Mitsuhiro Hata

Person

Toyonaka, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Compound and photoresist composition containing the same
- Patent number 8,475,999
- Issue date Jul 2, 2013
- Sumitomo Chemical Company, Limited
- Tatsuro Masuyama
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Compound, method for preparing the compound and resist composition...
- Patent number 8,476,473
- Issue date Jul 2, 2013
- Sumitomo Chemical Company, Limited
- Ichiki Takemoto
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Chemically amplified resist composition and chemically amplified re...
- Patent number 8,062,829
- Issue date Nov 22, 2011
- Sumitomo Chemical Company, Limited
- Mitsuhiro Hata
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Polymer and chemically amplified resist composition comprising the...
- Patent number 8,048,612
- Issue date Nov 1, 2011
- Sumitomo Chemical Company, Limited
- Yusuke Fuji
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Polymer and chemically amplified resist composition comprising the...
- Patent number 7,981,985
- Issue date Jul 19, 2011
- Sumitomo Chemical Company, Limited
- Yusuke Fuji
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...

Patents Applicationslast 30 patents

Information Patent Application
COMPOUND AND PHOTORESIST COMPOSITION CONTAINING THE SAME
- Publication number 20110039209
- Publication date Feb 17, 2011
- Sumitomo Chemical Company, Limited
- Tatsuro Masuyama
- C07 - ORGANIC CHEMISTRY
Information Patent Application
PHOTORESIST COMPOSITION CONTAINING THE SAME
- Publication number 20110039208
- Publication date Feb 17, 2011
- Sumitomo Chemical Company, Limited
- Mitsuhiro Hata
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST PROCESSING METHOD
- Publication number 20100279226
- Publication date Nov 4, 2010
- Mitsuhiro Hata
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PROCESS FOR PRODUCING PHOTORESIST PATTERN
- Publication number 20100273112
- Publication date Oct 28, 2010
- Sumitomo Chemical Company, Limited
- Mitsuhiro Hata
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PROCESS FOR PRODUCING PHOTORESIST PATTERN
- Publication number 20100273113
- Publication date Oct 28, 2010
- Sumitomo Chemical Company, Limited
- Mitsuhiro HATA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
COMPOUND, METHOD FOR PREPARING THE COMPOUND AND RESIST COMPOSITION...
- Publication number 20100055609
- Publication date Mar 4, 2010
- Ichiki TAKEMOTO
- C07 - ORGANIC CHEMISTRY
Information Patent Application
POLYMER AND CHEMICALLY AMPLIFIED RESIST COMPOSITION COMPRISING THE...
- Publication number 20090317744
- Publication date Dec 24, 2009
- Sumitomo Chemical Company, Limited
- Yusuke FUJI
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
POLYMER AND CHEMICALLY AMPLIFIED RESIST COMPOSITION COMPRISING THE...
- Publication number 20090264565
- Publication date Oct 22, 2009
- Sumitomo Chemical Company, Limited
- Yusuke FUJI
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
CHEMICALLY AMPLIFIED RESIST COMPOSITION AND CHEMICALLY AMPLIFIED RE...
- Publication number 20090220890
- Publication date Sep 3, 2009
- Mitsuhiro HATA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Mitsuhiro Hata

Person

Patents Grantslast 30 patents

Compound and photoresist composition containing the same

Compound, method for preparing the compound and resist composition...

Chemically amplified resist composition and chemically amplified re...

Polymer and chemically amplified resist composition comprising the...

Polymer and chemically amplified resist composition comprising the...

Patents Applicationslast 30 patents

COMPOUND AND PHOTORESIST COMPOSITION CONTAINING THE SAME

PHOTORESIST COMPOSITION CONTAINING THE SAME

RESIST PROCESSING METHOD

PROCESS FOR PRODUCING PHOTORESIST PATTERN

PROCESS FOR PRODUCING PHOTORESIST PATTERN

COMPOUND, METHOD FOR PREPARING THE COMPOUND AND RESIST COMPOSITION...

POLYMER AND CHEMICALLY AMPLIFIED RESIST COMPOSITION COMPRISING THE...

POLYMER AND CHEMICALLY AMPLIFIED RESIST COMPOSITION COMPRISING THE...

CHEMICALLY AMPLIFIED RESIST COMPOSITION AND CHEMICALLY AMPLIFIED RE...