Minne Cuperus

Person

Veldhoven, NL

People

Patents Grantslast 30 patents

Information Patent Grant
Substrate placement in immersion lithography
- Patent number 10,345,711
- Issue date Jul 9, 2019
- ASML Netherlands B.V.
- Christiaan Alexander Hoogendam
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Substrate placement in immersion lithography
- Patent number 9,740,106
- Issue date Aug 22, 2017
- ASML Netherlands B.V.
- Christiaan Alexander Hoogendam
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Substrate placement in immersion lithography
- Patent number 9,182,222
- Issue date Nov 10, 2015
- ASML Netherlands B.V.
- Christiaan Alexander Hoogendam
- G01 - MEASURING TESTING
Information Patent Grant
Lithographic apparatus and device manufacturing method
- Patent number 8,749,754
- Issue date Jun 10, 2014
- ASML Netherlands B.V.
- Bob Streefkerk
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic apparatus and device manufacturing method
- Patent number 8,553,201
- Issue date Oct 8, 2013
- ASML Netherlands B.V.
- Bob Streefkerk
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Substrate placement in immersion lithography
- Patent number 8,441,617
- Issue date May 14, 2013
- ASML Netherlands B.V.
- Christiaan Alexander Hoogendam
- G01 - MEASURING TESTING
Information Patent Grant
Substrate placement in immersion lithography
- Patent number 8,077,291
- Issue date Dec 13, 2011
- ASML Netherlands B.V.
- Christiaan Alexander Hoogendam
- G01 - MEASURING TESTING
Information Patent Grant
Radiometric Kirk test
- Patent number 8,059,266
- Issue date Nov 15, 2011
- ASML Holding N.V.
- David A. Hult
- G01 - MEASURING TESTING
Information Patent Grant
Uniform background radiation in maskless lithography
- Patent number 8,009,270
- Issue date Aug 30, 2011
- ASML Netherlands B.V.
- Paul Antoon Cyriel Desmedt
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Optimal rasterization for maskless lithography
- Patent number 8,009,269
- Issue date Aug 30, 2011
- ASML Holding N.V.
- Kars Zeger Troost
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic apparatus, immersion projection apparatus and device m...
- Patent number 7,859,644
- Issue date Dec 28, 2010
- ASML Netherlands B.V.
- Jan-Gerard Cornelis Van Der Toorn
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic apparatus and device manufacturing method
- Patent number 7,671,963
- Issue date Mar 2, 2010
- ASML Netherlands B.V.
- Bob Streefkerk
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic apparatus and device manufacturing method
- Patent number 7,486,381
- Issue date Feb 3, 2009
- ASML Netherlands B.V.
- Bob Streefkerk
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Substrate placement in immersion lithography
- Patent number 7,352,440
- Issue date Apr 1, 2008
- ASML Netherlands B.V.
- Christiaan Alexander Hoogendam
- G01 - MEASURING TESTING
Information Patent Grant
Lithographic apparatus, immersion projection apparatus and device m...
- Patent number 7,330,238
- Issue date Feb 12, 2008
- ASML Netherlands, B.V.
- Jan-Gerard Cornelis Van Der Toorn
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
SUBSTRATE PLACEMENT IN IMMERSION LITHOGRAPHY
- Publication number 20180067401
- Publication date Mar 8, 2018
- ASML NETHERLANDS B.V.
- Christiaan Alexander Hoogendam
- G01 - MEASURING TESTING
Information Patent Application
LITHOGRAPHIC SYSTEM
- Publication number 20170052456
- Publication date Feb 23, 2017
- ASML NETHERLANDS B.V.
- Jan Bernard Plechelmus VAN SCHOOT
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
SUBSTRATE PLACEMENT IN IMMERSION LITHOGRAPHY
- Publication number 20160054665
- Publication date Feb 25, 2016
- ASML NETHERLANDS B.V.
- Christiaan Alexander Hoogendam
- G01 - MEASURING TESTING
Information Patent Application
SUBSTRATE PLACEMENT IN IMMERSION LITHOGRAPHY
- Publication number 20130182231
- Publication date Jul 18, 2013
- ASML NETHERLANDS B.V.
- Christiaan Alexander Hoogendam
- G01 - MEASURING TESTING
Information Patent Application
SUBSTRATE PLACEMENT IN IMMERSION LITHOGRAPHY
- Publication number 20120050740
- Publication date Mar 1, 2012
- ASML NETHERLANDS B.V.
- CHRISTIAAN ALEXANDER HOOGENDAM
- G01 - MEASURING TESTING
Information Patent Application
LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
- Publication number 20100091255
- Publication date Apr 15, 2010
- ASML NETHERLANDS B.V.
- Bob STREEFKERK
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Radiometric Kirk Test
- Publication number 20090086179
- Publication date Apr 2, 2009
- ASML Holding N.V.
- David A. Hult
- G01 - MEASURING TESTING
Information Patent Application
LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
- Publication number 20090033905
- Publication date Feb 5, 2009
- ASML NETHERLANDS B.V.
- Bob STREEFKERK
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
DOSE CONTROL FOR OPTICAL MASKLESS LITHOGRAPHY
- Publication number 20080304034
- Publication date Dec 11, 2008
- ASML NETHERLANDS B.V.
- David Christopher Ockwell
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
UNIFORM BACKGROUND RADIATION IN MASKLESS LITHOGRAPHY
- Publication number 20080231826
- Publication date Sep 25, 2008
- ASML NETHERLANDS B.V.
- Paul Antoon Cyriel Desmedt
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Optimal Rasterization for Maskless Lithography
- Publication number 20080224251
- Publication date Sep 18, 2008
- ASML Holding N.V.
- Kars Zeger Troost
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Lithographic apparatus, immersion projection apparatus and device m...
- Publication number 20080123071
- Publication date May 29, 2008
- ASML NETHERLANDS B.V.
- Jan-Gerard Cornelis Van Der Toorn
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Substrate placement in immersion lithography
- Publication number 20080106723
- Publication date May 8, 2008
- ASML NETHERLANDS B.V.
- Christiaan Alexander Hoogendam
- G01 - MEASURING TESTING
Information Patent Application
Lithographic apparatus, immersion projection apparatus and device m...
- Publication number 20060215131
- Publication date Sep 28, 2006
- ASML NETHERLANDS B.V.
- Jan-Gerard Cornelis Van Der Toorn
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Substrate placement in immersion lithography
- Publication number 20060126038
- Publication date Jun 15, 2006
- ASML NETHERLANDS B.V.
- Christiaan Alexander Hoogendam
- G01 - MEASURING TESTING
Information Patent Application
Lithographic apparatus and device manufacturing method
- Publication number 20050270506
- Publication date Dec 8, 2005
- ASML NETHERLANDS B.V.
- Bob Streefkerk
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Lithographic apparatus and device manufacturing method
- Publication number 20050259233
- Publication date Nov 24, 2005
- ASML NETHERLANDS B.V.
- Bob Streefkerk
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Minne Cuperus

Person

Patents Grantslast 30 patents

Substrate placement in immersion lithography

Substrate placement in immersion lithography

Substrate placement in immersion lithography

Lithographic apparatus and device manufacturing method

Lithographic apparatus and device manufacturing method

Substrate placement in immersion lithography

Substrate placement in immersion lithography

Radiometric Kirk test

Uniform background radiation in maskless lithography

Optimal rasterization for maskless lithography

Lithographic apparatus, immersion projection apparatus and device m...

Lithographic apparatus and device manufacturing method

Lithographic apparatus and device manufacturing method

Substrate placement in immersion lithography

Lithographic apparatus, immersion projection apparatus and device m...

Patents Applicationslast 30 patents

SUBSTRATE PLACEMENT IN IMMERSION LITHOGRAPHY

LITHOGRAPHIC SYSTEM

SUBSTRATE PLACEMENT IN IMMERSION LITHOGRAPHY

SUBSTRATE PLACEMENT IN IMMERSION LITHOGRAPHY

SUBSTRATE PLACEMENT IN IMMERSION LITHOGRAPHY

LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD

Radiometric Kirk Test

LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD

DOSE CONTROL FOR OPTICAL MASKLESS LITHOGRAPHY

UNIFORM BACKGROUND RADIATION IN MASKLESS LITHOGRAPHY

Optimal Rasterization for Maskless Lithography

Lithographic apparatus, immersion projection apparatus and device m...

Substrate placement in immersion lithography

Lithographic apparatus, immersion projection apparatus and device m...

Substrate placement in immersion lithography

Lithographic apparatus and device manufacturing method

Lithographic apparatus and device manufacturing method