Miwa Miyairi

Person

Kawasaki-shi, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Positive type resist composition and resist pattern formation metho...
- Patent number 7,501,221
- Issue date Mar 10, 2009
- Tokyo Ohka Kogyo Co., Ltd.
- Takeshi Iwai
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Positive type resist composition and resist pattern formation metho...
- Patent number 7,435,530
- Issue date Oct 14, 2008
- Tokyo Ohka Kogyo Co., Ltd.
- Takeshi Iwai
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Positive type resist composition and resist pattern formation metho...
- Patent number 7,390,612
- Issue date Jun 24, 2008
- Tokyo Ohka Kogyo Co., Ltd.
- Takeshi Iwai
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Positive type resist composition and resist pattern formation metho...
- Patent number 7,326,515
- Issue date Feb 5, 2008
- Tokyo Ohka Kogyo Co., Ltd.
- Takeshi Iwai
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Positive type resist composition and resist pattern formation metho...
- Patent number 7,323,287
- Issue date Jan 29, 2008
- Tokyo Ohka Kogyo Co., Ltd.
- Takeshi Iwai
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Method of forming resist pattern, positive resist composition, and...
- Patent number 7,316,885
- Issue date Jan 8, 2008
- Tokyo Ohka Kogyo Co., Ltd.
- Hideo Hada
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Positive type resist composition and resist pattern formation metho...
- Patent number 7,316,888
- Issue date Jan 8, 2008
- Tokyo Ohka Kogyo Co., Ltd.
- Takeshi Iwai
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Positive type resist composition and resist pattern formation metho...
- Patent number 7,316,889
- Issue date Jan 8, 2008
- Tokyo Ohka Kogyo Co., Ltd.
- Takeshi Iwai
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Process for refining crude resin for resist
- Patent number 7,276,575
- Issue date Oct 2, 2007
- Tokyo Ohka Kogyo Co., Ltd.
- Hideo Hada
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Positive resist composition and method of forming resist pattern fr...
- Patent number 7,074,543
- Issue date Jul 11, 2006
- Tokyo Ohka Kogyo Co., Ltd.
- Takeshi Iwai
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Multilayered body for photolithographic patterning
- Patent number 7,033,731
- Issue date Apr 25, 2006
- Tokyo Ohka Kogyo Co., Ltd.
- Toshikazu Tachikawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Negative resist composition
- Patent number 6,936,400
- Issue date Aug 30, 2005
- Tokyo Ohka Kogyo Co., Ltd.
- Ryoichi Takasu
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Negative-working photoresist composition
- Patent number 6,864,036
- Issue date Mar 8, 2005
- Tokyo Ohka Kogyo Co., Ltd.
- Toshikazu Tachikawa
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Negative working resist composition
- Patent number 6,544,712
- Issue date Apr 8, 2003
- Tokyo Ohka Kogyo Co., Ltd.
- Toshikazu Tachikawa
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Multilayered body for photolithographic patterning
- Patent number 6,455,228
- Issue date Sep 24, 2002
- Tokyo Ohka Kogyo Co., Ltd.
- Toshikazu Tachikawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Negative-working photoresist composition
- Patent number 6,406,829
- Issue date Jun 18, 2002
- Tokyo Ohka Kogyo Co., Ltd.
- Toshikazu Tachikawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Negative-working chemical-amplification photoresist composition
- Patent number 6,171,749
- Issue date Jan 9, 2001
- Tokyo Ohka Kogyo Co., Ltd.
- Toshikazu Tachikawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
POSITIVE TYPE RESIST COMPOSITION AND RESIST PATTERN FORMATION METHO...
- Publication number 20070190455
- Publication date Aug 16, 2007
- Tokyo Ohka Kogyo Co., Ltd.
- Takeshi Iwai
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Positive resist composition and method for forming resist pattern u...
- Publication number 20060194141
- Publication date Aug 31, 2006
- Tokyo Ohka Kogyo Co., Ltd.
- Hideo Hada
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Method of forming resist pattern, positive resist composition, and...
- Publication number 20060154181
- Publication date Jul 13, 2006
- Hideo Hada
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Polymer and positive type resist composition
- Publication number 20060147832
- Publication date Jul 6, 2006
- Hideo Hada
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Resist composition and method of forming resist pattern using same
- Publication number 20060141382
- Publication date Jun 29, 2006
- Masaru Takeshita
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Positive type resist composition and resist pattern formation metho...
- Publication number 20060134553
- Publication date Jun 22, 2006
- Tokyo Ohka Kogyo Co., Ltd.
- Takeshi Iwai
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Process for refining crude resin for resist
- Publication number 20060135745
- Publication date Jun 22, 2006
- Hideo Hada
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Positive type resist composition and resist pattern formation metho...
- Publication number 20060134552
- Publication date Jun 22, 2006
- Tokyo Ohka Kogyo Co., Ltd.
- Takeshi Iwai
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Positive type resist composition and resist pattern formation metho...
- Publication number 20060127807
- Publication date Jun 15, 2006
- Tokyo Ohka Kogyo Co., Ltd.
- Takeshi Iwai
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Positive type resist composition and resist pattern formation metho...
- Publication number 20060127806
- Publication date Jun 15, 2006
- Tokyo Ohka Kogyo Co., Ltd.
- Takeshi Iwai
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Positive type resist composition and resist pattern formation metho...
- Publication number 20050095535
- Publication date May 5, 2005
- Takeshi Iwai
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Multilayered body for photolithographic patterning
- Publication number 20050008972
- Publication date Jan 13, 2005
- Toshikazu Tachikawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Positive resist composition and method of forming resist pattern fr...
- Publication number 20040110085
- Publication date Jun 10, 2004
- Takeshi Iwai
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Negative resist composition
- Publication number 20040009427
- Publication date Jan 15, 2004
- Tokyo Ohka Kogyo Co., Ltd.
- Ryoichi Takasu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Multilayered body for photolithographic patterning
- Publication number 20020146645
- Publication date Oct 10, 2002
- Toshikazu Tachikawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Negative-working photoresist composition
- Publication number 20020061467
- Publication date May 23, 2002
- Toshikazu Tachikawa
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC

Miwa Miyairi

Person

Patents Grantslast 30 patents

Positive type resist composition and resist pattern formation metho...

Positive type resist composition and resist pattern formation metho...

Positive type resist composition and resist pattern formation metho...

Positive type resist composition and resist pattern formation metho...

Positive type resist composition and resist pattern formation metho...

Method of forming resist pattern, positive resist composition, and...

Positive type resist composition and resist pattern formation metho...

Positive type resist composition and resist pattern formation metho...

Process for refining crude resin for resist

Positive resist composition and method of forming resist pattern fr...

Multilayered body for photolithographic patterning

Negative resist composition

Negative-working photoresist composition

Negative working resist composition

Multilayered body for photolithographic patterning

Negative-working photoresist composition

Negative-working chemical-amplification photoresist composition

Patents Applicationslast 30 patents

POSITIVE TYPE RESIST COMPOSITION AND RESIST PATTERN FORMATION METHO...

Positive resist composition and method for forming resist pattern u...

Method of forming resist pattern, positive resist composition, and...

Polymer and positive type resist composition

Resist composition and method of forming resist pattern using same

Positive type resist composition and resist pattern formation metho...

Process for refining crude resin for resist

Positive type resist composition and resist pattern formation metho...

Positive type resist composition and resist pattern formation metho...

Positive type resist composition and resist pattern formation metho...

Positive type resist composition and resist pattern formation metho...

Multilayered body for photolithographic patterning

Positive resist composition and method of forming resist pattern fr...

Negative resist composition

Multilayered body for photolithographic patterning

Negative-working photoresist composition