Mitsunori OHATA

Person

Kurokawa-gun, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Remote source pulsing with advanced pulse control
- Patent number 12,183,583
- Issue date Dec 31, 2024
- Tokyo Electron Limited
- Peter Lowell George Ventzek
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 12,154,761
- Issue date Nov 26, 2024
- Tokyo Electron Limited
- Naoki Fujiwara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 11,972,925
- Issue date Apr 30, 2024
- Tokyo Electron Limited
- Bong seong Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Fast neutral generation for plasma processing
- Patent number 11,915,910
- Issue date Feb 27, 2024
- Tokyo Electron Limited
- Peter Ventzek
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Three-phase pulsing systems and methods for plasma processing
- Patent number 11,817,295
- Issue date Nov 14, 2023
- Tokyo Electron Limited
- Peter Ventzek
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 11,798,787
- Issue date Oct 24, 2023
- Tokyo Electron Limited
- Naoki Fujiwara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing systems and methods for chemical processing a sub...
- Patent number 11,521,834
- Issue date Dec 6, 2022
- Tokyo Electron Limited
- Peter Ventzek
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus
- Patent number 11,450,515
- Issue date Sep 20, 2022
- Tokyo Electron Limited
- Kazuya Nagaseki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Mode-switching plasma systems and methods of operating thereof
- Patent number 11,251,021
- Issue date Feb 15, 2022
- Tokyo Electron Limited
- Peter Ventzek
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing methods using low frequency bias pulses
- Patent number 11,158,516
- Issue date Oct 26, 2021
- Tokyo Electron Limited
- Alok Ranjan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Mode-switching plasma systems and methods of operating thereof
- Patent number 10,910,196
- Issue date Feb 2, 2021
- Tokyo Electron Limited
- Peter Ventzek
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus
- Patent number 10,825,663
- Issue date Nov 3, 2020
- Tokyo Electron Limited
- Kazuya Nagaseki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of etching object to be processed
- Patent number 10,685,816
- Issue date Jun 16, 2020
- Tokyo Electron Limited
- Yoshihiro Umezawa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Maintenance method of plasma processing apparatus
- Patent number 10,541,142
- Issue date Jan 21, 2020
- Tokyo Electron Limited
- Kazuya Matsumoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for etching multilayer film
- Patent number 10,217,933
- Issue date Feb 26, 2019
- Tokyo Electron Limited
- Eiichi Nishimura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion beam irradiation apparatus and substrate processing apparatus
- Patent number 10,204,766
- Issue date Feb 12, 2019
- Tokyo Electron Limited
- Yoshihiro Umezawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus, plasma processing method and storage m...
- Patent number 10,020,172
- Issue date Jul 10, 2018
- Tokyo Electron Limited
- Mitsunori Ohata
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma processing apparatus
- Patent number 9,589,771
- Issue date Mar 7, 2017
- Tokyo Electron Limited
- Yuki Hosaka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus, plasma processing method and storage m...
- Patent number 9,076,636
- Issue date Jul 7, 2015
- Tokyo Electron Limited
- Mitsunori Ohata
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus
- Patent number 9,011,635
- Issue date Apr 21, 2015
- Tokyo Electron Limited
- Yuki Hosaka
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
Method and System for Plasma Processing
- Publication number 20240347317
- Publication date Oct 17, 2024
- TOKYO ELECTRON LIMITED
- Qiang Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING SYSTEMS WITH MATCHING NETWORK AND METHODS
- Publication number 20240339297
- Publication date Oct 10, 2024
- TOKYO ELECTRON LIMITED
- Qiang Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Antenna Plane Magnets for Improved Performance
- Publication number 20240258074
- Publication date Aug 1, 2024
- TOKYO ELECTRON LIMITED
- Chelsea DuBose
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
LOWER ELECTRODE MECHANISM AND SUBSTRATE PROCESSING METHOD
- Publication number 20240071734
- Publication date Feb 29, 2024
- TOKYO ELECTRON LIMITED
- Naoki MATSUMOTO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20240014006
- Publication date Jan 11, 2024
- TOKYO ELECTRON LIMITED
- Naoki FUJIWARA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA SYSTEMS AND PROCESSES WITH PULSED MAGNETIC FIELD
- Publication number 20230377853
- Publication date Nov 23, 2023
- TOKYO ELECTRON LIMITED
- Ya-Ming Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of Uniformity Control
- Publication number 20230377849
- Publication date Nov 23, 2023
- TOKYO ELECTRON LIMITED
- Shyam Sridhar
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
REMOTE SOURCE PULSING WITH ADVANCED PULSE CONTROL
- Publication number 20230187214
- Publication date Jun 15, 2023
- TOKYO ELECTRON LIMITED
- Peter Lowell George Ventzek
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma Processing Apparatus with Tunable Electrical Characteristic
- Publication number 20220392749
- Publication date Dec 8, 2022
- TOKYO ELECTRON LIMITED
- Peter Lowell George Ventzek
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FAST NEUTRAL GENERATION FOR PLASMA PROCESSING
- Publication number 20220310357
- Publication date Sep 29, 2022
- TOKYO ELECTRON LIMITED
- Peter Ventzek
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20220301834
- Publication date Sep 22, 2022
- TOKYO ELECTRON LIMITED
- Hwajun JUNG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20220102119
- Publication date Mar 31, 2022
- TOKYO ELECTRON LIMITED
- Hwajun JUNG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20220068605
- Publication date Mar 3, 2022
- TOKYO ELECTRON LIMITED
- Naoki FUJIWARA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma Processing Systems and Methods for Chemical Processing a Sub...
- Publication number 20220068601
- Publication date Mar 3, 2022
- Tokyo Electron Limited
- Peter Ventzek
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma Processing Methods Using Low Frequency Bias Pulses
- Publication number 20220028695
- Publication date Jan 27, 2022
- TOKYO ELECTRON LIMITED
- Alok Ranjan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20210384013
- Publication date Dec 9, 2021
- TOKYO ELECTRON LIMITED
- Hwajun Jung
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20210358716
- Publication date Nov 18, 2021
- TOKYO ELECTRON LIMITED
- Bongseong KIM
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20210358717
- Publication date Nov 18, 2021
- TOKYO ELECTRON LIMITED
- Bongseong KIM
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma Processing Methods Using Low Frequency Bias Pulses
- Publication number 20210249225
- Publication date Aug 12, 2021
- TOKYO ELECTRON LIMITED
- Alok Ranjan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20210193439
- Publication date Jun 24, 2021
- TOKYO ELECTRON LIMITED
- Mayo UDA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Mode-Switching Plasma Systems and Methods of Operating Thereof
- Publication number 20210151296
- Publication date May 20, 2021
- TOKYO ELECTRON LIMITED
- Peter Ventzek
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
THREE-PHASE PULSING SYSTEMS AND METHODS FOR PLASMA PROCESSING
- Publication number 20210050183
- Publication date Feb 18, 2021
- TOKYO ELECTRON LIMITED
- Peter Ventzek
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MODE-SWITCHING PLASMA SYSTEMS AND METHODS OF OPERATING THEREOF
- Publication number 20210027991
- Publication date Jan 28, 2021
- TOKYO ELECTRON LIMITED
- Peter Ventzek
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
EQUIPMENT AND METHODS FOR PLASMA PROCESSING
- Publication number 20210020405
- Publication date Jan 21, 2021
- TOKYO ELECTRON LIMITED
- Peter Ventzek
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20210013015
- Publication date Jan 14, 2021
- TOKYO ELECTRON LIMITED
- Kazuya NAGASEKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYSTEMS AND METHODS OF CONTROL FOR PLASMA PROCESSING
- Publication number 20200058469
- Publication date Feb 20, 2020
- TOKYO ELECTRON LIMITED
- Alok Ranjan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20190131158
- Publication date May 2, 2019
- TOKYO ELECTRON LIMITED
- Kazuya MATSUMOTO
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
MAINTENANCE METHOD OF PLASMA PROCESSING APPARATUS
- Publication number 20190131137
- Publication date May 2, 2019
- TOKYO ELECTRON LIMITED
- Kazuya MATSUMOTO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF ETCHING OBJECT TO BE PROCESSED
- Publication number 20180337025
- Publication date Nov 22, 2018
- TOKYO ELECTRON LIMITED
- Yoshihiro UMEZAWA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20180174806
- Publication date Jun 21, 2018
- TOKYO ELECTRON LIMITED
- Kazuya NAGASEKI
- H01 - BASIC ELECTRIC ELEMENTS

Mitsunori OHATA

Person

Patents Grantslast 30 patents

Remote source pulsing with advanced pulse control

Plasma processing apparatus and plasma processing method

Plasma processing apparatus and plasma processing method

Fast neutral generation for plasma processing

Three-phase pulsing systems and methods for plasma processing

Plasma processing apparatus and plasma processing method

Plasma processing systems and methods for chemical processing a sub...

Plasma processing apparatus

Mode-switching plasma systems and methods of operating thereof

Plasma processing methods using low frequency bias pulses

Mode-switching plasma systems and methods of operating thereof

Plasma processing apparatus

Method of etching object to be processed

Maintenance method of plasma processing apparatus

Method for etching multilayer film

Ion beam irradiation apparatus and substrate processing apparatus

Plasma processing apparatus, plasma processing method and storage m...

Plasma processing apparatus

Plasma processing apparatus, plasma processing method and storage m...

Plasma processing apparatus

Patents Applicationslast 30 patents

Method and System for Plasma Processing

PLASMA PROCESSING SYSTEMS WITH MATCHING NETWORK AND METHODS

Antenna Plane Magnets for Improved Performance

LOWER ELECTRODE MECHANISM AND SUBSTRATE PROCESSING METHOD

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

PLASMA SYSTEMS AND PROCESSES WITH PULSED MAGNETIC FIELD

Method of Uniformity Control

REMOTE SOURCE PULSING WITH ADVANCED PULSE CONTROL

Plasma Processing Apparatus with Tunable Electrical Characteristic

FAST NEUTRAL GENERATION FOR PLASMA PROCESSING

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

PLASMA PROCESSING APPARATUS

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

Plasma Processing Systems and Methods for Chemical Processing a Sub...

Plasma Processing Methods Using Low Frequency Bias Pulses

PLASMA PROCESSING APPARATUS

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

PLASMA PROCESSING APPARATUS

Plasma Processing Methods Using Low Frequency Bias Pulses

PLASMA PROCESSING APPARATUS

Mode-Switching Plasma Systems and Methods of Operating Thereof

THREE-PHASE PULSING SYSTEMS AND METHODS FOR PLASMA PROCESSING

MODE-SWITCHING PLASMA SYSTEMS AND METHODS OF OPERATING THEREOF

EQUIPMENT AND METHODS FOR PLASMA PROCESSING

PLASMA PROCESSING APPARATUS

SYSTEMS AND METHODS OF CONTROL FOR PLASMA PROCESSING

PLASMA PROCESSING APPARATUS

MAINTENANCE METHOD OF PLASMA PROCESSING APPARATUS

METHOD OF ETCHING OBJECT TO BE PROCESSED

PLASMA PROCESSING APPARATUS