Moritz BECKER

Person

Stuttgart, DE

People

Patents Grantslast 30 patents

Information Patent Grant
Method for operating an optical apparatus, and optical apparatus
- Patent number 11,307,505
- Issue date Apr 19, 2022
- Carl Zeiss SMT GmbH
- Moritz Becker
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for removing a contamination layer by an atomic layer etchin...
- Patent number 11,199,363
- Issue date Dec 14, 2021
- Carl Zeiss SMT GmbH
- Fred Roozeboom
- F28 - HEAT EXCHANGE IN GENERAL
Information Patent Grant
Optical arrangement for EUV radiation with a shield for protection...
- Patent number 11,137,687
- Issue date Oct 5, 2021
- Carl Zeiss SMT GmbH
- Bjoern Liebaug
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Projection exposure system for semiconductor lithography, comprisin...
- Patent number 10,712,677
- Issue date Jul 14, 2020
- Carl Zeiss SMT GmbH
- Irene Ament
- B08 - CLEANING
Information Patent Grant
Reflective optical element for EUV lithography
- Patent number 10,649,340
- Issue date May 12, 2020
- Carl Zeiss SMT GmbH
- Dirk Heinrich Ehm
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Method for determining the thickness of a contaminating layer and/o...
- Patent number 10,627,217
- Issue date Apr 21, 2020
- Carl Zeiss SMT GmbH
- Irene Ament
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Reflective optical element
- Patent number 10,061,205
- Issue date Aug 28, 2018
- Carl Zeiss SMT GmbH
- Dirk Heinrich Ehm
- G02 - OPTICS
Information Patent Grant
Projection objective of a microlithographic projection exposure app...
- Patent number 8,339,576
- Issue date Dec 25, 2012
- Carl Zeiss SMT GmbH
- Ulrich Loering
- G02 - OPTICS

Patents Applicationslast 30 patents

Information Patent Application
APPARATUS AND METHOD FOR AVOIDING A DEGRADATION OF AN OPTICAL USED...
- Publication number 20240319621
- Publication date Sep 26, 2024
- Carl Zeiss SMT GMBH
- Moritz BECKER
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ELECTRON MICROSCOPE FOR EXAMINING A SPECIMEN
- Publication number 20240302304
- Publication date Sep 12, 2024
- Carl Zeiss SMT GMBH
- Moritz Becker
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR DEPOSITING A COVER LAYER, EUV LITHOGRAPHY SYSTEM AND OPT...
- Publication number 20240302756
- Publication date Sep 12, 2024
- Carl Zeiss SMT GMBH
- Dirk EHM
- G02 - OPTICS
Information Patent Application
MULTI-MIRROR ARRAY
- Publication number 20240248408
- Publication date Jul 25, 2024
- Carl Zeiss SMT GMBH
- Moritz Becker
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR OPERATING AN EUV LITHOGRAPHTY APPARATUS, AND EUV LITHOGR...
- Publication number 20230041588
- Publication date Feb 9, 2023
- Carl Zeiss SMT GMBH
- Moritz BECKER
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Application
PROJECTION EXPOSURE APPARATUS HAVING A DEVICE FOR DETERMINING THE C...
- Publication number 20220308457
- Publication date Sep 29, 2022
- Carl Zeiss SMT GMBH
- Dirk EHM
- G01 - MEASURING TESTING
Information Patent Application
METHOD FOR OPERATING AN OPTICAL APPARATUS, AND OPTICAL APPARATUS
- Publication number 20200183292
- Publication date Jun 11, 2020
- Carl Zeiss SMT GMBH
- Moritz BECKER
- G01 - MEASURING TESTING
Information Patent Application
OPTICAL ARRANGEMENT FOR EUV RADIATION WITH A SHIELD FOR PROTECTION...
- Publication number 20200166847
- Publication date May 28, 2020
- Carl Zeiss SMT GMBH
- Bjoern LIEBAUG
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR REMOVING A CONTAMINATION LAYER BY AN ATOMIC LAYER ETCHIN...
- Publication number 20200142327
- Publication date May 7, 2020
- Carl Zeiss SMT GMBH
- Fred ROOZEBOOM
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PROJECTION EXPOSURE SYSTEM FOR SEMICONDUCTOR LITHOGRAPHY, COMPRISIN...
- Publication number 20190243258
- Publication date Aug 8, 2019
- Carl Zeiss SMT GMBH
- Irene AMENT
- B08 - CLEANING
Information Patent Application
REFLECTIVE OPTICAL ELEMENT FOR EUV LITHOGRAPHY
- Publication number 20190171108
- Publication date Jun 6, 2019
- Carl Zeiss SMT GMBH
- Dirk Heinrich EHM
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR DETERMINING THE THICKNESS OF A CONTAMINATING LAYER AND/O...
- Publication number 20170292830
- Publication date Oct 12, 2017
- Carl Zeiss SMT GMBH
- Irene AMENT
- B82 - NANO-TECHNOLOGY
Information Patent Application
REFLECTIVE OPTICAL ELEMENT
- Publication number 20170160639
- Publication date Jun 8, 2017
- Carl Zeiss SMT GMBH
- Dirk Heinrich EHM
- G02 - OPTICS
Information Patent Application
OPTICAL ARRANGEMENT, IN PARTICULAR PLASMA LIGHT SOURCE OR EUV LITHO...
- Publication number 20160207078
- Publication date Jul 21, 2016
- Carl Zeiss SMT GMBH
- Moritz BECKER
- B08 - CLEANING
Information Patent Application
PROJECTION OBJECTIVE OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE APP...
- Publication number 20120281196
- Publication date Nov 8, 2012
- Carl Zeiss SMT GMBH
- Ulrich Loering
- G02 - OPTICS

Moritz BECKER

Person

Patents Grantslast 30 patents

Method for operating an optical apparatus, and optical apparatus

Method for removing a contamination layer by an atomic layer etchin...

Optical arrangement for EUV radiation with a shield for protection...

Projection exposure system for semiconductor lithography, comprisin...

Reflective optical element for EUV lithography

Method for determining the thickness of a contaminating layer and/o...

Reflective optical element

Projection objective of a microlithographic projection exposure app...

Patents Applicationslast 30 patents

APPARATUS AND METHOD FOR AVOIDING A DEGRADATION OF AN OPTICAL USED...

ELECTRON MICROSCOPE FOR EXAMINING A SPECIMEN

METHOD FOR DEPOSITING A COVER LAYER, EUV LITHOGRAPHY SYSTEM AND OPT...

MULTI-MIRROR ARRAY

METHOD FOR OPERATING AN EUV LITHOGRAPHTY APPARATUS, AND EUV LITHOGR...

PROJECTION EXPOSURE APPARATUS HAVING A DEVICE FOR DETERMINING THE C...

METHOD FOR OPERATING AN OPTICAL APPARATUS, AND OPTICAL APPARATUS

OPTICAL ARRANGEMENT FOR EUV RADIATION WITH A SHIELD FOR PROTECTION...

METHOD FOR REMOVING A CONTAMINATION LAYER BY AN ATOMIC LAYER ETCHIN...

PROJECTION EXPOSURE SYSTEM FOR SEMICONDUCTOR LITHOGRAPHY, COMPRISIN...

REFLECTIVE OPTICAL ELEMENT FOR EUV LITHOGRAPHY

METHOD FOR DETERMINING THE THICKNESS OF A CONTAMINATING LAYER AND/O...

REFLECTIVE OPTICAL ELEMENT

OPTICAL ARRANGEMENT, IN PARTICULAR PLASMA LIGHT SOURCE OR EUV LITHO...

PROJECTION OBJECTIVE OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE APP...