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Mitsuhiro Hata
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Suwon-si, KR
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Patents Grants
last 30 patents
Information
Patent Grant
Mask pattern for semiconductor device fabrication, method of formin...
Patent number
8,241,837
Issue date
Aug 14, 2012
Samsung Electronics Co., Ltd.
Jung-Hwan Hah
B82 - NANO-TECHNOLOGY
Information
Patent Grant
Mask patterns including gel layers for semiconductor device fabrica...
Patent number
7,985,529
Issue date
Jul 26, 2011
Samsung Electronics Co., Ltd.
Mitsuhiro Hata
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Mask patterns for semiconductor device fabrication and related meth...
Patent number
7,855,038
Issue date
Dec 21, 2010
Samsung Electronics Co., Ltd.
Jung-hwan Hah
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Mask pattern for semiconductor device fabrication, method of formin...
Patent number
7,851,125
Issue date
Dec 14, 2010
Samsung Electronics Co., Ltd.
Jung-Hwan Hah
B82 - NANO-TECHNOLOGY
Information
Patent Grant
Polymer, top coating layer, top coating composition and immersion l...
Patent number
7,642,042
Issue date
Jan 5, 2010
Samsung Electronics Co., Ltd.
Mitsuhiro Hata
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Grant
Mask pattern for semiconductor device fabrication, method of formin...
Patent number
7,604,911
Issue date
Oct 20, 2009
Samsung Electronics Co., Ltd.
Mitsuhiro Hata
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Barrier coating compositions containing fluorine and methods of for...
Patent number
7,468,235
Issue date
Dec 23, 2008
Samsung Electronics Co., Ltd.
Mitsuhiro Hata
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Top coating composition for photoresist and method of forming photo...
Patent number
7,384,730
Issue date
Jun 10, 2008
Samsung Electronics Co., Ltd.
Mitsuhiro Hata
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Grant
Barrier coating compositions containing silicon and methods of form...
Patent number
7,361,612
Issue date
Apr 22, 2008
Samsung Electronics Co., Ltd.
Sang-Jun Choi
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Mask patterns for semiconductor device fabrication and related methods
Patent number
7,361,609
Issue date
Apr 22, 2008
Samsung Electronics Co., Ltd.
Jung-hwan Hah
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Mask pattern for semiconductor device fabrication, method of formin...
Patent number
7,314,691
Issue date
Jan 1, 2008
Samsung Electronics Co., Ltd.
Mitsuhiro Hata
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Patents Applications
last 30 patents
Information
Patent Application
MASK PATTERN FOR SEMICONDUCTOR DEVICE FABRICATION, METHOD OF FORMIN...
Publication number
20110059613
Publication date
Mar 10, 2011
Jung-Hwan Hah
B82 - NANO-TECHNOLOGY
Information
Patent Application
MASK PATTERNS INCLUDING GEL LAYERS FOR SEMICONDUCTOR DEVICE FABRICA...
Publication number
20090263732
Publication date
Oct 22, 2009
Mitsuhiro Hata
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
Coating compositions for use in forming patterns and methods of for...
Publication number
20080305638
Publication date
Dec 11, 2008
Sang-jung Choi
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
Mask Patterns for Semiconductor Device Fabrication and Related Meth...
Publication number
20080176152
Publication date
Jul 24, 2008
SAMSUNG ELECTRONICS CO., LTD.
Jung-hwan Hah
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
Coating Compositions for Use in Forming Patterns and Methods of For...
Publication number
20080113300
Publication date
May 15, 2008
Samsung Electronics Co., Ltd.
Sang-jun Choi
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
MASK PATTERN FOR SEMICONDUCTOR DEVICE FABRICATION, METHOD OF FORMIN...
Publication number
20080076255
Publication date
Mar 27, 2008
Mitsuhiro Hata
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
Polymer, top coating layer, top coating composition and immersion l...
Publication number
20070155925
Publication date
Jul 5, 2007
Mitsuhiro Hata
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Application
Barrier coating compositions containing fluorine and methods of for...
Publication number
20070048671
Publication date
Mar 1, 2007
SAMSUNG ELECTRONICS CO., LTD.
Mitsuhiro Hata
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
Coating compositions for use in forming patterns and methods of for...
Publication number
20070048670
Publication date
Mar 1, 2007
SAMSUNG ELECTRONICS CO., LTD.
Sang-jun Choi
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
Barrier coating compositions for photoresist and methods of forming...
Publication number
20070037068
Publication date
Feb 15, 2007
SAMSUNG ELECTRONICS CO., LTD.
Sang-Jun Choi
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
Top coating composition for photoresist and method of forming photo...
Publication number
20060275697
Publication date
Dec 7, 2006
Mitsuhiro Hata
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
Double photolithography methods with reduced intermixing of solvents
Publication number
20060127816
Publication date
Jun 15, 2006
SAMSUNG ELECTRONICS CO., LTD.
Yool Kang
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
Bottom layer resist polymers for photolithography and methods of ma...
Publication number
20060111547
Publication date
May 25, 2006
Mitsuhiro Hata
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Application
Top coating composition for photoresist and method of forming photo...
Publication number
20060111550
Publication date
May 25, 2006
Mitsuhiro Hata
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Application
Mask patterns including gel layers for semiconductor device fabrica...
Publication number
20060063077
Publication date
Mar 23, 2006
SAMSUNG ELECTRONICS CO., LTD.
Mitsuhiro Hata
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
Mask patterns for semiconductor device fabrication and related meth...
Publication number
20060063384
Publication date
Mar 23, 2006
Jung-hwan Hah
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
Mask pattern for semiconductor device fabrication, method of formin...
Publication number
20060046205
Publication date
Mar 2, 2006
Jung-Hwan Hah
B82 - NANO-TECHNOLOGY
Information
Patent Application
Mask pattern for semiconductor device fabrication, method of formin...
Publication number
20050227492
Publication date
Oct 13, 2005
SAMSUNG ELECTRONICS CO., LTD.
Jung-Hwan Hah
B82 - NANO-TECHNOLOGY
Information
Patent Application
Mask pattern for semiconductor device fabrication, method of formin...
Publication number
20050227151
Publication date
Oct 13, 2005
SAMSUNG ELECTRONICS CO., LTD.
Mitsuhiro Hata
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY