Mohamad A. AYOUB

Person

Los Gatos, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
PECVD process
- Patent number 11,898,249
- Issue date Feb 13, 2024
- Applied Materials, Inc.
- Nagarajan Rajagopalan
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
PECVD process
- Patent number 11,613,812
- Issue date Mar 28, 2023
- Applied Materials, Inc.
- Nagarajan Rajagopalan
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Shadow ring for modifying wafer edge and bevel deposition
- Patent number 11,136,665
- Issue date Oct 5, 2021
- Applied Materials, Inc.
- Dale Du Bois
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Conditioning remote plasma source for enhanced performance having r...
- Patent number 10,916,407
- Issue date Feb 9, 2021
- Applied Materials, Inc.
- Abdul Aziz Khaja
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Bottom and side plasma tuning having closed loop control
- Patent number 10,910,227
- Issue date Feb 2, 2021
- Applied Materials, Inc.
- Juan Carlos Rocha-Alvarez
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
PECVD process
- Patent number 10,793,954
- Issue date Oct 6, 2020
- Applied Materials, Inc.
- Nagarajan Rajagopalan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Tunable ground planes in plasma chambers
- Patent number 10,774,423
- Issue date Sep 15, 2020
- Applied Materials, Inc.
- Karthik Janakiraman
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
High impedance RF filter for heater with impedance tuning device
- Patent number 10,450,653
- Issue date Oct 22, 2019
- Applied Materials, Inc.
- Jian J. Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus and method for tuning a plasma profile using a tuning ele...
- Patent number 10,347,465
- Issue date Jul 9, 2019
- Applied Materials, Inc.
- Mohamad A. Ayoub
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Shadow ring for modifying wafer edge and bevel deposition
- Patent number 10,227,695
- Issue date Mar 12, 2019
- Applied Materials, Inc.
- Dale R. Du Bois
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Conditioning remote plasma source for enhanced performance having r...
- Patent number 10,192,717
- Issue date Jan 29, 2019
- Applied Materials, Inc.
- Abdul Aziz Khaja
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
High impedance RF filter for heater with impedance tuning device
- Patent number 10,125,422
- Issue date Nov 13, 2018
- Applied Materials, Inc.
- Jian J. Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Bottom and side plasma tuning having closed loop control
- Patent number 10,128,118
- Issue date Nov 13, 2018
- Applied Materials, Inc.
- Juan Carlos Rocha-Alvarez
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Auto frequency tuned remote plasma source
- Patent number 10,083,818
- Issue date Sep 25, 2018
- Applied Materials, Inc.
- Abdul Aziz Khaja
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
PECVD process
- Patent number 10,060,032
- Issue date Aug 28, 2018
- Applied Materials, Inc.
- Nagarajan Rajagopalan
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Apparatus and method for tuning electrode impedance for high freque...
- Patent number 10,032,608
- Issue date Jul 24, 2018
- Applied Materials, Inc.
- Jian J. Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
PECVD apparatus and process
- Patent number 10,030,306
- Issue date Jul 24, 2018
- Applied Materials, Inc.
- Nagarajan Rajagopalan
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Apparatus and method for tuning a plasma profile using a tuning ele...
- Patent number 9,865,431
- Issue date Jan 9, 2018
- Applied Materials, Inc.
- Mohamad A. Ayoub
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
PECVD process
- Patent number 9,816,187
- Issue date Nov 14, 2017
- Applied Materials, Inc.
- Nagarajan Rajagopalan
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Remote plasma source for controlling plasma skew
- Patent number 9,466,469
- Issue date Oct 11, 2016
- APPLIED MATERIALS, INC.
- Abdul Aziz Khaja
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
PECVD process
- Patent number 9,458,537
- Issue date Oct 4, 2016
- Applied Materials, Inc.
- Nagarajan Rajagopalan
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Detecting plasma arcs by monitoring RF reflected power in a plasma...
- Patent number 9,386,680
- Issue date Jul 5, 2016
- Applied Materials, Inc.
- Jian J. Chen
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Apparatus and method for substrate clamping in a plasma chamber
- Patent number 9,337,072
- Issue date May 10, 2016
- Applied Materials, Inc.
- Ganesh Balasubramanian
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
PECVD process
- Patent number 9,157,730
- Issue date Oct 13, 2015
- Applied Materials, Inc.
- Nagarajan Rajagopalan
- G01 - MEASURING TESTING
Information Patent Grant
Apparatus and methods for improving reliability of RF grounding
- Patent number 8,884,524
- Issue date Nov 11, 2014
- Applied Materials, Inc.
- Jianhua Zhou
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Confined process volume PECVD chamber
- Patent number 8,778,813
- Issue date Jul 15, 2014
- Applied Materials, Inc.
- Ramprakash Sankarakrishnan
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
System and method for current-based plasma excursion detection
- Patent number 8,587,321
- Issue date Nov 19, 2013
- Applied Materials, Inc.
- Jian J. Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
System and method for voltage-based plasma excursion detection
- Patent number 8,502,689
- Issue date Aug 6, 2013
- Applied Materials, Inc.
- Jian J. Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Systems for plasma enhanced chemical vapor deposition and bevel edg...
- Patent number 8,197,636
- Issue date Jun 12, 2012
- Applied Materials, Inc.
- Ashish Shah
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
PECVD PROCESS
- Publication number 20230193466
- Publication date Jun 22, 2023
- Applied Materials, Inc.
- Nagarajan RAJAGOPALAN
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PECVD PROCESS
- Publication number 20200399756
- Publication date Dec 24, 2020
- Applied Materials, Inc.
- Nagarajan RAJAGOPALAN
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
HIGH IMPEDANCE RF FILTER FOR HEATER WITH IMPEDANCE TUNING DEVICE
- Publication number 20200010957
- Publication date Jan 9, 2020
- Applied Materials, Inc.
- Jian J. CHEN
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
HIGH IMPEDANCE RF FILTER FOR HEATER WITH IMPEDANCE TUNING DEVICE
- Publication number 20190177848
- Publication date Jun 13, 2019
- Applied Materials, Inc.
- Jian J. CHEN
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SHADOW RING FOR MODIFYING WAFER EDGE AND BEVEL DEPOSITION
- Publication number 20190153592
- Publication date May 23, 2019
- Applied Materials, Inc.
- Dale Du BOIS
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
BOTTOM AND SIDE PLASMA TUNING HAVING CLOSED LOOP CONTROL
- Publication number 20190080916
- Publication date Mar 14, 2019
- Applied Materials, Inc.
- Juan Carlos ROCHA-ALVAREZ
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CONDITIONING REMOTE PLASMA SOURCE FOR ENHANCED PERFORMANCE HAVING R...
- Publication number 20190074163
- Publication date Mar 7, 2019
- Applied Materials, Inc.
- Abdul Aziz KHAJA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PECVD PROCESS
- Publication number 20180258535
- Publication date Sep 13, 2018
- Applied Materials, Inc.
- Nagarajan RAJAGOPALAN
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
APPARATUS AND METHOD FOR TUNING A PLASMA PROFILE USING A TUNING ELE...
- Publication number 20180130637
- Publication date May 10, 2018
- Applied Materials, Inc.
- MOHAMAD A. AYOUB
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
TUNABLE GROUND PLANES IN PLASMA CHAMBERS
- Publication number 20180073142
- Publication date Mar 15, 2018
- Applied Materials, Inc.
- Karthik Janakiraman
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PECVD PROCESS
- Publication number 20180066364
- Publication date Mar 8, 2018
- Applied Materials, Inc.
- Nagarajan RAJAGOPALAN
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PECVD PROCESS
- Publication number 20170016118
- Publication date Jan 19, 2017
- Applied Materials, Inc.
- Nagarajan RAJAGOPALAN
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
REMOTE PLASMA SOURCE FOR CONTROLLING PLASMA SKEW
- Publication number 20160268103
- Publication date Sep 15, 2016
- Applied Materials, Inc.
- Abdul Aziz KHAJA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TUNABLE GROUND PLANES IN PLASMA CHAMBERS
- Publication number 20160145742
- Publication date May 26, 2016
- Applied Materials, Inc.
- Karthik Janakiraman
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
DETECTING PLASMA ARCS BY MONITORING RF REFLECTED POWER IN A PLASMA...
- Publication number 20160095196
- Publication date Mar 31, 2016
- Applied Materials, Inc.
- Jian J. CHEN
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
AUTO FREQUENCY TUNED REMOTE PLASMA SOURCE
- Publication number 20160086772
- Publication date Mar 24, 2016
- Applied Materials, Inc.
- Abdul Aziz KHAJA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PECVD PROCESS
- Publication number 20160017497
- Publication date Jan 21, 2016
- Applied Materials, Inc.
- NAGARAJAN RAJAGOPALAN
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
CONDITIONING REMOTE PLASMA SOURCE FOR ENHANCED PERFORMANCE HAVING R...
- Publication number 20160020071
- Publication date Jan 21, 2016
- Applied Materials, Inc.
- Abdul Aziz KHAJA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
APPARATUS AND METHOD FOR TUNING A PLASMA PROFILE USING A TUNING RIN...
- Publication number 20160017494
- Publication date Jan 21, 2016
- Applied Materials, Inc.
- Mohamad A. AYOUB
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
APPARATUS AND METHOD FOR TUNING A PLASMA PROFILE USING A TUNING ELE...
- Publication number 20160013022
- Publication date Jan 14, 2016
- Applied Materials, Inc.
- MOHAMAD A. AYOUB
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PECVD APPARATUS AND PROCESS
- Publication number 20150226540
- Publication date Aug 13, 2015
- Applied Materials, Inc.
- Nagarajan Rajagopalan
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
HIGH IMPEDANCE RF FILTER FOR HEATER WITH IMPEDANCE TUNING DEVICE
- Publication number 20140302256
- Publication date Oct 9, 2014
- Applied Materials, Inc.
- Jian J. CHEN
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD AND APPARATUS FOR TUNING ELECTRODE IMPEDANCE FOR HIGH FREQUE...
- Publication number 20140290576
- Publication date Oct 2, 2014
- Jian J. Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PECVD PROCESS
- Publication number 20140118751
- Publication date May 1, 2014
- Nagarajan RAJAGOPALAN
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
BOTTOM AND SIDE PLASMA TUNING HAVING CLOSED LOOP CONTROL
- Publication number 20140087489
- Publication date Mar 27, 2014
- Applied Materials, Inc.
- Juan Carlos ROCHA-ALVAREZ
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS AND METHODS FOR IMPROVING RELIABILITY OF RF GROUNDING
- Publication number 20130126206
- Publication date May 23, 2013
- Applied Materials, Inc.
- Jianhua Zhou
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYSTEMS FOR PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION AND BEVEL EDG...
- Publication number 20120211164
- Publication date Aug 23, 2012
- Applied Materials, Inc.
- Ashish Shah
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TUNABLE GROUND PLANES IN PLASMA CHAMBERS
- Publication number 20120205046
- Publication date Aug 16, 2012
- Applied Materials, Inc.
- Karthik Janakiraman
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SYSTEM AND METHOD FOR CURRENT-BASED PLASMA EXCURSION DETECTION
- Publication number 20120074951
- Publication date Mar 29, 2012
- Applied Materials, Inc.
- Jian J. Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYSTEM AND METHOD FOR VOLTAGE-BASED PLASMA EXCURSION DETECTION
- Publication number 20120075108
- Publication date Mar 29, 2012
- Applied Materials, Inc.
- Jian J. Chen
- H01 - BASIC ELECTRIC ELEMENTS

Mohamad A. AYOUB

Person

Patents Grantslast 30 patents

PECVD process

PECVD process

Shadow ring for modifying wafer edge and bevel deposition

Conditioning remote plasma source for enhanced performance having r...

Bottom and side plasma tuning having closed loop control

PECVD process

Tunable ground planes in plasma chambers

High impedance RF filter for heater with impedance tuning device

Apparatus and method for tuning a plasma profile using a tuning ele...

Shadow ring for modifying wafer edge and bevel deposition

Conditioning remote plasma source for enhanced performance having r...

High impedance RF filter for heater with impedance tuning device

Bottom and side plasma tuning having closed loop control

Auto frequency tuned remote plasma source

PECVD process

Apparatus and method for tuning electrode impedance for high freque...

PECVD apparatus and process

Apparatus and method for tuning a plasma profile using a tuning ele...

PECVD process

Remote plasma source for controlling plasma skew

PECVD process

Detecting plasma arcs by monitoring RF reflected power in a plasma...

Apparatus and method for substrate clamping in a plasma chamber

PECVD process

Apparatus and methods for improving reliability of RF grounding

Confined process volume PECVD chamber

System and method for current-based plasma excursion detection

System and method for voltage-based plasma excursion detection

Systems for plasma enhanced chemical vapor deposition and bevel edg...

Patents Applicationslast 30 patents

PECVD PROCESS

PECVD PROCESS

HIGH IMPEDANCE RF FILTER FOR HEATER WITH IMPEDANCE TUNING DEVICE

HIGH IMPEDANCE RF FILTER FOR HEATER WITH IMPEDANCE TUNING DEVICE

SHADOW RING FOR MODIFYING WAFER EDGE AND BEVEL DEPOSITION

BOTTOM AND SIDE PLASMA TUNING HAVING CLOSED LOOP CONTROL

CONDITIONING REMOTE PLASMA SOURCE FOR ENHANCED PERFORMANCE HAVING R...

PECVD PROCESS

APPARATUS AND METHOD FOR TUNING A PLASMA PROFILE USING A TUNING ELE...

TUNABLE GROUND PLANES IN PLASMA CHAMBERS

PECVD PROCESS

PECVD PROCESS

REMOTE PLASMA SOURCE FOR CONTROLLING PLASMA SKEW

TUNABLE GROUND PLANES IN PLASMA CHAMBERS

DETECTING PLASMA ARCS BY MONITORING RF REFLECTED POWER IN A PLASMA...

AUTO FREQUENCY TUNED REMOTE PLASMA SOURCE

PECVD PROCESS

CONDITIONING REMOTE PLASMA SOURCE FOR ENHANCED PERFORMANCE HAVING R...

APPARATUS AND METHOD FOR TUNING A PLASMA PROFILE USING A TUNING RIN...

APPARATUS AND METHOD FOR TUNING A PLASMA PROFILE USING A TUNING ELE...

PECVD APPARATUS AND PROCESS

HIGH IMPEDANCE RF FILTER FOR HEATER WITH IMPEDANCE TUNING DEVICE

METHOD AND APPARATUS FOR TUNING ELECTRODE IMPEDANCE FOR HIGH FREQUE...

PECVD PROCESS

BOTTOM AND SIDE PLASMA TUNING HAVING CLOSED LOOP CONTROL

APPARATUS AND METHODS FOR IMPROVING RELIABILITY OF RF GROUNDING

SYSTEMS FOR PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION AND BEVEL EDG...

TUNABLE GROUND PLANES IN PLASMA CHAMBERS

SYSTEM AND METHOD FOR CURRENT-BASED PLASMA EXCURSION DETECTION

SYSTEM AND METHOD FOR VOLTAGE-BASED PLASMA EXCURSION DETECTION