Minoru ITO

Person

Kasugai-shi, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Flow rate verification unit
- Patent number 10,317,269
- Issue date Jun 11, 2019
- CKD Corporation
- Naoya Shiroyama
- G01 - MEASURING TESTING
Information Patent Grant
Vacuum valve and vacuum pressure control system using the same
- Patent number 10,260,656
- Issue date Apr 16, 2019
- CKD Corporation
- Minoru Ito
- F16 - ENGINEERING ELEMENTS AND UNITS GENERAL MEASURES FOR PRODUCING AND MAINT...
Information Patent Grant
Gas flow monitoring system
- Patent number 8,826,935
- Issue date Sep 9, 2014
- CKD Corporation
- Akiko Nakada
- G05 - CONTROLLING REGULATING
Information Patent Grant
Gas supply unit and gas supply system
- Patent number 8,104,516
- Issue date Jan 31, 2012
- CKD Corporation
- Shuji Moriya
- F17 - STORING OF DISTRIBUTING GASES OR LIQUIDS
Information Patent Grant
Gas flow rate verification unit
- Patent number 7,716,993
- Issue date May 18, 2010
- CKD Corporation
- Yukio Ozawa
- G01 - MEASURING TESTING
Information Patent Grant
Relative pressure control system and relative flow control system
- Patent number 7,353,841
- Issue date Apr 8, 2008
- CKD Corporation
- Tetsujiro Kono
- G05 - CONTROLLING REGULATING
Information Patent Grant
Liquid raw material supply unit for vaporizer
- Patent number 7,343,926
- Issue date Mar 18, 2008
- CKD Corporation
- Tsuneyuki Okabe
- F16 - ENGINEERING ELEMENTS AND UNITS GENERAL MEASURES FOR PRODUCING AND MAINT...
Information Patent Grant
Flow quantity test system for mass flow controller
- Patent number 5,394,755
- Issue date Mar 7, 1995
- CKD Corporation
- Yoshihisa Sudo
- G01 - MEASURING TESTING

Patents Applicationslast 30 patents

Information Patent Application
VACUUM VALVE AND VACUUM PRESSURE CONTROL SYSTEM USING THE SAME
- Publication number 20170351275
- Publication date Dec 7, 2017
- CKD CORPORATION
- Minoru ITO
- F16 - ENGINEERING ELEMENTS AND UNITS GENERAL MEASURES FOR PRODUCING AND MAINT...
Information Patent Application
FLOW RATE VERIFICATION UNIT
- Publication number 20170299420
- Publication date Oct 19, 2017
- CKD CORPORATION
- Naoya SHIROYAMA
- G01 - MEASURING TESTING
Information Patent Application
GAS FLOW MONITORING METHOD AND GAS FLOW MONITORING APPARATUS
- Publication number 20170167026
- Publication date Jun 15, 2017
- CKD CORPORATION
- Akiko NAKADA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
GAS FLOW MONITORING SYSTEM
- Publication number 20130092269
- Publication date Apr 18, 2013
- CKD CORPORATION
- Akiko NAKADA
- G01 - MEASURING TESTING
Information Patent Application
Gas Supply Unit and Gas Supply System
- Publication number 20090165872
- Publication date Jul 2, 2009
- CKD CORPORATION
- Shuji Moriya
- F17 - STORING OF DISTRIBUTING GASES OR LIQUIDS
Information Patent Application
Gas Flow Rate Verification Unit
- Publication number 20090019943
- Publication date Jan 22, 2009
- CKD CORPORATION
- Yukio Ozawa
- G01 - MEASURING TESTING
Information Patent Application
Liquid raw material supply unit for vaporizer
- Publication number 20070295405
- Publication date Dec 27, 2007
- CKD CORPORATION
- Tsuneyuki Okabe
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Relative pressure control system and relative flow control system
- Publication number 20060097644
- Publication date May 11, 2006
- CKD CORPORATION
- Tetsujiro Kono
- G05 - CONTROLLING REGULATING

Person

Patents Grantslast 30 patents

Flow rate verification unit

Vacuum valve and vacuum pressure control system using the same

Gas flow monitoring system

Gas supply unit and gas supply system

Gas flow rate verification unit

Relative pressure control system and relative flow control system

Liquid raw material supply unit for vaporizer

Flow quantity test system for mass flow controller

Patents Applicationslast 30 patents

VACUUM VALVE AND VACUUM PRESSURE CONTROL SYSTEM USING THE SAME

FLOW RATE VERIFICATION UNIT

GAS FLOW MONITORING METHOD AND GAS FLOW MONITORING APPARATUS

GAS FLOW MONITORING SYSTEM

Gas Supply Unit and Gas Supply System

Gas Flow Rate Verification Unit

Liquid raw material supply unit for vaporizer

Relative pressure control system and relative flow control system