Mitsuru Ushijima

Person

Minato-ku, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Substrate processing method
- Patent number 8,574,676
- Issue date Nov 5, 2013
- National University Corporation Nagaoka University of Technology
- Kanji Yasui
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Anodic oxidation apparatus
- Patent number 7,569,124
- Issue date Aug 4, 2009
- Tokyo Electron Limited and Matsushita Electric Works, Ltd.
- Yasushi Yagi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Anodization device and anodization method
- Patent number 7,169,283
- Issue date Jan 30, 2007
- Tokyo Electron Limited
- Yasushi Yagi
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Anodic oxidizer, anodic oxidation method
- Patent number 7,118,663
- Issue date Oct 10, 2006
- Tokyo Electron Limited
- Yasushi Yagi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Resist processing method
- Patent number 5,442,416
- Issue date Aug 15, 1995
- Tokyo Electron Limited
- Kiyohisa Tateyama
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Grant
Method and apparatus for manufacturing a semiconductor device
- Patent number 5,393,624
- Issue date Feb 28, 1995
- Tokyo Electron Limited
- Mitsuru Ushijima
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist processing method
- Patent number 5,339,128
- Issue date Aug 16, 1994
- Tokyo Electron Limited
- Kiyohisa Tateyama
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Grant
Resist process system
- Patent number 5,202,716
- Issue date Apr 13, 1993
- Tokyo Electron Limited
- Kiyohisa Tateyama
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Grant
Apparatus for coating a photo-resist film and/or developing it afte...
- Patent number 5,177,514
- Issue date Jan 5, 1993
- Tokyo Electron Limited
- Mitsuru Ushijima
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Grant
Coating apparatus and method for applying a liquid to a semiconduct...
- Patent number 5,089,305
- Issue date Feb 18, 1992
- Tokyo Electron Limited
- Mitsuru Ushijima
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Coating apparatus and method for applying a liquid to a semiconduct...
- Patent number 5,002,008
- Issue date Mar 26, 1991
- Tokyo Electron Limited
- Mitsuru Ushijima
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Apparatus for coating a photo-resist film and/or developing it afte...
- Patent number 4,985,722
- Issue date Jan 15, 1991
- Tokyo Electron Limited
- Mitsuru Ushijima
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL

Patents Applicationslast 30 patents

Information Patent Application
SUBSTRATE PROCESSING APPARATUS
- Publication number 20110247560
- Publication date Oct 13, 2011
- Tokyo Electron Limited
- Kanji Yasui
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Anodic oxidation apparatus, anodic oxidation method, and panel for...
- Publication number 20050077183
- Publication date Apr 14, 2005
- Yasushi Yagi
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Application
Anodization device and anodization method
- Publication number 20040089552
- Publication date May 13, 2004
- Yasushi Yagi
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Application
Anodic oxidizer, anodic oxidation method
- Publication number 20040084317
- Publication date May 6, 2004
- Yasushi Yagi
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR

Mitsuru Ushijima

Person

Patents Grantslast 30 patents

Substrate processing method

Anodic oxidation apparatus

Anodization device and anodization method

Anodic oxidizer, anodic oxidation method

Resist processing method

Method and apparatus for manufacturing a semiconductor device

Resist processing method

Resist process system

Apparatus for coating a photo-resist film and/or developing it afte...

Coating apparatus and method for applying a liquid to a semiconduct...

Coating apparatus and method for applying a liquid to a semiconduct...

Apparatus for coating a photo-resist film and/or developing it afte...

Patents Applicationslast 30 patents

SUBSTRATE PROCESSING APPARATUS

Anodic oxidation apparatus, anodic oxidation method, and panel for...

Anodization device and anodization method

Anodic oxidizer, anodic oxidation method