Mingqi Li

Person

Shrewsbury, MA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Photoresist topcoat compositions and methods of processing photores...
- Patent number 12,234,369
- Issue date Feb 25, 2025
- DuPont Electronic Materials International, LLC
- Irvinder Kaur
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Photoresist compositions and pattern formation methods
- Patent number 12,085,854
- Issue date Sep 10, 2024
- Rohm and Haas Electronic Materials LLC
- Cong Liu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photoresist compositions and pattern formation methods
- Patent number 11,940,730
- Issue date Mar 26, 2024
- Rohm and Haas Electronic Materials LLC
- Mitsuru Haga
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Polymers useful as surface leveling agents
- Patent number 11,859,082
- Issue date Jan 2, 2024
- Rohm and Haas Electronic Materials LLC
- Mingqi Li
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Topcoat compositions and photolithographic methods
- Patent number 11,846,885
- Issue date Dec 19, 2023
- Rohm and Haas Electronic Materials, LLC
- Cong Liu
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Photoresist compositions and methods
- Patent number 11,829,069
- Issue date Nov 28, 2023
- Rohm and Haas Electronic Materials LLC
- Joshua Kaitz
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Photoresist compositions and pattern formation methods
- Patent number 11,809,077
- Issue date Nov 7, 2023
- Rohm and Haas Electronic Materials LLC
- Thomas Cardolaccia
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Photoresist pattern trimming compositions and pattern formation met...
- Patent number 11,754,927
- Issue date Sep 12, 2023
- Rohm and Haas Electronic Materials LLC
- Irvinder Kaur
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Photoresist pattern trimming compositions and pattern formation met...
- Patent number 11,506,981
- Issue date Nov 22, 2022
- Rohm and Haas Electronic Materials LLC
- Xisen Hou
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Compositions comprising base-reactive component and processes for p...
- Patent number 11,106,137
- Issue date Aug 31, 2021
- Rohm and Haas Electronic Materials LLC
- Deyan Wang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Cholate photoacid generators and photoresists comprising same
- Patent number 10,809,616
- Issue date Oct 20, 2020
- Rohm and Haas Electronic Materials LLC
- Emad Aqad
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Photoresists comprising amide component
- Patent number 10,719,014
- Issue date Jul 21, 2020
- Rohm and Haas Electronic Materials LLC
- Cong Liu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Pattern-formation methods
- Patent number 10,684,549
- Issue date Jun 16, 2020
- Rohm and Haas Electronic Materials LLC
- Kevin Rowell
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Polymers and photoresist compositions
- Patent number 10,670,965
- Issue date Jun 2, 2020
- Rohm and Haas Electronic Materials LLC
- Emad Aqad
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photoresist topcoat compositions and methods of processing photores...
- Patent number 10,578,969
- Issue date Mar 3, 2020
- Rohm and Haas Electronic Materials LLC
- Cong Liu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Topcoat compositions containing fluorinated thermal acid generators
- Patent number 10,481,495
- Issue date Nov 19, 2019
- Rohm and Haas Electronic Materials LLC
- Irvinder Kaur
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Methods for manufacturing block copolymers and articles manufacture...
- Patent number 10,287,455
- Issue date May 14, 2019
- Dow Global Technologies LLC
- Jieqian Zhang
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Grant
Thermal acid generators and photoresist pattern trimming compositio...
- Patent number 10,241,407
- Issue date Mar 26, 2019
- Rohm and Haas Electronic Materials LLC
- Irvinder Kaur
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Topcoat compositions containing fluorinated thermal acid generators
- Patent number 10,241,411
- Issue date Mar 26, 2019
- Rohm and Haas Electronic Materials LLC
- Irvinder Kaur
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Photoresist topcoat compositions and methods of processing photores...
- Patent number 10,197,918
- Issue date Feb 5, 2019
- Rohm and Haas Electronic Materials LLC
- Cong Liu
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Grant
Neutral layer polymers, methods of manufacture thereof and articles...
- Patent number 10,167,411
- Issue date Jan 1, 2019
- Dow Global Technologies LLC
- Peter Trefonas
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Grant
Pattern treatment methods
- Patent number 10,162,265
- Issue date Dec 25, 2018
- Rohm and Haas Electronic Materials LLC
- Jong Keun Park
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Pattern treatment methods
- Patent number 10,133,179
- Issue date Nov 20, 2018
- Rohm and Haas Electronic Materials LLC
- Jin Wuk Sung
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Silicon-containing underlayers
- Patent number 10,114,288
- Issue date Oct 30, 2018
- Rohm and Haas Electronic Materials LLC
- Charlotte A. Cutler
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Block copolymers and pattern treatment compositions and methods
- Patent number 10,042,255
- Issue date Aug 7, 2018
- Dow Global Technologies LLC
- Huaxing Zhou
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Grant
Topcoat compositions and pattern-forming methods
- Patent number 10,042,259
- Issue date Aug 7, 2018
- Rohm and Haas Electronic Materials LLC
- Irvinder Kaur
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Wet-strippable silicon-containing antireflectant
- Patent number 10,031,420
- Issue date Jul 24, 2018
- Rohm and Haas Electronic Materials LLC
- Owendi Ongayi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Silicon-containing underlayers
- Patent number 10,007,184
- Issue date Jun 26, 2018
- Rohm and Haas Electronic Materials LLC
- Li Cui
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Thermal acid generators and photoresist pattern trimming compositio...
- Patent number 10,007,179
- Issue date Jun 26, 2018
- Rohm and Haas Electronic Materials LLC
- Irvinder Kaur
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resins for underlayers
- Patent number 9,880,469
- Issue date Jan 30, 2018
- Rohm and Haas Electronic Materials LLC
- Emad Aqad
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
POLYMER, PHOTORESIST COMPOSITIONS INCLUDING THE SAME, AND PATTERN F...
- Publication number 20240241441
- Publication date Jul 18, 2024
- Rohm and Haas Electronic Materials L.L.C.
- Tomas Marangoni
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
POLYMER, PHOTORESIST COMPOSITIONS INCLUDING THE SAME, AND PATTERN F...
- Publication number 20240241440
- Publication date Jul 18, 2024
- Rohm and Haas Electronic Materials L.L.C.
- Emad Aqad
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
POLYMERS USEFUL AS SURFACE LEVELING AGENTS
- Publication number 20240093027
- Publication date Mar 21, 2024
- Rohm and Haas Electronic Materials L.L.C.
- Mingqi Li
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
PHOTOACTIVE COMPOUNDS, PHOTORESIST COMPOSITIONS INCLUDING THE SAME,...
- Publication number 20240027904
- Publication date Jan 25, 2024
- Rohm and Haas Electronic Materials L.L.C.
- Emad Aqad
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTOACID GENERATORS, PHOTORESIST COMPOSITIONS, AND PATTERN FORMATI...
- Publication number 20240027905
- Publication date Jan 25, 2024
- Rohm and Haas Electronic Materials L.L.C.
- Tomas Marangoni
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTORESIST COMPOSITIONS AND PATTERN FORMATION METHODS
- Publication number 20230161257
- Publication date May 25, 2023
- Rohm and Haas Electronic Materials L.L.C.
- Irvinder Kaur
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTORESIST COMPOSITIONS AND PATTERN FORMATION METHODS
- Publication number 20230152697
- Publication date May 18, 2023
- Rohm and Haas Electronic Materials L.L.C.
- KE YANG
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
PHOTORESIST COMPOSITIONS AND PATTERN FORMATION METHODS
- Publication number 20230104679
- Publication date Apr 6, 2023
- Rohm and Haas Electronic Materials L.L.C.
- Irvinder Kaur
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
PHOTORESIST COMPOSITIONS AND PATTERN FORMATION METHODS
- Publication number 20230104130
- Publication date Apr 6, 2023
- Rohm and Haas Electronic Materials L.L.C.
- Cong Liu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTORESIST COMPOSITIONS AND PATTERN FORMATION METHODS
- Publication number 20220229366
- Publication date Jul 21, 2022
- Rohm and Haas Electronic Materials L.L.C.
- Mitsuru Haga
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
POLYMERS USEFUL AS SURFACE LEVELING AGENTS
- Publication number 20220204760
- Publication date Jun 30, 2022
- Rohm and Haas Electronic Materials L.L.C.
- Mingqi Li
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
PHOTORESIST COMPOSITIONS AND PATTERN FORMATION METHODS
- Publication number 20220137509
- Publication date May 5, 2022
- Rohm and Haas Electronic Materials L.L.C.
- Xisen Hou
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTORESIST COMPOSITIONS AND PATTERN FORMATION METHODS
- Publication number 20220043342
- Publication date Feb 10, 2022
- Rohm and Haas Electronic Materials L.L.C.
- Thomas Cardolaccia
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
POLYMERS AND PHOTORESIST COMPOSITIONS
- Publication number 20210200084
- Publication date Jul 1, 2021
- Rohm and Haas Electronic Materials L.L.C.
- Jong Keun Park
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
POLYMERS AND PHOTORESIST COMPOSITIONS
- Publication number 20210108065
- Publication date Apr 15, 2021
- Rohm and Haas Electronic Materials L.L.C.
- Yang SONG
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
PHOTORESIST PATTERN TRIMMING COMPOSITIONS AND PATTERN FORMATION MET...
- Publication number 20200379353
- Publication date Dec 3, 2020
- Rohm and Haas Electronic Materials L.L.C.
- Irvinder KAUR
- C07 - ORGANIC CHEMISTRY
Information Patent Application
POLYMERS, PHOTORESIST COMPOSITIONS AND PATTERN FORMATION METHODS
- Publication number 20200377713
- Publication date Dec 3, 2020
- Rohm and Haas Electronic Materials L.L.C.
- Joshua Kaitz
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTORESIST PATTERN TRIMMING COMPOSITIONS AND PATTERN FORMATION MET...
- Publication number 20200379351
- Publication date Dec 3, 2020
- Rohm and Haas Electronic Materials L.L.C.
- Xisen Hou
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTORESIST COMPOSITIONS AND METHODS OF FORMING RESIST PATTERNS WIT...
- Publication number 20200356001
- Publication date Nov 12, 2020
- Rohm and Haas Electronic Materials L.L.C.
- Tomas Marangoni
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
COMPOSITION FOR PREPARING THICK FILM PHOTOREST, THICK FILM PHOTORES...
- Publication number 20200209743
- Publication date Jul 2, 2020
- Rohm and Haas Electronic Materials L.L.C.
- Tomas Marangoni
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PATTERNED DISCRETE NANOSCALE DOPING OF SEMICONDUCTORS, METHODS OF M...
- Publication number 20200020538
- Publication date Jan 16, 2020
- Rohm and Haas Electronic Materials L.L.C.
- Yuanyi Zhang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TOPCOAT COMPOSITIONS CONTAINING FLUORINATED THERMAL ACID GENERATORS
- Publication number 20190243246
- Publication date Aug 8, 2019
- Rohm and Haas Electronic Materials L.L.C.
- Irvinder Kaur
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PHOTORESIST TOPCOAT COMPOSITIONS AND METHODS OF PROCESSING PHOTORES...
- Publication number 20190235385
- Publication date Aug 1, 2019
- Rohm and Haas Electronic Materials L.L.C.
- Cong Liu
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Application
PHOTORESIST TOPCOAT COMPOSITIONS AND METHODS OF PROCESSING PHOTORES...
- Publication number 20190203065
- Publication date Jul 4, 2019
- Rohm and Haas Electronic Materials L.L.C.
- Irvinder Kaur
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTORESIST TOPCOAT COMPOSITIONS AND METHODS OF PROCESSING PHOTORES...
- Publication number 20190204741
- Publication date Jul 4, 2019
- Rohm and Haas Electronic Materials L.L.C.
- Joshua A. Kaitz
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
PHOTORESIST COMPOSITIONS AND METHODS
- Publication number 20190204743
- Publication date Jul 4, 2019
- Rohm and Haas Electronic Materials L.L.C.
- Joshua Kaitz
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
SILICON-CONTAINING UNDERLAYERS
- Publication number 20180253006
- Publication date Sep 6, 2018
- Rohm and Haas Electronic Materials L.L.C.
- Li Cui
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
PATTERN-FORMATION METHODS
- Publication number 20180188654
- Publication date Jul 5, 2018
- Rohm and Haas Electronic Materials L.L.C.
- Kevin Rowell
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
TOPCOAT COMPOSITIONS AND PATTERN-FORMING METHODS
- Publication number 20180118970
- Publication date May 3, 2018
- Rohm and Haas Electronic Materials L.L.C.
- Irvinder Kaur
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
TOPCOAT COMPOSITIONS CONTAINING FLUORINATED THERMAL ACID GENERATORS
- Publication number 20180118968
- Publication date May 3, 2018
- Rohm and Haas Electronic Materials L.L.C.
- Irvinder Kaur
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...

Person

Patents Grantslast 30 patents

Photoresist topcoat compositions and methods of processing photores...

Photoresist compositions and pattern formation methods

Photoresist compositions and pattern formation methods

Polymers useful as surface leveling agents

Topcoat compositions and photolithographic methods

Photoresist compositions and methods

Photoresist compositions and pattern formation methods

Photoresist pattern trimming compositions and pattern formation met...

Photoresist pattern trimming compositions and pattern formation met...

Compositions comprising base-reactive component and processes for p...

Cholate photoacid generators and photoresists comprising same

Photoresists comprising amide component

Pattern-formation methods

Polymers and photoresist compositions

Photoresist topcoat compositions and methods of processing photores...

Topcoat compositions containing fluorinated thermal acid generators

Methods for manufacturing block copolymers and articles manufacture...

Thermal acid generators and photoresist pattern trimming compositio...

Topcoat compositions containing fluorinated thermal acid generators

Photoresist topcoat compositions and methods of processing photores...

Neutral layer polymers, methods of manufacture thereof and articles...

Pattern treatment methods

Pattern treatment methods

Silicon-containing underlayers

Block copolymers and pattern treatment compositions and methods

Topcoat compositions and pattern-forming methods

Wet-strippable silicon-containing antireflectant

Silicon-containing underlayers

Thermal acid generators and photoresist pattern trimming compositio...

Resins for underlayers

Patents Applicationslast 30 patents

POLYMER, PHOTORESIST COMPOSITIONS INCLUDING THE SAME, AND PATTERN F...

POLYMER, PHOTORESIST COMPOSITIONS INCLUDING THE SAME, AND PATTERN F...

POLYMERS USEFUL AS SURFACE LEVELING AGENTS

PHOTOACTIVE COMPOUNDS, PHOTORESIST COMPOSITIONS INCLUDING THE SAME,...

PHOTOACID GENERATORS, PHOTORESIST COMPOSITIONS, AND PATTERN FORMATI...

PHOTORESIST COMPOSITIONS AND PATTERN FORMATION METHODS

PHOTORESIST COMPOSITIONS AND PATTERN FORMATION METHODS

PHOTORESIST COMPOSITIONS AND PATTERN FORMATION METHODS

PHOTORESIST COMPOSITIONS AND PATTERN FORMATION METHODS

PHOTORESIST COMPOSITIONS AND PATTERN FORMATION METHODS

POLYMERS USEFUL AS SURFACE LEVELING AGENTS

PHOTORESIST COMPOSITIONS AND PATTERN FORMATION METHODS

PHOTORESIST COMPOSITIONS AND PATTERN FORMATION METHODS

POLYMERS AND PHOTORESIST COMPOSITIONS

POLYMERS AND PHOTORESIST COMPOSITIONS

PHOTORESIST PATTERN TRIMMING COMPOSITIONS AND PATTERN FORMATION MET...

POLYMERS, PHOTORESIST COMPOSITIONS AND PATTERN FORMATION METHODS

PHOTORESIST PATTERN TRIMMING COMPOSITIONS AND PATTERN FORMATION MET...

PHOTORESIST COMPOSITIONS AND METHODS OF FORMING RESIST PATTERNS WIT...

COMPOSITION FOR PREPARING THICK FILM PHOTOREST, THICK FILM PHOTORES...

PATTERNED DISCRETE NANOSCALE DOPING OF SEMICONDUCTORS, METHODS OF M...

TOPCOAT COMPOSITIONS CONTAINING FLUORINATED THERMAL ACID GENERATORS

PHOTORESIST TOPCOAT COMPOSITIONS AND METHODS OF PROCESSING PHOTORES...

PHOTORESIST TOPCOAT COMPOSITIONS AND METHODS OF PROCESSING PHOTORES...

PHOTORESIST TOPCOAT COMPOSITIONS AND METHODS OF PROCESSING PHOTORES...

PHOTORESIST COMPOSITIONS AND METHODS

SILICON-CONTAINING UNDERLAYERS

PATTERN-FORMATION METHODS

TOPCOAT COMPOSITIONS AND PATTERN-FORMING METHODS

TOPCOAT COMPOSITIONS CONTAINING FLUORINATED THERMAL ACID GENERATORS