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last 30 patents
Information
Patent Grant
Resist pattern improving material, method for forming resist patter...
Patent number
8,980,535
Issue date
Mar 17, 2015
Fujitsu Limited
Miwa Kozawa
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Resist pattern thickening material, method for forming resist patte...
Patent number
8,945,822
Issue date
Feb 3, 2015
Fujitsu Limited
Koji Nozaki
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Grant
Method for forming resist pattern, semiconductor device and product...
Patent number
8,945,816
Issue date
Feb 3, 2015
Fujitsu Limited
Miwa Kozawa
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Pattern forming method, method for manufacturing semiconductor devi...
Patent number
8,906,598
Issue date
Dec 9, 2014
Fujitsu Limited
Miwa Kozawa
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Resist pattern improving material, method for forming resist patter...
Patent number
8,795,949
Issue date
Aug 5, 2014
Fujitsu Limited
Miwa Kozawa
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Resist pattern improving material, method for forming resist patter...
Patent number
8,748,077
Issue date
Jun 10, 2014
Fujitsu Limited
Koji Nozaki
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Resist composition, method for forming resist pattern, and method f...
Patent number
8,652,751
Issue date
Feb 18, 2014
Fujitsu Limited
Miwa Kozawa
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Resist pattern thickening material, semiconductor device, and produ...
Patent number
8,476,346
Issue date
Jul 2, 2013
Fujitsu Limited
Miwa Kozawa
C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information
Patent Grant
Resist pattern thickening material, method for forming resist patte...
Patent number
8,420,288
Issue date
Apr 16, 2013
Fujitsu Limited
Koji Nozaki
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Grant
Manufacturing process of semiconductor device
Patent number
8,349,542
Issue date
Jan 8, 2013
Fujitsu Limited
Miwa Kozawa
G11 - INFORMATION STORAGE
Information
Patent Grant
Process for forming resist pattern, semiconductor device and fabric...
Patent number
8,338,080
Issue date
Dec 25, 2012
Fujitsu Limited
Miwa Kozawa
G11 - INFORMATION STORAGE
Information
Patent Grant
Resist pattern swelling material, and method for patterning using same
Patent number
8,334,091
Issue date
Dec 18, 2012
Fujitsu Limited
Koji Nozaki
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Resist pattern thickening material and process for forming resist p...
Patent number
8,198,009
Issue date
Jun 12, 2012
Fujitsu Limited
Miwa Kozawa
Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information
Patent Grant
Resist cover film forming material, resist pattern forming method,...
Patent number
8,198,014
Issue date
Jun 12, 2012
Fujitsu Limited
Miwa Kozawa
C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information
Patent Grant
Resist pattern thickening material and process for forming resist p...
Patent number
8,129,092
Issue date
Mar 6, 2012
Fujitsu Limited
Miwa Kozawa
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Method for forming resist pattern, semiconductor device and product...
Patent number
8,119,325
Issue date
Feb 21, 2012
Fujitsu Limited
Miwa Kozawa
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Resist pattern thickening material and process for forming resist p...
Patent number
7,820,367
Issue date
Oct 26, 2010
Fujitsu Limited
Miwa Kozawa
Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information
Patent Grant
Resist pattern thickening material and process for forming resist p...
Patent number
7,799,508
Issue date
Sep 21, 2010
Fujitsu Limited
Koji Nozaki
G11 - INFORMATION STORAGE
Information
Patent Grant
Resist pattern thickening material, resist pattern and forming proc...
Patent number
7,744,768
Issue date
Jun 29, 2010
Fujitsu Limited
Miwa Kozawa
G11 - INFORMATION STORAGE
Information
Patent Grant
Resist pattern thickening material, process for forming resist patt...
Patent number
7,662,539
Issue date
Feb 16, 2010
Fujitsu Limited
Koji Nozaki
G11 - INFORMATION STORAGE
Information
Patent Grant
Resist pattern thickening material, resist pattern and process for...
Patent number
7,625,688
Issue date
Dec 1, 2009
Fujitsu Limited
Koji Nozaki
G11 - INFORMATION STORAGE
Information
Patent Grant
Resist composition, method for forming resist pattern, and semicond...
Patent number
7,611,819
Issue date
Nov 3, 2009
Fujitsu Limited
Koji Nozaki
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Resist cover film-forming material, process for forming resist patt...
Patent number
7,608,386
Issue date
Oct 27, 2009
Fujitsu Limited
Koji Nozaki
Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information
Patent Grant
Resist pattern thickening material, resist pattern and process for...
Patent number
7,592,127
Issue date
Sep 22, 2009
Fujitsu Limited
Koji Nozaki
G11 - INFORMATION STORAGE
Information
Patent Grant
Resist pattern thickening material and process for forming resist p...
Patent number
7,585,610
Issue date
Sep 8, 2009
Fujitsu Limited
Koji Nozaki
G11 - INFORMATION STORAGE
Information
Patent Grant
Resist pattern thickening material and process for forming resist p...
Patent number
7,550,248
Issue date
Jun 23, 2009
Fujitsu Limited
Takahisa Namiki
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Negative resist composition, a method for forming a resist pattern...
Patent number
7,488,569
Issue date
Feb 10, 2009
Fujitsu Limited
Miwa Kozawa
B82 - NANO-TECHNOLOGY
Information
Patent Grant
Resist composition, method of forming resist pattern, semiconductor...
Patent number
7,452,657
Issue date
Nov 18, 2008
Fujitsu Limited
Takahisa Namiki
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Alkali-soluble siloxane polymer, positive type resist composition,...
Patent number
7,439,010
Issue date
Oct 21, 2008
Fujitsu Limited
Keiji Watanabe
C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information
Patent Grant
Resist pattern-improving material and a method for preparing a resi...
Patent number
7,416,837
Issue date
Aug 26, 2008
Fujitsu Limited
Koji Nozaki
Y02 - TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMA...
Patents Applications
last 30 patents
Information
Patent Application
ELECTRONIC DEVICE AND METHOD FOR MANUFACTURING THE SAME
Publication number
20160381795
Publication date
Dec 29, 2016
Fujitsu Limited
Junya Ikeda
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
RINSING AGENT FOR LITHOGRAPHY, METHOD FOR FORMING A RESIST PATTERN,...
Publication number
20140057437
Publication date
Feb 27, 2014
Miwa KOZAWA
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
RESIST PATTERN THICKENING MATERIAL, METHOD FOR FORMING RESIST PATTE...
Publication number
20130200500
Publication date
Aug 8, 2013
Fujitsu Limited
Koji Nozaki
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
RESIST PATTERN IMPROVING MATERIAL, METHOD FOR FORMING RESIST PATTER...
Publication number
20120228747
Publication date
Sep 13, 2012
Fujitsu Limited
Koji Nozaki
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
RESIST PATTERN IMPROVING MATERIAL, METHOD FOR FORMING RESIST PATTER...
Publication number
20120156879
Publication date
Jun 21, 2012
FUJITSU LIMITED
Miwa Kozawa
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
RESIST PATTERN THICKENING MATERIAL AND PROCESS FOR FORMING RESIST P...
Publication number
20120126372
Publication date
May 24, 2012
Fujitsu Limited
Miwa Kozawa
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
RESIST PATTERN IMPROVING MATERIAL, METHOD FOR FORMING RESIST PATTER...
Publication number
20120100488
Publication date
Apr 26, 2012
FUJITSU LIMITED
Miwa Kozawa
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
METHOD FOR FORMING RESIST PATTERN, SEMICONDUCTOR DEVICE AND PRODUCT...
Publication number
20120098103
Publication date
Apr 26, 2012
Fujitsu Limited
Miwa Kozawa
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
PATTERN FORMING METHOD, METHOD FOR MANUFACTURING SEMICONDUCTOR DEVI...
Publication number
20110250541
Publication date
Oct 13, 2011
Fujitsu Limited
Miwa Kozawa
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
RESIST PATTERN THICKENING MATERIAL, SEMICONDUCTOR DEVICE, AND PRODU...
Publication number
20110101508
Publication date
May 5, 2011
Fujitsu Limited
Miwa KOZAWA
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Application
RESIST PATTERN THICKENING MATERIAL AND PROCESS FOR FORMING RESIST P...
Publication number
20100305248
Publication date
Dec 2, 2010
Fujitsu Limited
Miwa Kozawa
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
MANUFACTURING PROCESS OF SEMICONDUCTOR DEVICE
Publication number
20100227278
Publication date
Sep 9, 2010
Fujitsu Limited
Miwa Kozawa
G11 - INFORMATION STORAGE
Information
Patent Application
RESIST COMPOSITION, METHOD FOR FORMING RESIST PATTERN, AND METHOD F...
Publication number
20100047711
Publication date
Feb 25, 2010
Fujitsu Limited
Miwa Kozawa
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
Resist pattern thickening material and process for forming resist p...
Publication number
20090226844
Publication date
Sep 10, 2009
Fujitsu Limited
Koji Nozaki
G11 - INFORMATION STORAGE
Information
Patent Application
RESIST COMPOSITION FOR IMMERSION EXPOSURE AND METHOD FOR MANUFACTUR...
Publication number
20090061359
Publication date
Mar 5, 2009
Fujitsu Limited
Koji Nozaki
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
Resist pattern swelling material, and method for patterning using same
Publication number
20080274431
Publication date
Nov 6, 2008
Fujitsu Limited
Koji Nozaki
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
RESIST COVER FILM FORMING MATERIAL, RESIST PATTERN FORMING METHOD,...
Publication number
20080220223
Publication date
Sep 11, 2008
FUJITSU LIMTIED
Miwa KOZAWA
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Application
RESIST PATTERN THICKENING MATERIAL, METHOD FOR FORMING RESIST PATTE...
Publication number
20080073322
Publication date
Mar 27, 2008
Fujitsu Limited
Koji NOZAKI
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Application
Method for forming resist pattern, semiconductor device and product...
Publication number
20080044769
Publication date
Feb 21, 2008
FUJITSU LIMITED
Miwa Kozawa
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
Process for forming resist pattern, semiconductor device and manufa...
Publication number
20080044770
Publication date
Feb 21, 2008
FUJITSU LIMITED
Koji Nozaki
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
Resist composition, method for forming resist pattern, and semicond...
Publication number
20070224537
Publication date
Sep 27, 2007
FUJITSU LIMITED
Koji Nozaki
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
Resist cover film-forming material, process for forming resist patt...
Publication number
20070190453
Publication date
Aug 16, 2007
FUJITSU LIMITED
Koji Nozaki
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
Resist pattern thickening material and process for forming resist p...
Publication number
20070123623
Publication date
May 31, 2007
FUJITSU LIMITED
Miwa Kozawa
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
Resist pattern thickening material, resist pattern and forming proc...
Publication number
20070106021
Publication date
May 10, 2007
FUJITSU LIMITED
Miwa Kozawa
G11 - INFORMATION STORAGE
Information
Patent Application
Resist composition, method for forming resist pattern, semiconducto...
Publication number
20070048660
Publication date
Mar 1, 2007
FUJITSU LIMITED
Koji Nozaki
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
Resist pattern thickening material and process for forming resist p...
Publication number
20070048659
Publication date
Mar 1, 2007
FUJITSU LIMITED
Takahisa Namiki
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
Resist composition, method of forming resist pattern, semiconductor...
Publication number
20070003862
Publication date
Jan 4, 2007
FUJITSU LIMITED
Takahisa Namiki
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
Negative resist composition, a method for forming a resist pattern...
Publication number
20060263723
Publication date
Nov 23, 2006
FUJITSU LIMITED
Miwa Kozawa
B82 - NANO-TECHNOLOGY
Information
Patent Application
Resist pattern thickening material and process for forming resist p...
Publication number
20060188805
Publication date
Aug 24, 2006
FUJITSU LIMITED
Koji Nozaki
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
Resist pattern thickening material and process for forming resist p...
Publication number
20060188807
Publication date
Aug 24, 2006
FUJITSU LIMITED
Koji Nozaki
G11 - INFORMATION STORAGE