Mohammad T. Islam

Person

Newark, DE, US

People

Patents Grantslast 30 patents

Information Patent Grant
Low-debris fluopolymer composite CMP polishing pad
- Patent number 11,638,978
- Issue date May 2, 2023
- Rohm and Haas Electronic Materials CMP Holdings, Inc.
- Nan-Rong Chiou
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Fluopolymer composite CMP polishing method
- Patent number 11,491,605
- Issue date Nov 8, 2022
- Rohm and Haas Electronic Materials CMP Holdings, Inc.
- Matthew R. Gadinski
- B24 - GRINDING POLISHING
Information Patent Grant
Thin film fluoropolymer composite CMP polishing method
- Patent number 11,285,577
- Issue date Mar 29, 2022
- Rohm and Haas Electronic Materials CMP Holdings, Inc.
- Mohammad T. Islam
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Chemical mechanical polishing pad and polishing method
- Patent number 10,569,384
- Issue date Feb 25, 2020
- Rohm and Haas Electronic Materials CMP Holdings, Inc.
- Matthew R. Gadinski
- B24 - GRINDING POLISHING
Information Patent Grant
Chemical mechanical polishing pad and polishing method
- Patent number 10,464,188
- Issue date Nov 5, 2019
- Rohm and Haas Electronic Materials CMP Holdings, Inc.
- Matthew R. Gadinski
- B24 - GRINDING POLISHING
Information Patent Grant
Aliphatic polyurethane optical endpoint detection windows and CMP p...
- Patent number 10,293,456
- Issue date May 21, 2019
- Rohm and Haas Electronic Materials CMP Holdings, Inc.
- Nan-Rong Chiou
- B24 - GRINDING POLISHING
Information Patent Grant
Aliphatic polyurethane optical endpoint detection windows and CMP p...
- Patent number 10,207,388
- Issue date Feb 19, 2019
- Rohm and Haas Electronic Materials CMP Holdings, Inc.
- Nan-Rong Chiou
- B24 - GRINDING POLISHING
Information Patent Grant
High planarization efficiency chemical mechanical polishing pads an...
- Patent number 10,086,494
- Issue date Oct 2, 2018
- Rohm and Haas Electronic Materials CMP Holdings, Inc.
- Jonathan G. Weis
- B24 - GRINDING POLISHING
Information Patent Grant
Method of chemical mechanical polishing a substrate
- Patent number 9,102,034
- Issue date Aug 11, 2015
- Rohm and Haas Electronic Materials CMP Holdings, Inc.
- Michelle Jensen
- B24 - GRINDING POLISHING

Patents Applicationslast 30 patents

Information Patent Application
THIN FILM FLUOROPOLYMER COMPOSITE CMP POLISHING PAD
- Publication number 20200384601
- Publication date Dec 10, 2020
- Rohm and Haas Electronic Materials CMP Holdings, INC.
- Mohammad T. Islam
- B24 - GRINDING POLISHING
Information Patent Application
LOW-DEBRIS FLUOPOLYMER COMPOSITE CMP POLISHING PAD
- Publication number 20200384603
- Publication date Dec 10, 2020
- Rohm and Haas Electronic Materials CMP Holdings, INC.
- Nan-Rong Chiou
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
THIN FILM FLUOPOLYMER COMPOSITE CMP POLISHING METHOD
- Publication number 20200384600
- Publication date Dec 10, 2020
- Rohm and Haas Electronic Materials CMP Holdings, INC.
- Mohammad T. Islam
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
FLUOPOLYMER COMPOSITE CMP POLISHING METHOD
- Publication number 20200384602
- Publication date Dec 10, 2020
- Rohm and Haas Electronic Materials CMP Holdings, INC.
- Matthew R. Gadinski
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
ALIPHATIC POLYURETHANE OPTICAL ENDPOINT DETECTION WINDOWS AND CMP P...
- Publication number 20180304438
- Publication date Oct 25, 2018
- Rohm and Haas Electronic Materials CMP Holdings, INC.
- Nan-Rong Chiou
- B24 - GRINDING POLISHING
Information Patent Application
ALIPHATIC POLYURETHANE OPTICAL ENDPOINT DETECTION WINDOWS AND CMP P...
- Publication number 20180304439
- Publication date Oct 25, 2018
- Rohm and Haas Electronic Materials CMP Holdings, INC.
- Nan-Rong Chiou
- B24 - GRINDING POLISHING
Information Patent Application
HIGH PLANARIZATION EFFICIENCY CHEMICAL MECHANICAL POLISHING PADS AN...
- Publication number 20180071888
- Publication date Mar 15, 2018
- Rohm and Haas Electronic Materials CMP Holdings, INC.
- Jonathan G. Weis
- B24 - GRINDING POLISHING
Information Patent Application
CHEMICAL MECHANICAL POLISHING PAD
- Publication number 20150065013
- Publication date Mar 5, 2015
- DOW GLOBAL TECHNOLOGIES LLC
- Michelle Jensen
- B24 - GRINDING POLISHING
Information Patent Application
METHOD OF CHEMICAL MECHANICAL POLISHING A SUBSTRATE
- Publication number 20150065014
- Publication date Mar 5, 2015
- DOW GLOBAL TECHNOLOGIES LLC
- Michelle Jensen
- B24 - GRINDING POLISHING

Mohammad T. Islam

Person

Patents Grantslast 30 patents

Low-debris fluopolymer composite CMP polishing pad

Fluopolymer composite CMP polishing method

Thin film fluoropolymer composite CMP polishing method

Chemical mechanical polishing pad and polishing method

Chemical mechanical polishing pad and polishing method

Aliphatic polyurethane optical endpoint detection windows and CMP p...

Aliphatic polyurethane optical endpoint detection windows and CMP p...

High planarization efficiency chemical mechanical polishing pads an...

Method of chemical mechanical polishing a substrate

Patents Applicationslast 30 patents

THIN FILM FLUOROPOLYMER COMPOSITE CMP POLISHING PAD

LOW-DEBRIS FLUOPOLYMER COMPOSITE CMP POLISHING PAD

THIN FILM FLUOPOLYMER COMPOSITE CMP POLISHING METHOD

FLUOPOLYMER COMPOSITE CMP POLISHING METHOD

ALIPHATIC POLYURETHANE OPTICAL ENDPOINT DETECTION WINDOWS AND CMP P...

ALIPHATIC POLYURETHANE OPTICAL ENDPOINT DETECTION WINDOWS AND CMP P...

HIGH PLANARIZATION EFFICIENCY CHEMICAL MECHANICAL POLISHING PADS AN...

CHEMICAL MECHANICAL POLISHING PAD

METHOD OF CHEMICAL MECHANICAL POLISHING A SUBSTRATE