Mitsukuni Tsukihara

Person

Syuso-gun, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Ion implanter, ion implantation method, and beam measurement apparatus
- Patent number 9,502,210
- Issue date Nov 22, 2016
- Sumitomo Heavy Industries Ion Technology Co., Ltd.
- Makoto Sano
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Beam irradiation apparatus and beam irradiation method
- Patent number 9,449,791
- Issue date Sep 20, 2016
- Sumitomo Heavy Industries Ion Technology Co., Ltd.
- Mitsukuni Tsukihara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion implantation apparatus and ion implantation method
- Patent number 9,208,996
- Issue date Dec 8, 2015
- Sumitomo Heavy Industries Ion Technology Co., Ltd.
- Mitsukuni Tsukihara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion implantation apparatus and ion implantation method
- Patent number 8,759,801
- Issue date Jun 24, 2014
- Sen Corporation
- Shiro Ninomiya
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Beam processing apparatus
- Patent number 7,982,192
- Issue date Jul 19, 2011
- Sen Corporation
- Mitsukuni Tsukihara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion implantation apparatus and ion implantation method
- Patent number 7,851,772
- Issue date Dec 14, 2010
- Sen Corporation an SHI and Axcelis Company
- Mitsukuni Tsukihara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion implantation apparatus
- Patent number 7,791,049
- Issue date Sep 7, 2010
- Sen Corporation an SHI and Axcelis Company
- Mitsukuni Tsukihara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion implantation apparatus and method of converging/shaping ion bea...
- Patent number 7,755,067
- Issue date Jul 13, 2010
- Sen Corporation
- Mitsukuni Tsukihara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Beam processing system and beam processing method
- Patent number 7,718,980
- Issue date May 18, 2010
- Sen Corporation
- Mitsukuni Tsukihara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electrostatic beam deflection scanner and beam deflection scanning...
- Patent number 7,687,782
- Issue date Mar 30, 2010
- SEN Corporation, an SHI and Axcelis Company
- Mitsukuni Tsukihara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of controlling mover device
- Patent number 7,597,531
- Issue date Oct 6, 2009
- SEN Corporation, an SHI and Axcelis Company
- Keiji Okada
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Irradiation system ion beam and method to enhance accuracy of irrad...
- Patent number 7,429,743
- Issue date Sep 30, 2008
- Sen Corporation
- Mitsuaki Kabasawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Beam processing system and beam processing method
- Patent number 7,411,709
- Issue date Aug 12, 2008
- Sen Corporation
- Takanori Yagita
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method to increase low-energy beam current in irradiation system wi...
- Patent number 7,361,892
- Issue date Apr 22, 2008
- SEN Corporation, an SHI and Axcelis Company
- Mitsuaki Kabasawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Irradiation system with ion beam
- Patent number 7,351,987
- Issue date Apr 1, 2008
- SEN Corporation, an SHI and Axcelis Company
- Mitsuaki Kabasawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Irradiation system with ion beam/charged particle beam
- Patent number 7,315,034
- Issue date Jan 1, 2008
- SEN Corporation, an SHI and Axcelis Company
- Takanori Yagita
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Wafer charge compensation device and ion implantation system having...
- Patent number 7,304,319
- Issue date Dec 4, 2007
- SEN Corporation, an SHI and Axcelis Company
- Hiroshi Kawaguchi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Beam space-charge compensation device and ion implantation system h...
- Patent number 7,276,711
- Issue date Oct 2, 2007
- SEN Corporation, an SHI and Axcelis Company
- Hiroshi Kawaguchi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Mover device and semiconductor manufacturing apparatus and method
- Patent number 7,187,143
- Issue date Mar 6, 2007
- Sumitomo Eaton Nova, Corporation
- Keiji Okada
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Beam deflecting method, beam deflector for scanning, ion implantati...
- Patent number 7,138,641
- Issue date Nov 21, 2006
- Sumitomo Eaton Nova Corporation
- Hiroshi Matsushita
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion implanter and method for controlling the same
- Patent number 6,984,833
- Issue date Jan 10, 2006
- Sumitomo Eaton Nova Corporation
- Makoto Sano
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion beam processing method and apparatus therefor
- Patent number 6,797,968
- Issue date Sep 28, 2004
- Sumitomo Eaton Nova Corporation
- Mitsukuni Tsukihara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion implantation apparatus capable of increasing beam current
- Patent number 6,794,661
- Issue date Sep 21, 2004
- Sumitomo Eaton Nova Corporation
- Mitsukuni Tsukihara
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Ion implantation apparatus suited for low energy ion implantation a...
- Patent number 6,635,889
- Issue date Oct 21, 2003
- Sumitomo Eaton Nova Corporation
- Mitsukuni Tsukihara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion implantation apparatus
- Patent number 6,573,517
- Issue date Jun 3, 2003
- Sumitomo Eaton Nova Corporation
- Michiro Sugitani
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Method and system for optimizing linac operational parameters
- Patent number 6,242,747
- Issue date Jun 5, 2001
- Axcelis Technologies, Inc.
- Michiro Sugitani
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
ION IMPLANTER AND ION IMPLANTATION METHOD
- Publication number 20220285126
- Publication date Sep 8, 2022
- Sumitomo Heavy Industries Ion Technology Co., Ltd.
- Mitsukuni Tsukihara
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
ION IMPLANTER, ION IMPLANTATION METHOD, AND BEAM MEASUREMENT APPARATUS
- Publication number 20160042915
- Publication date Feb 11, 2016
- Sumitomo Heavy Industries Ion Technology Co., Ltd.
- Makoto Sano
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
BEAM IRRADIATION APPARATUS AND BEAM IRRADIATION METHOD
- Publication number 20150364297
- Publication date Dec 17, 2015
- Sumitomo Heavy Industries Ion Technology Co., Ltd.
- Mitsukuni Tsukihara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ION IMPLANTATION APPARATUS AND ION IMPLANTATION METHOD
- Publication number 20140134833
- Publication date May 15, 2014
- SEN Corporation
- Mitsukuni Tsukihara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ION IMPLANTATION APPARATUS AND ION IMPLANTATION METHOD
- Publication number 20130092825
- Publication date Apr 18, 2013
- SEN Corporation
- Shiro NINOMIYA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
BEAM PROCESSING APPARATUS
- Publication number 20080258074
- Publication date Oct 23, 2008
- SEN Corporation, an SHI and Axcelis Company
- Mitsukuni TSUKIHARA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Ion Implantation Apparatus and Method of Converging/Shaping Ion Bea...
- Publication number 20080251734
- Publication date Oct 16, 2008
- SEN Corporation, an SHI and Axcelis Company
- Mitsukuni Tsukihara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ION IMPLANTATION APPARATUS
- Publication number 20080251737
- Publication date Oct 16, 2008
- SEN Corporation, an SHI and Axcelis Company
- Mitsukuni TSUKIHARA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ION IMPLANTATION APPARATUS AND ION IMPLANTATION METHOD
- Publication number 20080251713
- Publication date Oct 16, 2008
- SEN Corporation, an SHI and Axcelis Company
- Mitsukuni Tsukihara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Electrostatic beam deflection scanner and beam deflection scanning...
- Publication number 20080067404
- Publication date Mar 20, 2008
- SEN Corporation, an SHI and AXCELIS Company
- Mitsukuni Tsukihara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Beam processing system and beam processing method
- Publication number 20080067397
- Publication date Mar 20, 2008
- SEN Corporation, an SHI and AXCELIS Company
- Mitsukuni Tsukihara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Beam processing system and beam processing method
- Publication number 20080002244
- Publication date Jan 3, 2008
- SEN CORPORATION
- Takanori Yagita
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method to increase low-energy beam current in irradiation system wi...
- Publication number 20060113465
- Publication date Jun 1, 2006
- SUMITOMO EATON NOVA CORPORATION
- Mitsuaki Kabasawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Beam deflecting method, beam deflector for scanning, ion implantati...
- Publication number 20060113490
- Publication date Jun 1, 2006
- SUMITOMO EATON NOVA CORPORATION
- Hiroshi Matsushita
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Beam space-charge compensation device and ion implantation system h...
- Publication number 20060113491
- Publication date Jun 1, 2006
- SUMITOMO EATON NOVA CORPORATION
- Hiroshi Kawaguchi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Wafer charge compensation device and ion implantation system having...
- Publication number 20060113492
- Publication date Jun 1, 2006
- SUMITOMO EATON NOVA CORPORATION
- Hiroshi Kawaguchi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Irradiation system ion beam and method to enhance accuracy of irrad...
- Publication number 20060113493
- Publication date Jun 1, 2006
- SUMITOMO EATON NOVA CORPORATION
- Mitsuaki Kabasawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Irradiation system with ion beam
- Publication number 20060113466
- Publication date Jun 1, 2006
- Mitsuaki Kabasawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Irradiation system with ion beam/charged particle beam
- Publication number 20060113467
- Publication date Jun 1, 2006
- SUMITOMO EATON NOVA CORPORATION
- Takanori Yagita
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of controlling mover device, cooperative device of mover dev...
- Publication number 20050188924
- Publication date Sep 1, 2005
- Keiji Okada
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Ion implanter and method for controlling the same
- Publication number 20040251432
- Publication date Dec 16, 2004
- SUMITOMO EATON NOVA CORPORATION
- Makoto Sano
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Mover device and semiconductor manufacturing apparatus and method
- Publication number 20040194565
- Publication date Oct 7, 2004
- Sumitomo Eaton Nova, Corporation
- Keiji Okada
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Ion beam processing method and apparatus therefor
- Publication number 20030122090
- Publication date Jul 3, 2003
- SUMITOMO EATON NOVA CORPORATION
- Mitsukuni Tsukihara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Ion implantation apparatus capable of increasing beam current
- Publication number 20020179854
- Publication date Dec 5, 2002
- SUMITOMO EATON NOVA CORPORATION
- Mitsukuni Tsukihara
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Application
Ion implantation apparatus suited for low energy ion implantation a...
- Publication number 20020096650
- Publication date Jul 25, 2002
- SUMITOMO EATON NOVA CORPORATION
- Mitsukuni Tsukihara
- H01 - BASIC ELECTRIC ELEMENTS

Mitsukuni Tsukihara

Person

Patents Grantslast 30 patents

Ion implanter, ion implantation method, and beam measurement apparatus

Beam irradiation apparatus and beam irradiation method

Ion implantation apparatus and ion implantation method

Ion implantation apparatus and ion implantation method

Beam processing apparatus

Ion implantation apparatus and ion implantation method

Ion implantation apparatus

Ion implantation apparatus and method of converging/shaping ion bea...

Beam processing system and beam processing method

Electrostatic beam deflection scanner and beam deflection scanning...

Method of controlling mover device

Irradiation system ion beam and method to enhance accuracy of irrad...

Beam processing system and beam processing method

Method to increase low-energy beam current in irradiation system wi...

Irradiation system with ion beam

Irradiation system with ion beam/charged particle beam

Wafer charge compensation device and ion implantation system having...

Beam space-charge compensation device and ion implantation system h...

Mover device and semiconductor manufacturing apparatus and method

Beam deflecting method, beam deflector for scanning, ion implantati...

Ion implanter and method for controlling the same

Ion beam processing method and apparatus therefor

Ion implantation apparatus capable of increasing beam current

Ion implantation apparatus suited for low energy ion implantation a...

Ion implantation apparatus

Method and system for optimizing linac operational parameters

Patents Applicationslast 30 patents

ION IMPLANTER AND ION IMPLANTATION METHOD

ION IMPLANTER, ION IMPLANTATION METHOD, AND BEAM MEASUREMENT APPARATUS

BEAM IRRADIATION APPARATUS AND BEAM IRRADIATION METHOD

ION IMPLANTATION APPARATUS AND ION IMPLANTATION METHOD

ION IMPLANTATION APPARATUS AND ION IMPLANTATION METHOD

BEAM PROCESSING APPARATUS

Ion Implantation Apparatus and Method of Converging/Shaping Ion Bea...

ION IMPLANTATION APPARATUS

ION IMPLANTATION APPARATUS AND ION IMPLANTATION METHOD

Electrostatic beam deflection scanner and beam deflection scanning...

Beam processing system and beam processing method

Beam processing system and beam processing method

Method to increase low-energy beam current in irradiation system wi...

Beam deflecting method, beam deflector for scanning, ion implantati...

Beam space-charge compensation device and ion implantation system h...

Wafer charge compensation device and ion implantation system having...

Irradiation system ion beam and method to enhance accuracy of irrad...

Irradiation system with ion beam

Irradiation system with ion beam/charged particle beam

Method of controlling mover device, cooperative device of mover dev...

Ion implanter and method for controlling the same

Mover device and semiconductor manufacturing apparatus and method

Ion beam processing method and apparatus therefor

Ion implantation apparatus capable of increasing beam current

Ion implantation apparatus suited for low energy ion implantation a...