Mirko Vukovic

Person

Slingerlands, NY, US

People

Patents Grantslast 30 patents

Information Patent Grant
Apparatus and methods for beam processing of substrates
- Patent number 12,105,423
- Issue date Oct 1, 2024
- Tokyo Electron Limited
- Mirko Vukovic
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus and method for spin processing
- Patent number 12,007,689
- Issue date Jun 11, 2024
- Tokyo Electron Limited
- Mirko Vukovic
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
System and method for liquid dispense and coverage control
- Patent number 11,883,837
- Issue date Jan 30, 2024
- Tokyo Electron Limited
- Mirko Vukovic
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Grant
Atmospheric plasma processing systems and methods for manufacture o...
- Patent number 11,049,700
- Issue date Jun 29, 2021
- Tokyo Electron Limited
- Anton J. deVilliers
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Electromagnetic wave treatment of a substrate at microwave frequenc...
- Patent number 10,522,384
- Issue date Dec 31, 2019
- Tokyo Electron Limited
- Mirko Vukovic
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Processing system for electromagnetic wave treatment of a substrate...
- Patent number 10,426,001
- Issue date Sep 24, 2019
- Tokyo Electron Limited
- Ronald Nasman
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Heated stage with variable thermal emissivity method and apparatus
- Patent number 10,256,121
- Issue date Apr 9, 2019
- Tokyo Electron Limited
- Mirko Vukovic
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Computed tomography using intersecting views of plasma using optica...
- Patent number 10,215,704
- Issue date Feb 26, 2019
- Tokyo Electron Limited
- Taejoon Han
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Method and apparatus for reducing substrate temperature variability
- Patent number 8,568,555
- Issue date Oct 29, 2013
- Tokyo Electron Limited
- Kenji Suzuki
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method and system for measuring a flow rate in a solid precursor de...
- Patent number 8,435,351
- Issue date May 7, 2013
- Tokyo Electron Limited
- Mirko Vukovic
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Gas distribution system and method for distributing process gas in...
- Patent number 8,252,114
- Issue date Aug 28, 2012
- Tokyo Electron Limited
- Mirko Vukovic
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method and system for improving deposition uniformity in a vapor de...
- Patent number 8,048,226
- Issue date Nov 1, 2011
- Tokyo Electron Limited
- Mirko Vukovic
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Thermal stress-failure-resistant dielectric windows in vacuum proce...
- Patent number 7,959,775
- Issue date Jun 14, 2011
- Tokyo Electron Limited
- Mirko Vukovic
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Internal antennae for plasma processing with metal plasma
- Patent number 7,691,243
- Issue date Apr 6, 2010
- Tokyo Electron Limited
- Mirko Vukovic
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Internal coil with segmented shield and inductively-coupled plasma...
- Patent number 7,591,232
- Issue date Sep 22, 2009
- Tokyo Electron Limited
- Mirko Vukovic
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Self-calibrating optical emission spectroscopy for plasma monitoring
- Patent number 7,537,671
- Issue date May 26, 2009
- Tokyo Electron Limited
- Mirko Vukovic
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method and apparatus for detecting a plasma
- Patent number 7,314,537
- Issue date Jan 1, 2008
- Tokyo Electron Limited
- Craig T. Baldwin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Magnetically enhanced capacitive plasma source for ionized physical...
- Patent number 7,315,128
- Issue date Jan 1, 2008
- Tokyo Electron Limited
- Mirko Vukovic
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Process apparatus and method for improving plasma production of an...
- Patent number 7,255,774
- Issue date Aug 14, 2007
- Tokyo Electron Limited
- Mirko Vukovic
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Magnetically enhanced capacitive plasma source for ionized physical...
- Patent number 7,084,573
- Issue date Aug 1, 2006
- Tokyo Electron Limited
- Mirko Vukovic
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma generation by mode-conversion of RF-electromagnetic wave to...
- Patent number 6,771,026
- Issue date Aug 3, 2004
- Tokyo Electron Limited
- Mirko Vukovic
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Method and apparatus for ionized physical vapor deposition
- Patent number 6,719,886
- Issue date Apr 13, 2004
- Tokyo Electron Limited
- John Stephen Drewery
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Inductively-coupled plasma processing system
- Patent number 6,652,711
- Issue date Nov 25, 2003
- Tokyo Electron Limited
- Jozef Brcka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Immersed inductively—coupled plasma source
- Patent number 6,417,626
- Issue date Jul 9, 2002
- Tokyo Electron Limited
- Jozef Brcka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for ionized physical vapor deposition
- Patent number 6,287,435
- Issue date Sep 11, 2001
- Tokyo Electron Limited
- John Stephen Drewery
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Dual cathode arrangement for physical vapor deposition of materials...
- Patent number 6,277,250
- Issue date Aug 21, 2001
- Tokyo Electron Limited
- Derrek A. Russell
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Ionized physical vapor deposition method and apparatus with magneti...
- Patent number 6,254,745
- Issue date Jul 3, 2001
- Tokyo Electron Limited
- Mirko Vukovic
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents

Information Patent Application
APPARATUS AND METHODS FOR BEAM PROCESSING OF SUBSTRATES
- Publication number 20240419080
- Publication date Dec 19, 2024
- TOKYO ELECTRON LIMITED
- Mirko Vukovic
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
System and Method for Liquid Dispense and Coverage Control
- Publication number 20240042472
- Publication date Feb 8, 2024
- TOKYO ELECTRON LIMITED
- Mirko VUKOVIC
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Application
METHODS TO AUTOMATICALLY ADJUST ONE OR MORE PARAMETERS OF A CAMERA...
- Publication number 20240046446
- Publication date Feb 8, 2024
- TOKYO ELECTRON LIMITED
- Mirko Vukovic
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Apparatus and Method for Spin Processing
- Publication number 20230004088
- Publication date Jan 5, 2023
- TOKYO ELECTRON LIMITED
- Mirko Vukovic
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
System and Method for Liquid Dispense and Coverage Control
- Publication number 20210339276
- Publication date Nov 4, 2021
- TOKYO ELECTRON LIMITED
- Mirko VUKOVIC
- G01 - MEASURING TESTING
Information Patent Application
Apparatus and Methods for Beam Processing of Substrates
- Publication number 20210109450
- Publication date Apr 15, 2021
- TOKYO ELECTRON LIMITED
- Mirko Vukovic
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Computed Tomography using Intersecting Views of Plasma using Optica...
- Publication number 20180252650
- Publication date Sep 6, 2018
- TOKYO ELECTRON LIMITED
- Daniel Morvay
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
ATMOSPHERIC PLASMA PROCESSING SYSTEMS AND METHODS FOR MANUFACTURE O...
- Publication number 20180096827
- Publication date Apr 5, 2018
- TOKYO ELECTRON LIMITED
- Anton J. deVilliers
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ELECTROMAGNETIC WAVE TREATMENT OF A SUBSTRATE AT MICROWAVE FREQUENC...
- Publication number 20170084462
- Publication date Mar 23, 2017
- TOKYO ELECTRON LIMITED
- Mirko Vukovic
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HEATED STAGE WITH VARIABLE THERMAL EMISSIVITY METHOD AND APPARATUS
- Publication number 20170011975
- Publication date Jan 12, 2017
- TOKYO ELECTRON LIMITED
- Mirko Vukovic
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PROCESSING SYSTEM FOR ELECTROMAGNETIC WAVE TREATMENT OF A SUBSTRATE...
- Publication number 20140273532
- Publication date Sep 18, 2014
- TOKYO ELECTRON LIMITED
- Ronald Nasman
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS AND METHOD FOR RF GROUNDING OF IPVD TABLE
- Publication number 20090242383
- Publication date Oct 1, 2009
- TOKYO ELECTRON LIMITED
- Mirko Vukovic
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
GAS DISTRIBUTION SYSTEM AND METHOD FOR DISTRIBUTING PROCESS GAS IN...
- Publication number 20090246374
- Publication date Oct 1, 2009
- TOKYO ELECTRON LIMITED
- Mirko Vukovic
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Method and apparatus for reducing substrate temperature variability
- Publication number 20080241379
- Publication date Oct 2, 2008
- TOKYO ELECTRON LIMITED
- Kenji Suzuki
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD AND SYSTEM FOR IMPROVING DEPOSITION UNIFORMITY IN A VAPOR DE...
- Publication number 20080236497
- Publication date Oct 2, 2008
- TOKYO ELECTON LIMITED
- Mirko Vukovic
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Lazy Susan Tool Layout for Light-Activated ALD
- Publication number 20080226842
- Publication date Sep 18, 2008
- TOKYO ELECTRON LIMITED
- Mirko Vukovic
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Thermal-Stress-Failure-Resistant Dielectric Windows in Vacuum Proce...
- Publication number 20080083615
- Publication date Apr 10, 2008
- TOKYO ELECTRON LIMITED
- Mirko Vukovic
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Self-Calibrating Optical Emission Spectroscopy for Plasma Monitoring
- Publication number 20080078504
- Publication date Apr 3, 2008
- TOKYO ELECTRON LIMITED
- Mirko Vukovic
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
INTERNAL COIL WITH SEGMENTED SHIELD AND INDUCTIVELY-COUPLED PLASMA...
- Publication number 20070235327
- Publication date Oct 11, 2007
- TOKYO ELECTRON LIMITED
- Mirko Vukovic
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
ICP source for iPVD for uniform plasma in combination high pressure...
- Publication number 20070074968
- Publication date Apr 5, 2007
- Mirko Vukovic
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
MAGNETICALLY ENHANCED CAPACITIVE PLASMA SOURCE FOR IONIZED PHYSICAL...
- Publication number 20060197457
- Publication date Sep 7, 2006
- TOKYO ELECTRON LIMITED
- Mirko Vukovic
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method and system for measuring a flow rate in a solid precursor de...
- Publication number 20060115589
- Publication date Jun 1, 2006
- TOKYO ELECTRON LIMITED
- Mirko Vukovic
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Internal antennae for plasma processing with metal plasma
- Publication number 20050279628
- Publication date Dec 22, 2005
- Mirko Vukovic
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Magnetically enhanced capacitive plasma source for ionized physical...
- Publication number 20050194910
- Publication date Sep 8, 2005
- TOKYO ELECTRON LIMITED
- Mirko Vukovic
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method and apparatus for detecting a plasma
- Publication number 20050067102
- Publication date Mar 31, 2005
- Craig T. Baldwin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Process apparatus and method for improving plasma production of an...
- Publication number 20040060517
- Publication date Apr 1, 2004
- Tokyo Electron Limited of TBS Broadcast Center
- Mirko Vukovic
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma generation by mode-conversion of RF-electromagnetic wave to...
- Publication number 20030232151
- Publication date Dec 18, 2003
- Tokyo Electron Limited of TBS Broadcast Center
- Mirko Vukovic
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
Inductively-coupled plasma processing system
- Publication number 20020185229
- Publication date Dec 12, 2002
- Tokyo Electron Limited of TBS Broadcast Center
- Jozef Brcka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method and apparatus for ionized physical vapor deposition
- Publication number 20020104751
- Publication date Aug 8, 2002
- John Stephen Drewery
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Mirko Vukovic

Person

Patents Grantslast 30 patents

Apparatus and methods for beam processing of substrates

Apparatus and method for spin processing

System and method for liquid dispense and coverage control

Atmospheric plasma processing systems and methods for manufacture o...

Electromagnetic wave treatment of a substrate at microwave frequenc...

Processing system for electromagnetic wave treatment of a substrate...

Heated stage with variable thermal emissivity method and apparatus

Computed tomography using intersecting views of plasma using optica...

Method and apparatus for reducing substrate temperature variability

Method and system for measuring a flow rate in a solid precursor de...

Gas distribution system and method for distributing process gas in...

Method and system for improving deposition uniformity in a vapor de...

Thermal stress-failure-resistant dielectric windows in vacuum proce...

Internal antennae for plasma processing with metal plasma

Internal coil with segmented shield and inductively-coupled plasma...

Self-calibrating optical emission spectroscopy for plasma monitoring

Method and apparatus for detecting a plasma

Magnetically enhanced capacitive plasma source for ionized physical...

Process apparatus and method for improving plasma production of an...

Magnetically enhanced capacitive plasma source for ionized physical...

Plasma generation by mode-conversion of RF-electromagnetic wave to...

Method and apparatus for ionized physical vapor deposition

Inductively-coupled plasma processing system

Immersed inductively&#x02014;coupled plasma source

Method and apparatus for ionized physical vapor deposition

Dual cathode arrangement for physical vapor deposition of materials...

Ionized physical vapor deposition method and apparatus with magneti...

Patents Applicationslast 30 patents

APPARATUS AND METHODS FOR BEAM PROCESSING OF SUBSTRATES

System and Method for Liquid Dispense and Coverage Control

METHODS TO AUTOMATICALLY ADJUST ONE OR MORE PARAMETERS OF A CAMERA...

Apparatus and Method for Spin Processing

System and Method for Liquid Dispense and Coverage Control

Apparatus and Methods for Beam Processing of Substrates

Computed Tomography using Intersecting Views of Plasma using Optica...

ATMOSPHERIC PLASMA PROCESSING SYSTEMS AND METHODS FOR MANUFACTURE O...

ELECTROMAGNETIC WAVE TREATMENT OF A SUBSTRATE AT MICROWAVE FREQUENC...

HEATED STAGE WITH VARIABLE THERMAL EMISSIVITY METHOD AND APPARATUS

PROCESSING SYSTEM FOR ELECTROMAGNETIC WAVE TREATMENT OF A SUBSTRATE...

APPARATUS AND METHOD FOR RF GROUNDING OF IPVD TABLE

GAS DISTRIBUTION SYSTEM AND METHOD FOR DISTRIBUTING PROCESS GAS IN...

Method and apparatus for reducing substrate temperature variability

METHOD AND SYSTEM FOR IMPROVING DEPOSITION UNIFORMITY IN A VAPOR DE...

Lazy Susan Tool Layout for Light-Activated ALD

Thermal-Stress-Failure-Resistant Dielectric Windows in Vacuum Proce...

Self-Calibrating Optical Emission Spectroscopy for Plasma Monitoring

INTERNAL COIL WITH SEGMENTED SHIELD AND INDUCTIVELY-COUPLED PLASMA...

ICP source for iPVD for uniform plasma in combination high pressure...

MAGNETICALLY ENHANCED CAPACITIVE PLASMA SOURCE FOR IONIZED PHYSICAL...

Method and system for measuring a flow rate in a solid precursor de...

Internal antennae for plasma processing with metal plasma

Magnetically enhanced capacitive plasma source for ionized physical...

Method and apparatus for detecting a plasma

Process apparatus and method for improving plasma production of an...

Plasma generation by mode-conversion of RF-electromagnetic wave to...

Inductively-coupled plasma processing system

Method and apparatus for ionized physical vapor deposition

Immersed inductively—coupled plasma source