Moitreyee Mukherjee-Roy

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Singapore, SG

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Patents Grantslast 30 patents

Information Patent Grant
Process of forming a composite diffusion barrier in copper/organic...
- Patent number 7,335,990
- Issue date Feb 26, 2008
- Agency for Science, Technology and Research
- Chaoyong Li
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Process of forming a composite diffusion barrier in copper/organic...
- Patent number 7,244,674
- Issue date Jul 17, 2007
- Agency for Science Technology and Research
- Chaoyong Li
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of forming dual damascene pattern using dual bottom anti-ref...
- Patent number 6,743,713
- Issue date Jun 1, 2004
- Institute of Microelectronics
- Moitreyee Mukherjee-Roy
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
Process of forming a composite diffusion barrier in copper/organic...
- Publication number 20070252278
- Publication date Nov 1, 2007
- Chaoyong Li
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Process of forming a composite diffusion barrier in copper/organic...
- Publication number 20050239278
- Publication date Oct 27, 2005
- Agency For Science, Technology and Research
- Chaoyong Li
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of forming dual damascene pattern using dual bottom anti-ref...
- Publication number 20030216026
- Publication date Nov 20, 2003
- Institute of Microelectronics
- Moitreyee Mukherjee-Roy
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method for preventing photoresist poisoning in semiconductor fabric...
- Publication number 20030040174
- Publication date Feb 27, 2003
- Cher Huan Tan
- H01 - BASIC ELECTRIC ELEMENTS