Morio Hosoya

Person

Tokyo, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Reflective mask blank and method of manufacturing a reflective mask
- Patent number 9,229,315
- Issue date Jan 5, 2016
- Hoya Corporation
- Morio Hosoya
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Photomask blank, photomask, and method for manufacturing photomask...
- Patent number 9,075,314
- Issue date Jul 7, 2015
- Hoya Corporation
- Hiroyuki Iwashita
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Reflective mask blank and method of manufacturing a reflective mask
- Patent number 8,709,685
- Issue date Apr 29, 2014
- Hoya Corporation
- Morio Hosoya
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Reflective mask blank and method of manufacturing a reflective mask
- Patent number 8,546,047
- Issue date Oct 1, 2013
- Hoya Corporation
- Morio Hosoya
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Photomask blank, photomask, and method for manufacturing photomask...
- Patent number 8,512,916
- Issue date Aug 20, 2013
- Hoya Corporation
- Hiroyuki Iwashita
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Reflective mask blank and method of manufacturing a reflective mask
- Patent number 8,389,184
- Issue date Mar 5, 2013
- Hoya Corporation
- Morio Hosoya
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Reflective mask blank, method of manufacturing a reflective mask bl...
- Patent number 8,329,361
- Issue date Dec 11, 2012
- Hoya Corporation
- Morio Hosoya
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Multilayer reflective film coated substrate, manufacturing method t...
- Patent number 8,081,384
- Issue date Dec 20, 2011
- Hoya Corporation
- Morio Hosoya
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Reflective mask blank and method of producing the same, and method...
- Patent number 8,021,807
- Issue date Sep 20, 2011
- Hoya Corporation
- Morio Hosoya
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Reflective mask blank, reflective mask and methods of producing the...
- Patent number 7,981,573
- Issue date Jul 19, 2011
- Hoya Corporation
- Shinichi Ishibashi
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Multilayer reflective film coated substrate, manufacturing method t...
- Patent number 7,804,648
- Issue date Sep 28, 2010
- Hoya Corporation
- Morio Hosoya
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Reflective mask blank, reflective mask, and method of manufacturing...
- Patent number 7,700,245
- Issue date Apr 20, 2010
- Hoya Corporation
- Morio Hosoya
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Reflection type mask blank and reflection type mask and production...
- Patent number 7,390,596
- Issue date Jun 24, 2008
- Hoya Corporation
- Shinichi Ishibashi
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Method of manufacturing a reflection type mask blank and method of...
- Patent number 7,056,627
- Issue date Jun 6, 2006
- Hoya Corporation
- Tsutomu Shoki
- C03 - GLASS MINERAL OR SLAG WOOL
Information Patent Grant
Reflection type mask blank for EUV exposure and reflection type mas...
- Patent number 6,749,973
- Issue date Jun 15, 2004
- Hoya Corporation
- Tsutomu Shoki
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Substrate with multilayer film, reflection type mask blank for expo...
- Patent number 6,737,201
- Issue date May 18, 2004
- Hoya Corporation
- Tsutomu Shoki
- B82 - NANO-TECHNOLOGY

Patents Applicationslast 30 patents

Information Patent Application
PHOTOMASK BLANK, PHOTOMASK, AND METHOD FOR MANUFACTURING PHOTOMASK...
- Publication number 20140057199
- Publication date Feb 27, 2014
- HOYA CORPORATION
- Hiroyuki Iwashita
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
REFLECTIVE MASK BLANK AND METHOD OF MANUFACTURING A REFLECTIVE MASK
- Publication number 20140011122
- Publication date Jan 9, 2014
- HOYA CORPORATION
- Morio Hosoya
- B82 - NANO-TECHNOLOGY
Information Patent Application
REFLECTIVE MASK BLANK AND METHOD OF MANUFACTURING A REFLECTIVE MASK
- Publication number 20130071779
- Publication date Mar 21, 2013
- HOYA CORPORATION
- Morio Hosoya
- B82 - NANO-TECHNOLOGY
Information Patent Application
PHOTOMASK BLANK, PHOTOMASK, AND METHOD OF MANUFACTURING PHOTOMASK B...
- Publication number 20110305978
- Publication date Dec 15, 2011
- HOYA CORPORATION
- Hiroyuki Iwashita
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
REFLECTIVE MASK BLANK AND METHOD OF MANUFACTURING A REFLECTIVE MASK
- Publication number 20110281207
- Publication date Nov 17, 2011
- HOYA CORPORATION
- Morio Hosoya
- B82 - NANO-TECHNOLOGY
Information Patent Application
REFLECTIVE MASK BLANK AND METHOD OF MANUFACTURING A REFLECTIVE MASK
- Publication number 20110217633
- Publication date Sep 8, 2011
- HOYA CORPORATION
- Morio Hosoya
- B82 - NANO-TECHNOLOGY
Information Patent Application
REFLECTIVE MASK BLANK AND METHOD OF MANUFACTURING A REFLECTIVE MASK
- Publication number 20100266938
- Publication date Oct 21, 2010
- HOYA CORPORATION
- Morio Hosoya
- B82 - NANO-TECHNOLOGY
Information Patent Application
METHOD OF PRODUCING A REFLECTIVE MASK
- Publication number 20100084375
- Publication date Apr 8, 2010
- HOYA CORPORATION
- Morio HOSOYA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Reflective mask blank, reflective mask, and method of manufacturing...
- Publication number 20070275308
- Publication date Nov 29, 2007
- Hoya Corporation
- Morio Hosoya
- B82 - NANO-TECHNOLOGY
Information Patent Application
Multilayer reflective film coated substrate, manufacturing method t...
- Publication number 20070091420
- Publication date Apr 26, 2007
- Hoya Corporation
- Morio Hosoya
- G02 - OPTICS
Information Patent Application
Reflective mask blank, reflective mask, and method for manufacturin...
- Publication number 20060270226
- Publication date Nov 30, 2006
- Hoya Corporation
- Morio Hosoya
- B82 - NANO-TECHNOLOGY
Information Patent Application
Sputtering target, method of manufacturing a multilayer reflective...
- Publication number 20060237303
- Publication date Oct 26, 2006
- Hoya Corporation
- Morio Hosoya
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Substrate with a multilayer reflection film, reflection type mask b...
- Publication number 20050238922
- Publication date Oct 27, 2005
- Hoya Corporation
- Takeru Kinoshita
- B82 - NANO-TECHNOLOGY
Information Patent Application
Reflection type mask blank and reflection type mask and production...
- Publication number 20050208389
- Publication date Sep 22, 2005
- HOYA CORPORATION
- Shinichi Ishibashi
- B82 - NANO-TECHNOLOGY
Information Patent Application
Method of manufacturing a reflection type mask blank and method of...
- Publication number 20050100797
- Publication date May 12, 2005
- Hoya Corporation
- Tsutomu Shoki
- B82 - NANO-TECHNOLOGY
Information Patent Application
Reflection type mask blank for EUV exposure and reflection type mas...
- Publication number 20020110743
- Publication date Aug 15, 2002
- Hoya Corporation
- Tsutomu Shoki
- B82 - NANO-TECHNOLOGY
Information Patent Application
Substrate with multilayer film, reflection type mask blank for expo...
- Publication number 20020076625
- Publication date Jun 20, 2002
- Hoya Corporation
- Tsutomu Shoki
- B82 - NANO-TECHNOLOGY

Morio Hosoya

Person

Patents Grantslast 30 patents

Reflective mask blank and method of manufacturing a reflective mask

Photomask blank, photomask, and method for manufacturing photomask...

Reflective mask blank and method of manufacturing a reflective mask

Reflective mask blank and method of manufacturing a reflective mask

Photomask blank, photomask, and method for manufacturing photomask...

Reflective mask blank and method of manufacturing a reflective mask

Reflective mask blank, method of manufacturing a reflective mask bl...

Multilayer reflective film coated substrate, manufacturing method t...

Reflective mask blank and method of producing the same, and method...

Reflective mask blank, reflective mask and methods of producing the...

Multilayer reflective film coated substrate, manufacturing method t...

Reflective mask blank, reflective mask, and method of manufacturing...

Reflection type mask blank and reflection type mask and production...

Method of manufacturing a reflection type mask blank and method of...

Reflection type mask blank for EUV exposure and reflection type mas...

Substrate with multilayer film, reflection type mask blank for expo...

Patents Applicationslast 30 patents

PHOTOMASK BLANK, PHOTOMASK, AND METHOD FOR MANUFACTURING PHOTOMASK...

REFLECTIVE MASK BLANK AND METHOD OF MANUFACTURING A REFLECTIVE MASK

REFLECTIVE MASK BLANK AND METHOD OF MANUFACTURING A REFLECTIVE MASK

PHOTOMASK BLANK, PHOTOMASK, AND METHOD OF MANUFACTURING PHOTOMASK B...

REFLECTIVE MASK BLANK AND METHOD OF MANUFACTURING A REFLECTIVE MASK

REFLECTIVE MASK BLANK AND METHOD OF MANUFACTURING A REFLECTIVE MASK

REFLECTIVE MASK BLANK AND METHOD OF MANUFACTURING A REFLECTIVE MASK

METHOD OF PRODUCING A REFLECTIVE MASK

Reflective mask blank, reflective mask, and method of manufacturing...

Multilayer reflective film coated substrate, manufacturing method t...

Reflective mask blank, reflective mask, and method for manufacturin...

Sputtering target, method of manufacturing a multilayer reflective...

Substrate with a multilayer reflection film, reflection type mask b...

Reflection type mask blank and reflection type mask and production...

Method of manufacturing a reflection type mask blank and method of...

Reflection type mask blank for EUV exposure and reflection type mas...

Substrate with multilayer film, reflection type mask blank for expo...