Motokatsu Imai

Person

Yokohamashi, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Exposure method, substrate stage, exposure apparatus, and device ma...
- Patent number 9,846,371
- Issue date Dec 19, 2017
- Nikon Corporation
- Soichi Owa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Exposure method, substrate stage, exposure apparatus, and device ma...
- Patent number 9,268,237
- Issue date Feb 23, 2016
- Nikon Corporation
- Soichi Owa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Exposure method, substrate stage, exposure apparatus, and device ma...
- Patent number 9,235,139
- Issue date Jan 12, 2016
- Nikon Corporation
- Soichi Owa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Exposure method, substrate stage, exposure apparatus, and device ma...
- Patent number 9,019,467
- Issue date Apr 28, 2015
- Nikon Corporation
- Soichi Owa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Exposure apparatus, exposure method, and device fabrication method
- Patent number 8,797,506
- Issue date Aug 5, 2014
- Nikon Corporation
- Motokatsu Imai
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Exposure method, substrate stage, exposure apparatus, and device ma...
- Patent number 8,384,880
- Issue date Feb 26, 2013
- Nikon Corporation
- Soichi Owa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Exposure apparatus, exposure method, and device fabrication method
- Patent number 8,272,544
- Issue date Sep 25, 2012
- Nikon Corporation
- Motokatsu Imai
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Exposure method, substrate stage, exposure apparatus, and device ma...
- Patent number 8,208,117
- Issue date Jun 26, 2012
- Nikon Corporation
- Soichi Owa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Exposure apparatus, exposure method, and device fabrication method
- Patent number 7,932,996
- Issue date Apr 26, 2011
- Nikon Corporation
- Motokatsu Imai
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Modular encoder and method of manufacturing the same
- Patent number 6,107,621
- Issue date Aug 22, 2000
- Kawasaki Jukogyo Kabushiki Kaisha
- Motokatsu Imai
- G01 - MEASURING TESTING
Information Patent Grant
Multiple rotating absolute encoder capable of accurately latching a...
- Patent number 5,663,557
- Issue date Sep 2, 1997
- Nikon Corporation
- Tohru Morita
- G01 - MEASURING TESTING
Information Patent Grant
Absolute encoder using interpolation to obtain high resolution
- Patent number 5,252,825
- Issue date Oct 12, 1993
- Nikon Corporation
- Motokatsu Imai
- H03 - BASIC ELECTRONIC CIRCUITRY

Patents Applicationslast 30 patents

Information Patent Application
EXPOSURE METHOD, SUBSTRATE STAGE, EXPOSURE APPARATUS, AND DEVICE MA...
- Publication number 20170329234
- Publication date Nov 16, 2017
- Nikon Corporation
- Soichi Owa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
EXPOSURE METHOD, SUBSTRATE STAGE, EXPOSURE APPARATUS, AND DEVICE MA...
- Publication number 20150301457
- Publication date Oct 22, 2015
- Nikon Corporation
- Soichi Owa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
EXPOSURE METHOD, SUBSTRATE STAGE, EXPOSURE APPARATUS, AND DEVICE MA...
- Publication number 20130141703
- Publication date Jun 6, 2013
- Nikon Corporation
- Soichi Owa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
EXPOSURE METHOD, SUBSTRATE STAGE, EXPOSURE APPARATUS, AND DEVICE MA...
- Publication number 20130141701
- Publication date Jun 6, 2013
- Nikon Corporation
- Soichi Owa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
EXPOSURE APPARATUS, EXPOSURE METHOD, AND DEVICE FABRICATION METHOD
- Publication number 20120320350
- Publication date Dec 20, 2012
- Nikon Corporation
- Motokatsu Imai
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Exposure apparatus, exposure method, and device fabrication method
- Publication number 20110189613
- Publication date Aug 4, 2011
- Nikon Corporation
- Motokatsu Imai
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Exposure method, substrate stage, exposure apparatus, and device ma...
- Publication number 20090015816
- Publication date Jan 15, 2009
- Nikon Corporation
- Soichi Owa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Exposure method, substrate stage, exposure apparatus, and device ma...
- Publication number 20090015808
- Publication date Jan 15, 2009
- Nikon Corporation
- Soichi Owa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Exposure apparatus, exposure method, and device fabrication method
- Publication number 20070002299
- Publication date Jan 4, 2007
- Nikon Corporation
- Motokatsu Imai
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Exposure method, substrate stage, exposure apparatus, and device ma...
- Publication number 20060227312
- Publication date Oct 12, 2006
- Nikon Corporation
- Soichi Owa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Exposure method, substrate stage, exposure apparatus, and device ma...
- Publication number 20060139614
- Publication date Jun 29, 2006
- Nikon Corporation
- Soichi Owa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Motokatsu Imai

Person

Patents Grantslast 30 patents

Exposure method, substrate stage, exposure apparatus, and device ma...

Exposure method, substrate stage, exposure apparatus, and device ma...

Exposure method, substrate stage, exposure apparatus, and device ma...

Exposure method, substrate stage, exposure apparatus, and device ma...

Exposure apparatus, exposure method, and device fabrication method

Exposure method, substrate stage, exposure apparatus, and device ma...

Exposure apparatus, exposure method, and device fabrication method

Exposure method, substrate stage, exposure apparatus, and device ma...

Exposure apparatus, exposure method, and device fabrication method

Modular encoder and method of manufacturing the same

Multiple rotating absolute encoder capable of accurately latching a...

Absolute encoder using interpolation to obtain high resolution

Patents Applicationslast 30 patents

EXPOSURE METHOD, SUBSTRATE STAGE, EXPOSURE APPARATUS, AND DEVICE MA...

EXPOSURE METHOD, SUBSTRATE STAGE, EXPOSURE APPARATUS, AND DEVICE MA...

EXPOSURE METHOD, SUBSTRATE STAGE, EXPOSURE APPARATUS, AND DEVICE MA...

EXPOSURE METHOD, SUBSTRATE STAGE, EXPOSURE APPARATUS, AND DEVICE MA...

EXPOSURE APPARATUS, EXPOSURE METHOD, AND DEVICE FABRICATION METHOD

Exposure apparatus, exposure method, and device fabrication method

Exposure method, substrate stage, exposure apparatus, and device ma...

Exposure method, substrate stage, exposure apparatus, and device ma...

Exposure apparatus, exposure method, and device fabrication method

Exposure method, substrate stage, exposure apparatus, and device ma...

Exposure method, substrate stage, exposure apparatus, and device ma...