Mohamed SWILLAM

Person

Wilton, CT, US

People

Patents Grantslast 30 patents

Information Patent Grant
Optical designs of miniaturized overlay measurement system
- Patent number 12,140,872
- Issue date Nov 12, 2024
- ASML Holding N.V.
- Mohamed Swillam
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Spectrometric metrology systems based on multimode interference and...
- Patent number 12,135,505
- Issue date Nov 5, 2024
- ASML Holding N.V.
- Mohamed Swillam
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic apparatus, metrology systems, illumination sources and...
- Patent number 12,124,173
- Issue date Oct 22, 2024
- ASML Netherlands B.V. & ASML Holding N.V.
- Marinus Petrus Reijnders
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Overlay measurement system using lock-in amplifier technique
- Patent number 12,124,177
- Issue date Oct 22, 2024
- ASML Holding N.V.
- Mohamed Swillam
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
On chip sensor for wafer overlay measurement
- Patent number 12,066,762
- Issue date Aug 20, 2024
- ASML Holding N.V. & ASML Netherlands B.V.
- Mohamed Swillam
- G02 - OPTICS
Information Patent Grant
Lithographic apparatus, metrology systems, phased array illuminatio...
- Patent number 11,994,808
- Issue date May 28, 2024
- ASML Holding N.V.
- Mohamed Swillam
- G01 - MEASURING TESTING
Information Patent Grant
Lithographic apparatus, metrology systems, phased array illuminatio...
- Patent number 11,966,169
- Issue date Apr 23, 2024
- ASML Holding N.V.
- Mohamed Swillam
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
ON CHIP SENSOR FOR WAFER OVERLAY MEASUREMENT
- Publication number 20240361703
- Publication date Oct 31, 2024
- ASML Holding N.V.
- Mohamed SWILLAM
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METROLOGY SYSTEMS WITH PHASED ARRAYS FOR CONTAMINANT DETECTION AND...
- Publication number 20240319617
- Publication date Sep 26, 2024
- ASML Holding N.V.
- Mohamed SWILLAM
- G01 - MEASURING TESTING
Information Patent Application
METROLOGY SYSTEMS, TEMPORAL AND SPATIAL COHERENCE SCRAMBLER AND MET...
- Publication number 20240241453
- Publication date Jul 18, 2024
- ASML Holding N.V.
- Mohamed SWILLAM
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SYSTEMS AND METHODS FOR MEASURING INTENSITY IN A LITHOGRAPHIC ALIGN...
- Publication number 20240077308
- Publication date Mar 7, 2024
- ASML Holding N.V.
- Mohamed SWILLAM
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SPECTROMETRIC METROLOGY SYSTEMS BASED ON MULTIMODE INTERFERENCE AND...
- Publication number 20230273531
- Publication date Aug 31, 2023
- ASML Holding N.V.
- Mohamed SWILLAM
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SELF-REFERENCING INTEGRATED ALIGNMENT SENSOR
- Publication number 20230266681
- Publication date Aug 24, 2023
- ASML Holding N.V.
- Mohamed SWILLAM
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MONOLITHIC PARTICLE INSPECTION DEVICE
- Publication number 20230266255
- Publication date Aug 24, 2023
- ASML NETHERLANDS B.V.
- Ilse VAN WEPEREN
- G01 - MEASURING TESTING
Information Patent Application
LITHOGRAPHIC APPARATUS, METROLOGY SYSTEMS, ILLUMINATION SWITCHES AN...
- Publication number 20230213868
- Publication date Jul 6, 2023
- ASML Holding N.V.
- Mohamed SWILLAM
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LITHOGRAPHIC APPARATUS, MULTI-WAVELENGTH PHASE-MODULATED SCANNING M...
- Publication number 20230213871
- Publication date Jul 6, 2023
- ASML NETHERLANDS B.V.
- Sebastianus Adrianus GOORDEN
- G01 - MEASURING TESTING
Information Patent Application
OPTICAL DESIGNS OF MINIATURIZED OVERLAY MEASUREMENT SYSTEM
- Publication number 20230059471
- Publication date Feb 23, 2023
- ASML Holding N.V.
- Mohamed SWILLAM
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LITHOGRAPHIC APPARATUS, METROLOGY SYSTEMS, ILLUMINATION SOURCES AND...
- Publication number 20230058714
- Publication date Feb 23, 2023
- ASML NETHERLANDS B.V.
- Marinus Petrus REIJNDERS
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
OVERLAY MEASUREMENT SYSTEM USING LOCK-IN AMPLIFIER TECHNIQUE
- Publication number 20230008139
- Publication date Jan 12, 2023
- ASML Holding N.V.
- Mohamed SWILLAM
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METROLOGY SYSTEMS, COHERENCE SCRAMBLER ILLUMINATION SOURCES AND MET...
- Publication number 20220342228
- Publication date Oct 27, 2022
- ASML NETHERLANDS B.V.
- Irwan Dani SETIJA
- G02 - OPTICS
Information Patent Application
ON CHIP SENSOR FOR WAFER OVERLAY MEASUREMENT
- Publication number 20220283516
- Publication date Sep 8, 2022
- ASML Holding N.V.
- Mohamed SWILLAM
- G02 - OPTICS
Information Patent Application
ON CHIP WAFER ALIGNMENT SENSOR
- Publication number 20220268574
- Publication date Aug 25, 2022
- ASML Holding N.V.
- Tamer Mohamed Tawfik Ahmed Mohamed ELAZHARY
- G01 - MEASURING TESTING
Information Patent Application
Lithographic Apparatus, Metrology Systems, Phased Array Illuminatio...
- Publication number 20210095957
- Publication date Apr 1, 2021
- ASML Holding N.V.
- Mohamed SWILLAM
- H01 - BASIC ELECTRIC ELEMENTS

Mohamed SWILLAM

Person

Patents Grantslast 30 patents

Optical designs of miniaturized overlay measurement system

Spectrometric metrology systems based on multimode interference and...

Lithographic apparatus, metrology systems, illumination sources and...

Overlay measurement system using lock-in amplifier technique

On chip sensor for wafer overlay measurement

Lithographic apparatus, metrology systems, phased array illuminatio...

Lithographic apparatus, metrology systems, phased array illuminatio...

Patents Applicationslast 30 patents

ON CHIP SENSOR FOR WAFER OVERLAY MEASUREMENT

METROLOGY SYSTEMS WITH PHASED ARRAYS FOR CONTAMINANT DETECTION AND...

METROLOGY SYSTEMS, TEMPORAL AND SPATIAL COHERENCE SCRAMBLER AND MET...

SYSTEMS AND METHODS FOR MEASURING INTENSITY IN A LITHOGRAPHIC ALIGN...

SPECTROMETRIC METROLOGY SYSTEMS BASED ON MULTIMODE INTERFERENCE AND...

SELF-REFERENCING INTEGRATED ALIGNMENT SENSOR

MONOLITHIC PARTICLE INSPECTION DEVICE

LITHOGRAPHIC APPARATUS, METROLOGY SYSTEMS, ILLUMINATION SWITCHES AN...

LITHOGRAPHIC APPARATUS, MULTI-WAVELENGTH PHASE-MODULATED SCANNING M...

OPTICAL DESIGNS OF MINIATURIZED OVERLAY MEASUREMENT SYSTEM

LITHOGRAPHIC APPARATUS, METROLOGY SYSTEMS, ILLUMINATION SOURCES AND...

OVERLAY MEASUREMENT SYSTEM USING LOCK-IN AMPLIFIER TECHNIQUE

METROLOGY SYSTEMS, COHERENCE SCRAMBLER ILLUMINATION SOURCES AND MET...

ON CHIP SENSOR FOR WAFER OVERLAY MEASUREMENT

ON CHIP WAFER ALIGNMENT SENSOR

Lithographic Apparatus, Metrology Systems, Phased Array Illuminatio...