Mitsuharu SHIMODA

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Shibukawa, Shibukawa-shi, Gunma, JP

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Patents Grantslast 30 patents

Information Patent Grant
Method of manufacturing semiconductor device, and etching gas
- Patent number 12,261,050
- Issue date Mar 25, 2025
- Kioxia Corporation
- Takaya Ishino
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma etching method using gas molecule containing sulfur atom
- Patent number 11,315,797
- Issue date Apr 26, 2022
- Kanto Denka Kogyo Co., Ltd.
- Korehito Kato
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, AND ETCHING GAS
- Publication number 20230307244
- Publication date Sep 28, 2023
- KIOXIA Corporation
- Takaya ISHINO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA ETCHING METHOD USING GAS MOLECULE CONTAINING SULFUR ATOM
- Publication number 20210233774
- Publication date Jul 29, 2021
- Kanto Denka Kogyo Co., LTD.
- Korehito KATO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, AND ETCHING GAS
- Publication number 20210193475
- Publication date Jun 24, 2021
- KIOXIA Corporation
- Takaya ISHINO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF PRODUCING COMPOUND HAVING BUTADIENE SKELETON CONTAINING H...
- Publication number 20200377434
- Publication date Dec 3, 2020
- Kanto Denka Kogyo Co., LTD.
- Hideki AMII
- C07 - ORGANIC CHEMISTRY