Morimi Osawa

Person

Kawaski, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Mask pattern correction device, method of correcting mask pattern,...
- Patent number 8,553,198
- Issue date Oct 8, 2013
- Fujitsu Semiconductor Limited
- Teruyoshi Yao
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Mask pattern correction device, method of correcting mask pattern,...
- Patent number 8,227,153
- Issue date Jul 24, 2012
- Fujitsu Semiconductor Limited
- Teruyoshi Yao
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Creating method of photomask pattern data, photomask created by usi...
- Patent number 7,971,160
- Issue date Jun 28, 2011
- Fujitsu Semiconductor Limited
- Morimi Osawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Semiconductor device and yield calculation method
- Patent number 7,870,520
- Issue date Jan 11, 2011
- Fujitsu Semiconductor Limited
- Morimi Osawa
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Mask pattern correction device, method of correcting mask pattern,...
- Patent number 7,732,107
- Issue date Jun 8, 2010
- Fujitsu Semiconductor Limited
- Teruyoshi Yao
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Apparatus and method for correcting pattern dimension and photo mas...
- Patent number 7,601,471
- Issue date Oct 13, 2009
- Fujitsu Microelectronics Limited
- Morimi Osawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Pattern size correcting device and pattern size correcting method
- Patent number 7,240,307
- Issue date Jul 3, 2007
- Fujitsu Limited
- Hajime Aoyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for generating backscattering intensity on the basis of lowe...
- Patent number 7,205,078
- Issue date Apr 17, 2007
- Fujitsu Limited
- Morimi Osawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Light intensity simulation method, program product, and designing m...
- Patent number 6,862,726
- Issue date Mar 1, 2005
- Fujitsu Limted
- Hiroki Futatsuya
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Rectangle/lattice data conversion method for charged particle beam...
- Patent number 6,677,089
- Issue date Jan 13, 2004
- Fujitsu Limited
- Kozo Ogino
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
Mask Pattern Correction Device, Method of Correcting Mask Pattern,...
- Publication number 20120236279
- Publication date Sep 20, 2012
- FUJITSU SEMICONDUCTOR LTD.
- Teruyoshi YAO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MASK PATTERN CORRECTION DEVICE, METHOD OF CORRECTING MASK PATTERN,...
- Publication number 20100209834
- Publication date Aug 19, 2010
- FUJITSU SEMICONDUCTOR LTD.
- Teruyoshi YAO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SEMICONDUCTOR DEVICE AND YIELD CALCULATION METHOD
- Publication number 20080172644
- Publication date Jul 17, 2008
- Fujitsu Limited
- Morimi OSAWA
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
CREATING METHOD OF PHOTOMASK PATTERN DATA, PHOTOMASK CREATED BY USI...
- Publication number 20080113280
- Publication date May 15, 2008
- Fujitsu Limited
- Morimi OSAWA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Mask pattern correction device, method of correcting mask pattern,...
- Publication number 20060018529
- Publication date Jan 26, 2006
- FUJITSU LIMITED
- Teruyoshi Yao
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Apparatus and method for correcting pattern dimension and photo mas...
- Publication number 20050233226
- Publication date Oct 20, 2005
- FUJITSU LIMITED
- Morimi Osawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Pattern size correcting device and pattern size correcting method
- Publication number 20050121628
- Publication date Jun 9, 2005
- FUJITSU LIMITED
- Hajime Aoyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method for generating backscattering intensity on the basis of lowe...
- Publication number 20050040344
- Publication date Feb 24, 2005
- FUJITSU LIMITED
- Morimi Osawa
- B82 - NANO-TECHNOLOGY
Information Patent Application
Light intensity simulation method, program product, and designing m...
- Publication number 20040025138
- Publication date Feb 5, 2004
- FUJITSU LIMITED
- Hiroki Futatsuya
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Rectangle/lattice data conversion method for charged particle beam...
- Publication number 20020177056
- Publication date Nov 28, 2002
- FUJITSU LIMITED
- Kozo Ogino
- H01 - BASIC ELECTRIC ELEMENTS

Morimi Osawa

Person

Patents Grantslast 30 patents

Mask pattern correction device, method of correcting mask pattern,...

Mask pattern correction device, method of correcting mask pattern,...

Creating method of photomask pattern data, photomask created by usi...

Semiconductor device and yield calculation method

Mask pattern correction device, method of correcting mask pattern,...

Apparatus and method for correcting pattern dimension and photo mas...

Pattern size correcting device and pattern size correcting method

Method for generating backscattering intensity on the basis of lowe...

Light intensity simulation method, program product, and designing m...

Rectangle/lattice data conversion method for charged particle beam...

Patents Applicationslast 30 patents

Mask Pattern Correction Device, Method of Correcting Mask Pattern,...

MASK PATTERN CORRECTION DEVICE, METHOD OF CORRECTING MASK PATTERN,...

SEMICONDUCTOR DEVICE AND YIELD CALCULATION METHOD

CREATING METHOD OF PHOTOMASK PATTERN DATA, PHOTOMASK CREATED BY USI...

Mask pattern correction device, method of correcting mask pattern,...

Apparatus and method for correcting pattern dimension and photo mas...

Pattern size correcting device and pattern size correcting method

Method for generating backscattering intensity on the basis of lowe...

Light intensity simulation method, program product, and designing m...

Rectangle/lattice data conversion method for charged particle beam...