Minyoung HUR

Person

Suwon-si, KR

People

Patents Grantslast 30 patents

Information Patent Grant
Plasma etching method and semiconductor device fabrication method i...
- Patent number 12,020,903
- Issue date Jun 25, 2024
- Samsung Electronics Co., Ltd.
- Yonghee Kim
- H03 - BASIC ELECTRONIC CIRCUITRY
Information Patent Grant
Plasma etching method and semiconductor device fabrication method i...
- Patent number 11,545,341
- Issue date Jan 3, 2023
- Samsung Electronics Co., Ltd.
- Yonghee Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electrostatic chuck and plasma processing apparatus including the same
- Patent number 11,398,397
- Issue date Jul 26, 2022
- Samsung Electronics Co., Ltd.
- Yongwoo Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma control apparatus and plasma processing system including the...
- Patent number 11,282,679
- Issue date Mar 22, 2022
- Samsung Electronics Co., Ltd.
- Donghyeon Na
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
PLASMA CONTROL DEVICE AND PLASMA CONTROL METHOD
- Publication number 20240234094
- Publication date Jul 11, 2024
- Samsung Electronics Co., Ltd.
- Changho KIM
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA CONTROL DEVICE AND PLASMA CONTROL METHOD
- Publication number 20240136155
- Publication date Apr 25, 2024
- Samsung Electronics Co., Ltd.
- Changho KIM
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA ETCHING APPARATUS AND OPERATING METHOD THEREOF
- Publication number 20240128056
- Publication date Apr 18, 2024
- Samsung Electronics Co., Ltd.
- Hyeontae Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD USIN...
- Publication number 20230282453
- Publication date Sep 7, 2023
- Samsung Electronics Co., Ltd.
- HAKYOUNG KIM
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA BAFFLE, SUBSTRATE PROCESSING APPARATUS INCLUDING THE SAME, A...
- Publication number 20230245864
- Publication date Aug 3, 2023
- Samsung Electronics Co., Ltd.
- HAKYOUNG KIM
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA BAFFLE, SUBSTRATE PROCESSING APPARATUS INCLUDING THE SAME, A...
- Publication number 20230187185
- Publication date Jun 15, 2023
- Samsung Electronics Co., Ltd.
- SUMIN PARK
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA ETCHING METHOD AND SEMICONDUCTOR DEVICE FABRICATION METHOD I...
- Publication number 20230084124
- Publication date Mar 16, 2023
- Samsung Electronics Co., Ltd.
- Yonghee KIM
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF MEASURING PARAMETERS OF PLASMA, APPARATUS FOR MEASURING P...
- Publication number 20230060400
- Publication date Mar 2, 2023
- Samsung Electronics Co., Ltd.
- Yoonbum Nam
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
IMPEDANCE MEASUREMENT JIG AND METHOD OF CONTROLLING A SUBSTRATE-PRO...
- Publication number 20230010881
- Publication date Jan 12, 2023
- Samsung Electronics Co., Ltd.
- Byeongsang KIM
- G01 - MEASURING TESTING
Information Patent Application
PLASMA ETCHING METHOD AND SEMICONDUCTOR DEVICE FABRICATION METHOD I...
- Publication number 20210104382
- Publication date Apr 8, 2021
- Samsung Electronics Co., Ltd.
- Yonghee KIM
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA CONTROL APPARATUS AND PLASMA PROCESSING SYSTEM INCLUDING THE...
- Publication number 20200373126
- Publication date Nov 26, 2020
- Samsung Electronics Co., Ltd.
- Donghyeon NA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ELECTROSTATIC CHUCK AND PLASMA PROCESSING APPARATUS INCLUDING THE SAME
- Publication number 20200161157
- Publication date May 21, 2020
- Samsung Electronics Co., Ltd.
- Yongwoo LEE
- H01 - BASIC ELECTRIC ELEMENTS

Minyoung HUR

Person

Patents Grantslast 30 patents

Plasma etching method and semiconductor device fabrication method i...

Plasma etching method and semiconductor device fabrication method i...

Electrostatic chuck and plasma processing apparatus including the same

Plasma control apparatus and plasma processing system including the...

Patents Applicationslast 30 patents

PLASMA CONTROL DEVICE AND PLASMA CONTROL METHOD

PLASMA CONTROL DEVICE AND PLASMA CONTROL METHOD

PLASMA ETCHING APPARATUS AND OPERATING METHOD THEREOF

SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD USIN...

PLASMA BAFFLE, SUBSTRATE PROCESSING APPARATUS INCLUDING THE SAME, A...

PLASMA BAFFLE, SUBSTRATE PROCESSING APPARATUS INCLUDING THE SAME, A...

PLASMA ETCHING METHOD AND SEMICONDUCTOR DEVICE FABRICATION METHOD I...

METHOD OF MEASURING PARAMETERS OF PLASMA, APPARATUS FOR MEASURING P...

IMPEDANCE MEASUREMENT JIG AND METHOD OF CONTROLLING A SUBSTRATE-PRO...

PLASMA ETCHING METHOD AND SEMICONDUCTOR DEVICE FABRICATION METHOD I...

PLASMA CONTROL APPARATUS AND PLASMA PROCESSING SYSTEM INCLUDING THE...

ELECTROSTATIC CHUCK AND PLASMA PROCESSING APPARATUS INCLUDING THE SAME