako INUKAI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE
- Publication number 20090011570
- Publication date Jan 8, 2009
- Ichiro Mizushima
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR SUBSTRATE CLEANING METHOD USING BUBBLE/CHEMICAL MIXED...
- Publication number 20080308132
- Publication date Dec 18, 2008
- Hiroshi Tomita
- B08 - CLEANING

Minako Inukai

Person

Patents Grantslast 30 patents

Substrate processing apparatus and substrate processing method

Substrate processing apparatus and substrate processing method

Method for cleaning substrate and cleaning device

Method for cleaning substrate and substrate processing apparatus

Substrate processing method, substrate processing apparatus, and co...

Freeze cleaning apparatus

Method for cleaning substrate and substrate processing apparatus

Substrate production method, substrate processing apparatus, and su...

Method and device for cleaning semiconductor substrate

Cleaning apparatus for semiconductor wafer

Template cleaning method, system, and apparatus

Method of manufacturing semiconductor device

Patents Applicationslast 30 patents

SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD

METHOD FOR CLEANING SUBSTRATE AND CLEANING DEVICE

SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD

METHOD FOR CLEANING SUBSTRATE AND CLEANING DEVICE

METHOD FOR CLEANING SUBSTRATE AND SUBSTRATE PROCESSING APPARATUS

FREEZE CLEANING APPARATUS

SUBSTRATE PROCESSING METHOD, SUBSTRATE PROCESSING APPARATUS, AND CO...

FREEZE CLEANING APPARATUS

METHOD FOR CLEANING SUBSTRATE AND SUBSTRATE PROCESSING APPARATUS

METHOD FOR CLEANING SUBSTRATE AND CLEANING DEVICE

SUBSTRATE PRODUCTION METHOD, SUBSTRATE PROCESSING APPARATUS, AND SU...

METHOD AND DEVICE FOR CLEANING SEMICONDUCTOR SUBSTRATE

EXHAUST GAS TREATMENT DEVICE AND METHOD AND SEMICONDUCTOR MANUFACTU...

SEMICONDUCTOR SUBSTRATE CLEANING METHOD USING BUBBLE/CHEMICAL MIXED...

CLEANING METHOD FOR SEMICONDUCTOR WAFER

TEMPLATE CLEANING METHOD, SYSTEM, AND APPARATUS

CLEANING APPARATUS FOR SEMICONDUCTOR WAFER AND CLEANING METHOD FOR...

SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD

METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE

SEMICONDUCTOR SUBSTRATE CLEANING METHOD USING BUBBLE/CHEMICAL MIXED...