Mitsuhiro Kureishi

Person

Tokyo, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Mask blank and method of manufacturing an imprint mold
- Patent number 8,273,505
- Issue date Sep 25, 2012
- Hoya Corporation
- Takashi Sato
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Grant
Polarization element
- Patent number 8,130,447
- Issue date Mar 6, 2012
- Hoya Corporation
- Michiyori Miura
- G02 - OPTICS
Information Patent Grant
Reflective mask blank, reflective mask and methods of producing the...
- Patent number 7,981,573
- Issue date Jul 19, 2011
- Hoya Corporation
- Shinichi Ishibashi
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Mask blank, method of manufacturing an exposure mask, and method of...
- Patent number 7,838,180
- Issue date Nov 23, 2010
- Hoya Corporation
- Osamu Nozawa
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Reflection type mask blank and reflection type mask and production...
- Patent number 7,390,596
- Issue date Jun 24, 2008
- Hoya Corporation
- Shinichi Ishibashi
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Photo mask blank and method of manufacturing the same
- Patent number 6,740,208
- Issue date May 25, 2004
- Hoya Corporation
- Mitsuhiro Kureishi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents

Information Patent Application
MOLD MANUFACTURING MASK BLANKS AND METHOD OF MANUFACTURING MOLD
- Publication number 20140113020
- Publication date Apr 24, 2014
- HOYA CORPORATION
- Mitsuhiro Kureishi
- B82 - NANO-TECHNOLOGY
Information Patent Application
Photomask Blank, Photomask, and Pattern Transfer Method Using Photo...
- Publication number 20120034553
- Publication date Feb 9, 2012
- Hoya Corporation
- Mitsuhiro Kureishi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
POLARIZATION ELEMENT
- Publication number 20110002026
- Publication date Jan 6, 2011
- HOYA CORPORATION
- Michiyori Miura
- G02 - OPTICS
Information Patent Application
MASK BLANK AND METHOD OF MANUFACTURING AN IMPRINT MOLD
- Publication number 20100255411
- Publication date Oct 7, 2010
- HOYA CORPORATION
- Takashi Sato
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Application
Reflective Mask Blank, Reflective Mask and Methods of Producing the...
- Publication number 20080248409
- Publication date Oct 9, 2008
- Hoya Corporation
- Shinichi Ishibashi
- B82 - NANO-TECHNOLOGY
Information Patent Application
MASK BLANK, METHOD OF MANUFACTURING AN EXPOSURE MASK, AND METHOD OF...
- Publication number 20080206655
- Publication date Aug 28, 2008
- HOYA CORPORATION
- Osamu Nozawa
- B82 - NANO-TECHNOLOGY
Information Patent Application
Photomask blank, photomask, and pattern transfer method using photo...
- Publication number 20060057469
- Publication date Mar 16, 2006
- Mitsuhiro Kureishi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Reflection type mask blank and reflection type mask and production...
- Publication number 20050208389
- Publication date Sep 22, 2005
- HOYA CORPORATION
- Shinichi Ishibashi
- B82 - NANO-TECHNOLOGY
Information Patent Application
Photo mask blank and method of manufacturing the same
- Publication number 20020068228
- Publication date Jun 6, 2002
- Hoya Corporation
- Mitsuhiro Kureishi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Mitsuhiro Kureishi

Person

Patents Grantslast 30 patents

Mask blank and method of manufacturing an imprint mold

Polarization element

Reflective mask blank, reflective mask and methods of producing the...

Mask blank, method of manufacturing an exposure mask, and method of...

Reflection type mask blank and reflection type mask and production...

Photo mask blank and method of manufacturing the same

Patents Applicationslast 30 patents

MOLD MANUFACTURING MASK BLANKS AND METHOD OF MANUFACTURING MOLD

Photomask Blank, Photomask, and Pattern Transfer Method Using Photo...

POLARIZATION ELEMENT

MASK BLANK AND METHOD OF MANUFACTURING AN IMPRINT MOLD

Reflective Mask Blank, Reflective Mask and Methods of Producing the...

MASK BLANK, METHOD OF MANUFACTURING AN EXPOSURE MASK, AND METHOD OF...

Photomask blank, photomask, and pattern transfer method using photo...

Reflection type mask blank and reflection type mask and production...

Photo mask blank and method of manufacturing the same