Miyako Matsui

Person

Tokyo, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 11,875,978
- Issue date Jan 16, 2024
- HITACHI HIGH-TECH CORPORATION
- Tsubasa Okamoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing method and plasma processing apparatus
- Patent number 11,462,416
- Issue date Oct 4, 2022
- HITACHI HIGH-TECH CORPORATION
- Miyako Matsui
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing method and plasma processing apparatus
- Patent number 10,971,369
- Issue date Apr 6, 2021
- HITACHI HIGH-TECH CORPORATION
- Miyako Matsui
- G01 - MEASURING TESTING
Information Patent Grant
Etching method and plasma processing apparatus
- Patent number 10,665,516
- Issue date May 26, 2020
- Hitachi High-Technologies Corporation
- Miyako Matsui
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Etching method and plasma processing apparatus
- Patent number 10,622,269
- Issue date Apr 14, 2020
- Hitachi High-Technologies Corporation
- Miyako Matsui
- G01 - MEASURING TESTING
Information Patent Grant
Image processing device, charged particle beam device, charged part...
- Patent number 9,702,695
- Issue date Jul 11, 2017
- Hitachi High-Technologies Corporation
- Hiroki Kawada
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Method and apparatus for inspecting semiconductor device
- Patent number 7,368,713
- Issue date May 6, 2008
- Hitachi High-Technologies Corporation
- Miyako Matsui
- G01 - MEASURING TESTING
Information Patent Grant
Inspection system and inspection process for wafer with circuit usi...
- Patent number 6,753,524
- Issue date Jun 22, 2004
- Hitachi, Ltd.
- Miyako Matsui
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Wafer inspection system and wafer inspection process using charged...
- Patent number 6,700,122
- Issue date Mar 2, 2004
- Hitachi, Ltd.
- Miyako Matsui
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for fabricating semiconductor devices
- Patent number 5,981,399
- Issue date Nov 9, 1999
- Hitachi, Ltd.
- Yoshio Kawamura
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
PLASMA PROCESSING METHOD
- Publication number 20240321583
- Publication date Sep 26, 2024
- Hitachi High-Tech Corporation
- Miyako MATSUI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING DEVICE AND PLASMA PROCESSING METHOD
- Publication number 20240047239
- Publication date Feb 8, 2024
- Hitachi High-Tech Corporation
- Miyako Matsui
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20230096723
- Publication date Mar 30, 2023
- Hitachi High-Tech Corporation
- Tsubasa Okamoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS
- Publication number 20200335354
- Publication date Oct 22, 2020
- Hitachi High-Tech Corporation
- Miyako Matsui
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS
- Publication number 20190237337
- Publication date Aug 1, 2019
- Hitachi High-Technologies Corporation
- Miyako MATSUI
- G01 - MEASURING TESTING
Information Patent Application
ETCHING METHOD AND PLASMA PROCESSING APPARATUS
- Publication number 20180269118
- Publication date Sep 20, 2018
- Hitachi High-Technologies Corporation
- Miyako MATSUI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING METHOD
- Publication number 20160079073
- Publication date Mar 17, 2016
- Hitachi High-Technologies Corporation
- Miyako MATSUI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CALCULATION SYSTEM AND CALCULATION METHOD
- Publication number 20150293040
- Publication date Oct 15, 2015
- Hitachi, Ltd
- Koji Aramaki
- G01 - MEASURING TESTING
Information Patent Application
Image Processing Device, Charged Particle Beam Device, Charged Part...
- Publication number 20130146763
- Publication date Jun 13, 2013
- Hitachi High-Technologies Corporation
- Hiroki Kawada
- G01 - MEASURING TESTING
Information Patent Application
Method and apparatus for inspecting semiconductor device
- Publication number 20060043292
- Publication date Mar 2, 2006
- Miyako Matsui
- G01 - MEASURING TESTING
Information Patent Application
Inspection system and inspection process for wafer with circuit usi...
- Publication number 20030094572
- Publication date May 22, 2003
- Hitachi, Ltd.
- Miyako Matsui
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Wafer inspection system and wafer inspection process using charged...
- Publication number 20020134936
- Publication date Sep 26, 2002
- Miyako Matsui
- H01 - BASIC ELECTRIC ELEMENTS

Miyako Matsui

Person

Patents Grantslast 30 patents

Plasma processing apparatus and plasma processing method

Plasma processing method and plasma processing apparatus

Plasma processing method and plasma processing apparatus

Etching method and plasma processing apparatus

Etching method and plasma processing apparatus

Image processing device, charged particle beam device, charged part...

Method and apparatus for inspecting semiconductor device

Inspection system and inspection process for wafer with circuit usi...

Wafer inspection system and wafer inspection process using charged...

Method and apparatus for fabricating semiconductor devices

Patents Applicationslast 30 patents

PLASMA PROCESSING METHOD

PLASMA PROCESSING DEVICE AND PLASMA PROCESSING METHOD

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS

PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS

ETCHING METHOD AND PLASMA PROCESSING APPARATUS

PLASMA PROCESSING METHOD

CALCULATION SYSTEM AND CALCULATION METHOD

Image Processing Device, Charged Particle Beam Device, Charged Part...

Method and apparatus for inspecting semiconductor device

Inspection system and inspection process for wafer with circuit usi...

Wafer inspection system and wafer inspection process using charged...