Mitsuo Hagihara

Person

Kawasaki-shi, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Nonaqueous secondary battery and method for manufacturing same
- Patent number 10,141,547
- Issue date Nov 27, 2018
- Tokyo Ohka Kogyo Co., Ltd.
- Takahiro Asai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Resist pattern forming method and developer for lithography
- Patent number 9,964,851
- Issue date May 8, 2018
- Tokyo Ohka Kogyo Co., Ltd.
- Kazufumi Sato
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Positive resist composition and method for forming resist pattern
- Patent number 7,666,569
- Issue date Feb 23, 2010
- Tokyo Ohka Kogyo Co., Ltd.
- Kazufumi Sato
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Positive resist composition and method of forming resist pattern
- Patent number 7,402,372
- Issue date Jul 22, 2008
- Tokyo Ohka Kogyo Co., Ltd.
- Mitsuo Hagihara
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Novolak resin, production process thereof and positive photoresist...
- Patent number 6,730,769
- Issue date May 4, 2004
- Tokyo Ohka Kogyo Co., Ltd.
- Akira Katano
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Positive photoresist composition
- Patent number 6,680,155
- Issue date Jan 20, 2004
- Tokyo, Ohka Kogyo Co., Ltd.
- Mitsuo Hagihara
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Positive photoresist composition
- Patent number 6,630,279
- Issue date Oct 7, 2003
- Tokyo Ohka Kogyo Co., Ltd.
- Mitsuo Hagihara
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Polyphenol compound, quinonediazide ester and positive photoresist...
- Patent number 6,120,969
- Issue date Sep 19, 2000
- Tokyo Ohka Kogyo Co., Ltd.
- Mitsuo Hagihara
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
RESIST PATTERN FORMING METHOD AND DEVELOPER FOR LITHOGRAPHY
- Publication number 20170059994
- Publication date Mar 2, 2017
- Tokyo Ohka Kogyo Co., Ltd.
- Kazufumi SATO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
NONAQUEOUS SECONDARY BATTERY AND METHOD FOR MANUFACTURING SAME
- Publication number 20160149170
- Publication date May 26, 2016
- Tokyo Ohka Kogyo Co., Ltd.
- Takahiro Asai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Silylphenylene Polymer Composition For The Formation Of Interlayers...
- Publication number 20080107971
- Publication date May 8, 2008
- Tokyo Ohka Kogyo Co., Ltd.
- Yasushi Fujii
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Positive resist composition and method for forming resist pattern
- Publication number 20060251986
- Publication date Nov 9, 2006
- Kazufumi Sato
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Positive resist composition and method of forming resist pattern
- Publication number 20050042540
- Publication date Feb 24, 2005
- Tokyo Ohka Kogyo Co., Ltd.
- Waki Okubo
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Positive resist composition and method of forming resist pattern
- Publication number 20050042541
- Publication date Feb 24, 2005
- Tokyo Ohka Kogyo Co., Ltd.
- Mitsuo Hagihara
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Positive photoresist composition
- Publication number 20030157424
- Publication date Aug 21, 2003
- Tokyo Ohka Kogyo Co., Ltd.
- Mitsuo Hagihara
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Positive photoresist composition
- Publication number 20030152861
- Publication date Aug 14, 2003
- Tokyo Ohka Kogyo Co., Ltd.
- Mitsuo Hagihara
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Novolak resin, production process thereof and positive photoresist...
- Publication number 20030065126
- Publication date Apr 3, 2003
- Tokyo Ohka Kogyo Co., Ltd.
- Akira Katano
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...

Mitsuo Hagihara

Person

Patents Grantslast 30 patents

Nonaqueous secondary battery and method for manufacturing same

Resist pattern forming method and developer for lithography

Positive resist composition and method for forming resist pattern

Positive resist composition and method of forming resist pattern

Novolak resin, production process thereof and positive photoresist...

Positive photoresist composition

Positive photoresist composition

Polyphenol compound, quinonediazide ester and positive photoresist...

Patents Applicationslast 30 patents

RESIST PATTERN FORMING METHOD AND DEVELOPER FOR LITHOGRAPHY

NONAQUEOUS SECONDARY BATTERY AND METHOD FOR MANUFACTURING SAME

Silylphenylene Polymer Composition For The Formation Of Interlayers...

Positive resist composition and method for forming resist pattern

Positive resist composition and method of forming resist pattern

Positive resist composition and method of forming resist pattern

Positive photoresist composition

Positive photoresist composition

Novolak resin, production process thereof and positive photoresist...