Mohammed Radwan

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Dresden, DE

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Patents Grantslast 30 patents

Information Patent Grant
Technique for reducing plasma-induced etch damage during the format...
- Patent number 9,111,999
- Issue date Aug 18, 2015
- GLOBALFOUNDRIES Inc.
- Mohammed Radwan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Technique for reducing plasma-induced etch damage during the format...
- Patent number 9,018,102
- Issue date Apr 28, 2015
- GLOBALFOUNDRIES Inc.
- Mohammed Radwan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of controlling critical dimensions of vias in a metallizatio...
- Patent number 8,492,279
- Issue date Jul 23, 2013
- GLOBALFOUNDRIES Inc.
- Mohammed Radwan
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
TECHNIQUE FOR REDUCING PLASMA-INDUCED ETCH DAMAGE DURING THE FORMAT...
- Publication number 20150200131
- Publication date Jul 16, 2015
- GLOBALFOUNDRIES INC.
- Mohammed Radwan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Technique for Reducing Plasma-Induced Etch Damage During the Format...
- Publication number 20120214305
- Publication date Aug 23, 2012
- GLOBALFOUNDRIES INC.
- Mohammed Radwan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of Controlling Critical Dimensions of Trenches in a Metalliz...
- Publication number 20120028376
- Publication date Feb 2, 2012
- GLOBALFOUNDRIES INC.
- Mohammed Radwan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of Controlling Critical Dimensions of Vias in a Metallizatio...
- Publication number 20120028472
- Publication date Feb 2, 2012
- GLOBALFOUNDRIES INC.
- Mohammed Radwan
- H01 - BASIC ELECTRIC ELEMENTS