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Mitsuhiro HATA

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  • Mamaroneck, NY, US
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Patents Grantslast 30 patents

  • Information Patent Grant

    Photoresist composition
    • Patent number 9,063,414
    • Issue date Jun 23, 2015
    • Sumitomo Chemical Company, Limited
    • Koji Ichikawa
    • G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
  • Information Patent Grant

    Photoresist composition
    • Patent number 8,900,790
    • Issue date Dec 2, 2014
    • Sumitomo Chemical Company, Limited
    • Tatsuro Masuyama
    • C07 - ORGANIC CHEMISTRY
  • Information Patent Grant

    Photoresist composition
    • Patent number 8,546,059
    • Issue date Oct 1, 2013
    • Sumitomo Chemical Company, Limited
    • Koji Ichikawa
    • G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

  • Information Patent Application

    PHOTORESIST COMPOSITION
    • Publication number 20120028188
    • Publication date Feb 2, 2012
    • Sumitomo Chemical Company, Limited
    • Koji ICHIKAWA
    • G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
  • Information Patent Application

    RESIST PROCESSING METHOD
    • Publication number 20110189618
    • Publication date Aug 4, 2011
    • Sumitomo Chemical Company, Limited
    • Mitsuhiro Hata
    • G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
  • Information Patent Application

    RESIST PROCESSING METHOD AND USE OF POSITIVE TYPE RESIST COMPOSITION
    • Publication number 20110183264
    • Publication date Jul 28, 2011
    • Sumitomo Chemical Company, Limited
    • Kazuhiko Hashimoto
    • G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
  • Information Patent Application

    RESIST PROCESSING METHOD
    • Publication number 20110171586
    • Publication date Jul 14, 2011
    • Sumitomo Chemical Company, Limited
    • Mitsuhiro Hata
    • G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
  • Information Patent Application

    PROCESS FOR PRODUCING PHOTORESIST PATTERN
    • Publication number 20110165521
    • Publication date Jul 7, 2011
    • Sumitomo Chemical Company, Limited
    • Mitsuhiro HATA
    • G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
  • Information Patent Application

    PHOTORESIST COMPOSITION
    • Publication number 20110123926
    • Publication date May 26, 2011
    • Sumitomo Chemical Company, Limited
    • Koji ICHIKAWA
    • G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
  • Information Patent Application

    PROCESS FOR PRODUCING PHOTORESIST PATTERN
    • Publication number 20110091818
    • Publication date Apr 21, 2011
    • Sumitomo Chemical Company, Limited
    • Mitsuhiro HATA
    • G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
  • Information Patent Application

    RESIST PROCESSING METHOD
    • Publication number 20110091820
    • Publication date Apr 21, 2011
    • Mitsuhiro Hata
    • G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
  • Information Patent Application

    PHOTORESIST COMPOSITION
    • Publication number 20110065047
    • Publication date Mar 17, 2011
    • SUMITOMO CHEMICHAL COMPANY, LIMITED
    • Tatsuro MASUYAMA
    • C07 - ORGANIC CHEMISTRY
  • Information Patent Application

    PHOTORESIST COMPOSITION
    • Publication number 20110065040
    • Publication date Mar 17, 2011
    • Sumitomo Chemical Company, Limited
    • Tatsuro Masuyama
    • C07 - ORGANIC CHEMISTRY