Minoru Honda

Person

Amagasaki-shi, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Plasma film-forming apparatus and substrate pedestal
- Patent number 10,968,513
- Issue date Apr 6, 2021
- Tokyo Electron Limited
- Masashi Imanaka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma film-forming method and plasma film-forming apparatus
- Patent number 10,190,217
- Issue date Jan 29, 2019
- Tokyo Electron Limited
- Minoru Honda
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma processing method and plasma processing apparatus
- Patent number 9,779,936
- Issue date Oct 3, 2017
- Tokyo Electron Limited
- Daisuke Katayama
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
MOS semiconductor memory device having charge storage region formed...
- Patent number 8,258,571
- Issue date Sep 4, 2012
- Tokyo Electron Limited
- Tetsuo Endoh
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method for forming insulating film and method for manufacturing sem...
- Patent number 8,247,331
- Issue date Aug 21, 2012
- Tokyo Electron Limited
- Minoru Honda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for forming insulating film and method for manufacturing sem...
- Patent number 8,158,535
- Issue date Apr 17, 2012
- Tokyo Electron Limited
- Minoru Honda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Forming a MOS memory device having a dielectric film laminate as a...
- Patent number 8,124,484
- Issue date Feb 28, 2012
- Tohoku University
- Tetsuo Endoh
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Forming a silicon nitride film by plasma CVD
- Patent number 8,119,545
- Issue date Feb 21, 2012
- Tokyo Electron Limited
- Minoru Honda
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma nitriding method, method for manufacturing semiconductor dev...
- Patent number 7,968,470
- Issue date Jun 28, 2011
- Tohoku University
- Tadahiro Ohmi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for forming insulating film and method for manufacturing sem...
- Patent number 7,960,293
- Issue date Jun 14, 2011
- Tokyo Electron Limited
- Minoru Honda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for nitriding substrate and method for forming insulating film
- Patent number 7,820,557
- Issue date Oct 26, 2010
- Tokyo Electron Limited
- Minoru Honda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
RLSA CVD deposition control using halogen gas for hydrogen scavenging
- Patent number 7,763,551
- Issue date Jul 27, 2010
- Tokyo Electron Limited
- Jozef Brcka
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of processing an organic-film
- Patent number 7,521,098
- Issue date Apr 21, 2009
- Tokyo Electron Limited
- Kazuyuki Mitsuoka
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Grant
Electron beam processing method and apparatus
- Patent number 7,348,129
- Issue date Mar 25, 2008
- Tokyo Electron Limited
- Kazuyuki Mitsuoka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Thin film processing method and system
- Patent number 7,195,936
- Issue date Mar 27, 2007
- Tokyo Electron Limited
- Tadashi Onishi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Surface treating device and surface treating method
- Patent number 7,023,002
- Issue date Apr 4, 2006
- Tokyo Electron Limited
- Kazuya Nagaseki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Surface processing apparatus
- Patent number 7,005,660
- Issue date Feb 28, 2006
- Tokyo Electron Limited
- Minoru Honda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for manufacturing a semiconductor device that includes plana...
- Patent number 6,849,542
- Issue date Feb 1, 2005
- Hitachi, Ltd.
- Soichi Katagiri
- B24 - GRINDING POLISHING

Patents Applicationslast 30 patents

Information Patent Application
FILM FORMING METHOD AND FILM FORMING SYSTEM
- Publication number 20230131213
- Publication date Apr 27, 2023
- TOKYO ELECTRON LIMITED
- Isao GUNJI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA FILM-FORMING APPARATUS AND SUBSTRATE PEDESTAL
- Publication number 20170369996
- Publication date Dec 28, 2017
- TOKYO ELECTRON LIMITED
- Masashi Imanaka
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA FILM-FORMING METHOD AND PLASMA FILM-FORMING APPARATUS
- Publication number 20170370000
- Publication date Dec 28, 2017
- TOKYO ELECTRON LIMITED
- Minoru Honda
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS
- Publication number 20150162193
- Publication date Jun 11, 2015
- TOKYO ELECTRON LIMITED
- Daisuke Katayama
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS
- Publication number 20150093886
- Publication date Apr 2, 2015
- TOKYO ELECTRON LIMITED
- Minoru Honda
- C30 - CRYSTAL GROWTH
Information Patent Application
CRYSTALLINE SILICON FILM FORMING METHOD AND PLASMA CVD APPARATUS
- Publication number 20120315745
- Publication date Dec 13, 2012
- TOKYO ELECTRON LIMITED
- Daisuke Katayama
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD OF FORMING SILICON NITRIDE FILM AND METHOD OF MANUFACTURING...
- Publication number 20120208376
- Publication date Aug 16, 2012
- TOKYO ELECTRON LIMITED
- Minoru Honda
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SILICON NITRIDE FILM AND PROCESS FOR PRODUCTION THEREOF, COMPUTER-R...
- Publication number 20120153442
- Publication date Jun 21, 2012
- TOKYO ELECTRON LIMITED
- Minoru HONDA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SILICON DIOXIDE FILM AND PROCESS FOR PRODUCTION THEREOF, COMPUTER-R...
- Publication number 20120126376
- Publication date May 24, 2012
- TOKYO ELECTRON LIMITED
- Minoru Honda
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD FOR DEPOSITING SILICON NITRIDE FILM, COMPUTER-READABLE STORA...
- Publication number 20110254078
- Publication date Oct 20, 2011
- TOKYO ELECTRON LIMITED
- Minoru HONDA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SILICON OXIDE FILM, METHOD FOR FORMING SILICON OXIDE FILM, AND PLAS...
- Publication number 20110206590
- Publication date Aug 25, 2011
- TOKYO ELECTRON LIMITED
- Minoru Honda
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SILICON OXYNITRIDE FILM AND PROCESS FOR PRODUCTION THEREOF, COMPUTE...
- Publication number 20110189862
- Publication date Aug 4, 2011
- TOKYO ELECTRON LIMITED
- Minoru Honda
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD FOR MANUFACTURING A MOS SEMICONDUCTOR MEMORY DEVICE, AND PLA...
- Publication number 20110086485
- Publication date Apr 14, 2011
- TOKYO ELECTRON LIMITED
- Tetsuo Endoh
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PROCESS FOR PRODUCING SILICON NITRIDE FILM, PROCESS FOR PRODUCING S...
- Publication number 20110086517
- Publication date Apr 14, 2011
- TOKYO ELECTRON LIMITED
- Minoru Honda
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD FOR FORMING INSULATING FILM AND METHOD FOR MANUFACTURING SEM...
- Publication number 20100323529
- Publication date Dec 23, 2010
- TOKYO ELECTRON LIMITED
- Minoru Honda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR FORMING INSULATING FILM AND METHOD FOR MANUFACTURING SEM...
- Publication number 20100323531
- Publication date Dec 23, 2010
- Tokyo Electron Limited
- Minoru Honda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MOS SEMICONDUCTOR MEMORY DEVICE
- Publication number 20100283097
- Publication date Nov 11, 2010
- TOKYO ELECTRON LIMITED
- Tetsuo Endoh
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD AND APPARATUS FOR REFORMING FILM AND CONTROLLING SLIMMING AM...
- Publication number 20100040980
- Publication date Feb 18, 2010
- TOKYO ELECTON LIMITED
- Eiichi Nishimura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR NITRIDING SUBSTRATE AND METHOD FOR FORMING INSULATING FILM
- Publication number 20090269940
- Publication date Oct 29, 2009
- TOKYO ELECTRON LIMITED
- Minoru Honda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
RLSA CVD DEPOSITION CONTROL USING HALOGEN GAS FOR HYDROGEN SCAVENGING
- Publication number 20090241310
- Publication date Oct 1, 2009
- TOKYO ELECTRON LIMITED
- Jozef Brcka
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD FOR FORMING INSULATING FILM AND METHOD FOR MANUFACTURING SEM...
- Publication number 20090197403
- Publication date Aug 6, 2009
- Minoru Honda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA NITRIDING METHOD, METHOD FOR MANUFACTURING SEMICONDUCTOR DEV...
- Publication number 20090104787
- Publication date Apr 23, 2009
- TOHOKU UNIVERSITY
- Tadahiro Ohmi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma processing method
- Publication number 20060269694
- Publication date Nov 30, 2006
- TOKYO ELECTRON LIMITED
- Minoru Honda
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Method and apparatus for reforming laminated films and laminated fi...
- Publication number 20050212179
- Publication date Sep 29, 2005
- TOKYO ELECTRON LIMITED
- Minoru Honda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method and apparatus for reforming film and controlling slimming am...
- Publication number 20050214683
- Publication date Sep 29, 2005
- TOKYO ELECTRON LIMITED
- Eiichi Nishimura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method of processing an organic-film
- Publication number 20050042388
- Publication date Feb 24, 2005
- Kazuyuki Mitsuoka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Surface treating device and surface treating method
- Publication number 20040262540
- Publication date Dec 30, 2004
- TOKYO ELECTRON LIMITED
- Kazuya Nagaseki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Electron beam processing method and apparatus
- Publication number 20040248040
- Publication date Dec 9, 2004
- TOKYO ELECTRON LIMITED
- Kazuyuki Mitsuoka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Surface processing apparatus
- Publication number 20040222388
- Publication date Nov 11, 2004
- TOKYO ELECTRON LIMITED
- Minoru Honda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Thin film processing method and system
- Publication number 20040137760
- Publication date Jul 15, 2004
- TOKYO ELECTRON LIMITED
- Tadashi Onishi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Minoru Honda

Person

Patents Grantslast 30 patents

Plasma film-forming apparatus and substrate pedestal

Plasma film-forming method and plasma film-forming apparatus

Plasma processing method and plasma processing apparatus

MOS semiconductor memory device having charge storage region formed...

Method for forming insulating film and method for manufacturing sem...

Method for forming insulating film and method for manufacturing sem...

Forming a MOS memory device having a dielectric film laminate as a...

Forming a silicon nitride film by plasma CVD

Plasma nitriding method, method for manufacturing semiconductor dev...

Method for forming insulating film and method for manufacturing sem...

Method for nitriding substrate and method for forming insulating film

RLSA CVD deposition control using halogen gas for hydrogen scavenging

Method of processing an organic-film

Electron beam processing method and apparatus

Thin film processing method and system

Surface treating device and surface treating method

Surface processing apparatus

Method for manufacturing a semiconductor device that includes plana...

Patents Applicationslast 30 patents

FILM FORMING METHOD AND FILM FORMING SYSTEM

PLASMA FILM-FORMING APPARATUS AND SUBSTRATE PEDESTAL

PLASMA FILM-FORMING METHOD AND PLASMA FILM-FORMING APPARATUS

PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS

PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS

CRYSTALLINE SILICON FILM FORMING METHOD AND PLASMA CVD APPARATUS

METHOD OF FORMING SILICON NITRIDE FILM AND METHOD OF MANUFACTURING...

SILICON NITRIDE FILM AND PROCESS FOR PRODUCTION THEREOF, COMPUTER-R...

SILICON DIOXIDE FILM AND PROCESS FOR PRODUCTION THEREOF, COMPUTER-R...

METHOD FOR DEPOSITING SILICON NITRIDE FILM, COMPUTER-READABLE STORA...

SILICON OXIDE FILM, METHOD FOR FORMING SILICON OXIDE FILM, AND PLAS...

SILICON OXYNITRIDE FILM AND PROCESS FOR PRODUCTION THEREOF, COMPUTE...

METHOD FOR MANUFACTURING A MOS SEMICONDUCTOR MEMORY DEVICE, AND PLA...

PROCESS FOR PRODUCING SILICON NITRIDE FILM, PROCESS FOR PRODUCING S...

METHOD FOR FORMING INSULATING FILM AND METHOD FOR MANUFACTURING SEM...

METHOD FOR FORMING INSULATING FILM AND METHOD FOR MANUFACTURING SEM...

MOS SEMICONDUCTOR MEMORY DEVICE

METHOD AND APPARATUS FOR REFORMING FILM AND CONTROLLING SLIMMING AM...

METHOD FOR NITRIDING SUBSTRATE AND METHOD FOR FORMING INSULATING FILM

RLSA CVD DEPOSITION CONTROL USING HALOGEN GAS FOR HYDROGEN SCAVENGING

METHOD FOR FORMING INSULATING FILM AND METHOD FOR MANUFACTURING SEM...

PLASMA NITRIDING METHOD, METHOD FOR MANUFACTURING SEMICONDUCTOR DEV...

Plasma processing method

Method and apparatus for reforming laminated films and laminated fi...

Method and apparatus for reforming film and controlling slimming am...

Method of processing an organic-film

Surface treating device and surface treating method

Electron beam processing method and apparatus

Surface processing apparatus

Thin film processing method and system